Inventor · disambiguated record
Thomas F. A. Bibby
Also filed as: BIBBY JR THOMAS F A · BIBBY JR THOMAS FREDERICK ALLE · BIBBY JR THOMAS FREDERICK ALLEN · BIBBY THOMAS F A
19 granted patents·4 pending applications·953 citations·filing 1985–2019
95Inventor score
Top patents by PatentIndex Score
23 records- 0197US6676482B2Learning method and apparatus for predictive determination of endpoint during chemical mechanical planarization using sparse samplingSPEEDFAM IPEC CORP·Filed 2001·Granted Jan 13, 2004·83 cites·8 claims
- 0296US6056632ASemiconductor wafer polishing apparatus with a variable polishing force wafer carrier headSPEEDFAM IPEC CORP·Filed 1998·Granted May 2, 2000·202 cites·23 claims
- 0395US6106662AMethod and apparatus for endpoint detection for chemical mechanical polishingSPEEDFAM IPEC CORP·Filed 1998·Granted Aug 22, 2000·197 cites·35 claims
- 0494US6515493B1Method and apparatus for in-situ endpoint detection using electrical sensorsSPEEDFAM IPEC CORP·Filed 2000·Granted Feb 4, 2003·56 cites·19 claims
- 0594US6491569B2Method and apparatus for using optical reflection data to obtain a continuous predictive signal during CMPSPEEDFAM IPEC CORP·Filed 2001·Granted Dec 10, 2002·55 cites·16 claims
- 0694US6361646B1Method and apparatus for endpoint detection for chemical mechanical polishingSPEEDFAM IPEC CORP·Filed 1999·Granted Mar 26, 2002·185 cites·12 claims
- 0784US10095118B2Lithography optics adjustment and monitoringCymer LLC·Filed 2016·Granted Oct 9, 2018·4 cites·19 claims
- 0882US5633748AFiber optic Bragg grating demodulator and sensor incorporating sameUS ARMY·Filed 1996·Granted May 27, 1997·63 cites·19 claims
- 0981US5835226AMethod for determining optical constants prior to film processing to be used improve accuracy of post-processing thickness measurementsLSI LOGIC CORP·Filed 1997·Granted Nov 10, 1998·52 cites·14 claims
- 1080US6913703B2Method of adjusting the thickness of an electrode in a plasma processing systemTOKYO ELECTRON LTD·Filed 2002·Granted Jul 5, 2005·14 cites·19 claims
- 1175US10345714B2Lithography optics adjustment and monitoringCymer LLC·Filed 2017·Granted Jul 9, 2019·2 cites·30 claims
- 1268US9945730B2Adjusting an amount of coherence of a light beamCymer LLC·Filed 2016·Granted Apr 17, 2018·1 cites·28 claims
- 1362US4666553AMethod for planarizing multilayer semiconductor devicesRCA CORP·Filed 1985·Granted May 19, 1987·29 cites·9 claims
- 1461US7617776B1Selective emitting flare nanosensorsDIFFRACTION LTD·Filed 2004·Granted Nov 17, 2009·6 cites·10 claims
- 1559US10267687B2Adjusting an amount of coherence of a light beamCymer LLC·Filed 2018·Granted Apr 23, 2019·0 cites·20 claims
- 1656US10845711B2Lithography optics adjustment and monitoringCymer LLC·Filed 2019·Granted Nov 24, 2020·0 cites·20 claims
- 1753US2020018580A1Target assignment projectileMARSUPIAL HOLDINGS INC·Filed 2019·Application pending·0 cites
- 1852US10371493B2Target assignment projectileMARSUPIAL HOLDINGS INC·Filed 2018·Granted Aug 6, 2019·0 cites·20 claims
- 1951US9638501B2Target assignment projectilePARKER WILLIAM P·Filed 2004·Granted May 2, 2017·4 cites·60 claims
- 2049US10088286B2Target assignment projectileMARSUPIAL HOLDINGS INC·Filed 2017·Granted Oct 2, 2018·0 cites·23 claims
- 2139US2006166608A1Spectral imaging of substratesCHALMERS SCOTT A·Filed 2005·Application pending·0 cites
- 2238US2004259472A1Whole-substrate spectral imaging system for CMPFiled 2004·Application pending·0 cites
- 2333US2002191197A1Method and apparatus for optical multi-angle endpoint detection during chemical mechanical planarizationFiled 2001·Application pending·0 cites
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