Inventor · disambiguated record
Jeffrey C. Benzing
Also filed as: BENZING JEFFREY · BENZING JEFFREY C
23 granted patents·1,914 citations·filing 1985–2008
97Inventor score
Top patents by PatentIndex Score
23 records- 0198US5405480AInduction plasma sourceNOVELLUS SYSTEMS INC·Filed 1994·Granted Apr 11, 1995·162 cites·31 claims
- 0297US5346578AInduction plasma sourceNOVELLUS SYSTEMS INC·Filed 1992·Granted Sep 13, 1994·242 cites·25 claims
- 0397US5238499AGas-based substrate protection during processingNOVELLUS SYSTEMS INC·Filed 1991·Granted Aug 24, 1993·411 cites·23 claims
- 0491US6251770B1Dual-damascene dielectric structures and methods for making the sameLAM RES CORP·Filed 1999·Granted Jun 26, 2001·106 cites·4 claims
- 0591US4657616AIn-situ CVD chamber cleanerBENZING TECHNOLOGIES INC·Filed 1985·Granted Apr 14, 1987·116 cites·19 claims
- 0690US5230741AGas-based backside protection during substrate processingNOVELLUS SYSTEMS INC·Filed 1990·Granted Jul 27, 1993·118 cites·34 claims
- 0789US5882417AApparatus for preventing deposition on frontside peripheral region and edge of wafer in chemical vapor deposition apparatusNOVELLUS SYSTEMS INC·Filed 1996·Granted Mar 16, 1999·90 cites·2 claims
- 0888US5620525AApparatus for supporting a substrate and introducing gas flow doximate to an edge of the substrateNOVELLUS SYSTEMS INC·Filed 1994·Granted Apr 15, 1997·114 cites·47 claims
- 0985US5925411AGas-based substrate deposition protectionNOVELLUS SYSTEMS INC·Filed 1995·Granted Jul 20, 1999·72 cites·37 claims
- 1085US5578532AWafer surface protection in a gas deposition processNOVELLUS SYSTEMS INC·Filed 1994·Granted Nov 26, 1996·91 cites·20 claims
- 1181US5843233AExclusion guard and gas-based substrate protection for chemical vapor deposition apparatusNOVELLUS SYSTEMS INC·Filed 1995·Granted Dec 1, 1998·51 cites·13 claims
- 1280US6126382AApparatus for aligning substrate to chuck in processing chamberNOVELLUS SYSTEMS INC·Filed 1997·Granted Oct 3, 2000·71 cites·27 claims
- 1380US5769951AExclusion guard and gas-based substrate protection for chemical vapor deposition apparatusNOVELLUS SYSTEMS INC·Filed 1996·Granted Jun 23, 1998·51 cites·8 claims
- 1478US5374594AGas-based backside protection during substrate processingNOVELLUS SYSTEMS INC·Filed 1993·Granted Dec 20, 1994·56 cites·16 claims
- 1575US6225744B1Plasma process apparatus for integrated circuit fabrication having dome-shaped induction coilNOVELLUS SYSTEMS INC·Filed 1997·Granted May 1, 2001·27 cites·11 claims
- 1674US8192806B1Plasma particle extraction process for PECVDVARADARAJAN SESHA·Filed 2008·Granted Jun 5, 2012·10 cites·12 claims
- 1772US5653813ACyclone evaporatorNOVELLUS SYSTEMS INC·Filed 1995·Granted Aug 5, 1997·39 cites·25 claims
- 1870US6528153B1Low dielectric constant porous materials having improved mechanical strengthNOVELLUS SYSTEMS INC·Filed 1999·Granted Mar 4, 2003·27 cites·19 claims
- 1967US5901271AProcess of evaporating a liquid in a cyclone evaporatorNOVELLUS SYSTEMS INC·Filed 1997·Granted May 4, 1999·30 cites·13 claims
- 2064US7060605B2Methods for making dual-damascene dielectric structuresLAM RES CORP·Filed 2001·Granted Jun 13, 2006·7 cites·10 claims
- 2160US6909190B2Dual-damascene dielectric structuresLAM RES CORP·Filed 2001·Granted Jun 21, 2005·5 cites·11 claims
- 2252US7501339B2Methods for making dual-damascene dielectric structuresLAM RES CORP·Filed 2006·Granted Mar 10, 2009·0 cites·17 claims
- 2352US5605599AMethod of generating plasma having high ion density for substrate processing operationNOVELLUS SYSTEMS INC·Filed 1995·Granted Feb 25, 1997·18 cites·10 claims
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