Inventor · disambiguated record
Charles Storey
Also filed as: STOREY CHARLES A
7 granted patents·4 pending applications·54 citations·filing 2001–2008
82Inventor score
Top patents by PatentIndex Score
11 records- 0179US6951510B1Chemical mechanical polishing pad with grooves alternating between a larger groove size and a smaller groove sizeAGERE SYSTEMS INC·Filed 2004·Granted Oct 4, 2005·20 cites·15 claims
- 0278US6896583B2Method and apparatus for conditioning a polishing padAGERE SYSTEMS INC·Filed 2001·Granted May 24, 2005·24 cites·11 claims
- 0362US7172496B1Method and apparatus for cleaning slurry depositions from a water carrierAGERE SYSTEMS INC·Filed 2005·Granted Feb 6, 2007·3 cites·5 claims
- 0454US6702654B2Conditioning wheel for conditioning a semiconductor wafer polishing pad and method of manufacture thereofAGERE SYSTEMS INC·Filed 2001·Granted Mar 9, 2004·5 cites·13 claims
- 0548US7527544B2System of using offset gage for CMP polishing pad alignment and adjustmentAGERE SYSTEMS INC·Filed 2008·Granted May 5, 2009·0 cites·10 claims
- 0643US7338569B2Method and system of using offset gage for CMP polishing pad alignment and adjustmentAGERE SYSTEMS INC·Filed 2004·Granted Mar 4, 2008·2 cites·12 claims
- 0738US2007010180A1Carrier employing snap-fitted membrane retainerAGERE SYSTEMS INC·Filed 2005·Application pending·0 cites
- 0838US2007072128A1Method of manufacturing an integrated circuit to obtain uniform exposure in a photolithographic processMICELI FRANK·Filed 2005·Application pending·0 cites
- 0935US7033257B2Carrier head for chemical mechanical polishingAGERE SYSTEMS INC·Filed 2004·Granted Apr 25, 2006·0 cites·2 claims
- 1034US2002106829A1Conditioning wheel for conditioning a semiconductor wafer polishing pad and method of manufacture thereofFiled 2001·Application pending·0 cites
- 1133US2005260936A1Dynamic atomizer on conditioner assemblies using high velocity waterRODRIGUEZ JOSE O·Filed 2004·Application pending·0 cites
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