Inventor · disambiguated record
Christopher C. Streinz
Also filed as: STREINZ CHRISTOPHER C
16 granted patents·1 pending application·1,673 citations·filing 1996–2009
96Inventor score
Top patents by PatentIndex Score
17 records- 0197US6582623B1CMP composition containing silane modified abrasive particlesCABOT MICROELECTRONICS CORP·Filed 2000·Granted Jun 24, 2003·143 cites·21 claims
- 0297US5958288AComposition and slurry useful for metal CMPCABOT CORP·Filed 1996·Granted Sep 28, 1999·219 cites·49 claims
- 0396US5858813AChemical mechanical polishing slurry for metal layers and filmsCABOT CORP·Filed 1996·Granted Jan 12, 1999·320 cites·55 claims
- 0495US6068787AComposition and slurry useful for metal CMPCABOT CORP·Filed 1997·Granted May 30, 2000·189 cites·18 claims
- 0595US5980775AComposition and slurry useful for metal CMPCABOT CORP·Filed 1997·Granted Nov 9, 1999·144 cites·26 claims
- 0694US6383065B1Catalytic reactive pad for metal CMPCABOT MICROELECTRONICS CORP·Filed 2001·Granted May 7, 2002·51 cites·40 claims
- 0794US6136711APolishing composition including an inhibitor of tungsten etchingCABOT CORP·Filed 1998·Granted Oct 24, 2000·163 cites·52 claims
- 0894US6015506AComposition and method for polishing rigid disksCABOT CORP·Filed 1997·Granted Jan 18, 2000·127 cites·33 claims
- 0991US5993686AFluoride additive containing chemical mechanical polishing slurry and method for use of sameCABOT CORP·Filed 1996·Granted Nov 30, 1999·136 cites·33 claims
- 1090US6083419APolishing composition including an inhibitor of tungsten etchingCABOT CORP·Filed 1997·Granted Jul 4, 2000·101 cites·47 claims
- 1185US7990153B2Compensated directional resistivity measurementsSMITH INTERNATIONAL·Filed 2009·Granted Aug 2, 2011·20 cites·26 claims
- 1285US6592776B1Polishing composition for metal CMPCABOT MICROELECTRONICS CORP·Filed 2000·Granted Jul 15, 2003·30 cites·20 claims
- 1374US6793559B2Composition and method for polishing rigid disksCABOT MICROELECTRONICS CORP·Filed 2002·Granted Sep 21, 2004·8 cites·9 claims
- 1466US6767476B2Polishing composition for metal CMPCABOT MICROELECTRONICS CORP·Filed 2003·Granted Jul 27, 2004·9 cites·21 claims
- 1558US6347978B1Composition and method for polishing rigid disksCABOT MICROELECTRONICS CORP·Filed 1999·Granted Feb 19, 2002·10 cites·8 claims
- 1655US8581594B2Microresistivity anisotropy logging tool employing a monopole current injection electrodeWANG TSILI·Filed 2009·Granted Nov 12, 2013·3 cites·23 claims
- 1742US2003209522A1CMP composition containing silane-modified abrasive particlesCABOT MICROELECTRONICS CORP·Filed 2003·Application pending·0 cites
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