Inventor
NISHI TSUNEHIRO
JP88 patents
⚠️ This page may combine multiple inventors who share the name “NISHI TSUNEHIRO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SHINETSU CHEMICAL CO
44 patentsUS6448420B1Sep 10, 2002
Acid-decomposable ester compound suitable for use in resist material
SHINETSU CHEMICAL CO160 citations99
US6312867B1Nov 6, 2001
Ester compounds, polymers, resist compositions and patterning process
SHINETSU CHEMICAL CO209 citations99
US6280898B1Aug 28, 2001
Lactone-containing compounds, polymers, resist compositions, and patterning method
SHINETSU CHEMICAL CO229 citations99
US6147249ANov 14, 2000
Ester compounds, polymers, resist composition and patterning process
SHINETSU CHEMICAL CO81 citations96
US6048661AApr 11, 2000
Polymeric compounds, chemically amplified positive type resist materials and process for pattern formation
SHINETSU CHEMICAL CO80 citations96
US7981589B2Jul 19, 2011
Fluorinated monomer, fluorinated polymer, resist composition and patterning process
SHINETSU CHEMICAL CO22 citations93
US7090961B2Aug 15, 2006
Photo acid generator, chemical amplification resist material and pattern formation method
SHINETSU CHEMICAL CO18 citations93
US6946233B2Sep 20, 2005
Polymer, resist material and patterning method
SHINETSU CHEMICAL CO25 citations93
US6703183B2Mar 9, 2004
Polymer, resist composition and patterning process
SHINETSU CHEMICAL CO23 citations93
US6673515B2Jan 6, 2004
Polymer, resist composition and patterning process
SHINETSU CHEMICAL CO20 citations93
US6673518B2Jan 6, 2004
Polymer, resist composition and patterning process
SHINETSU CHEMICAL CO20 citations93
US6605408B2Aug 12, 2003
Resist composition and patterning process
SHINETSU CHEMICAL CO29 citations93
US6512067B2Jan 28, 2003
Polymer, resist composition and patterning process
SHINETSU CHEMICAL CO23 citations93
US6492090B2Dec 10, 2002
Polymers, resist compositions and patterning process
SHINETSU CHEMICAL CO25 citations93
US6444396B1Sep 3, 2002
Ester compounds, polymers, resist composition and patterning process
SHINETSU CHEMICAL CO24 citations93
US6420085B1Jul 16, 2002
Resist compositions and patterning process
SHINETSU CHEMICAL CO22 citations93
US6284429B1Sep 4, 2001
Ester compounds, polymers, resist compositions and patterning process
SHINETSU CHEMICAL CO50 citations93
US6274286B1Aug 14, 2001
Resist compositions
SHINETSU CHEMICAL CO46 citations93
US6027854AFeb 22, 2000
Polymers chemically amplified positive resist compositions, and patterning method
SHINETSU CHEMICAL CO21 citations93
US7871752B2Jan 18, 2011
Lactone-containing compound, polymer, resist composition, and patterning process
SHINETSU CHEMICAL CO11 citations84
USRE41580EAug 24, 2010
Lactone-containing compounds, polymers, resist compositions, and patterning method
SHINETSU CHEMICAL CO8 citations84
US7718342B2May 18, 2010
Polymers, resist compositions and patterning process
SHINETSU CHEMICAL CO9 citations84
US7618765B2Nov 17, 2009
Positive resist composition and patterning process
SHINETSU CHEMICAL CO14 citations84
US7611821B2Nov 3, 2009
Positive resist compositions and patterning process
SHINETSU CHEMICAL CO15 citations84
US7157207B2Jan 2, 2007
Polymer, resist material and patterning processing
SHINETSU CHEMICAL CO12 citations84
US6794111B2Sep 21, 2004
Polymers, resist compositions and patterning process, novel tetrahydrofuran compounds and their preparation
SHINETSU CHEMICAL CO16 citations84
US6566038B2May 20, 2003
Polymers, resist compositions and patterning process
SHINETSU CHEMICAL CO13 citations84
US6541179B2Apr 1, 2003
Resist compositions and patterning process
SHINETSU CHEMICAL CO13 citations84
US6524765B1Feb 25, 2003
Polymer, resist composition and patterning process
SHINETSU CHEMICAL CO14 citations84
US6509135B2Jan 21, 2003
Polymer, resist composition and patterning process
SHINETSU CHEMICAL CO16 citations84
US6413695B1Jul 2, 2002
Resist compositions and patterning process
SHINETSU CHEMICAL CO18 citations84
US6399274B1Jun 4, 2002
Resist composition and patterning process
SHINETSU CHEMICAL CO20 citations84
US7833694B2Nov 16, 2010
Lactone-containing compound, polymer, resist composition, and patterning process
SHINETSU CHEMICAL CO9 citations83
US6962767B2Nov 8, 2005
Acetal compound, polymer, resist composition and patterning process
SHINETSU CHEMICAL CO10 citations74
US6844133B2Jan 18, 2005
Polymer, resist composition and patterning process
SHINETSU CHEMICAL CO10 citations74
US6667145B1Dec 23, 2003
Resist composition and patterning process
SHINETSU CHEMICAL CO10 citations74
US6653044B2Nov 25, 2003
Chemical amplification type resist composition
SHINETSU CHEMICAL CO10 citations74
US6596463B2Jul 22, 2003
Ester compounds, polymers, resist compositions and patterning process
SHINETSU CHEMICAL CO8 citations74
US6586157B2Jul 1, 2003
Ester compounds, polymers, resist compositions and patterning process
SHINETSU CHEMICAL CO12 citations74
US6515150B2Feb 4, 2003
Cyclic acetal compound, polymer, resist composition and patterning process
SHINETSU CHEMICAL CO5 citations74
US6472543B2Oct 29, 2002
Lactone compounds having alicyclic structure and their manufacturing method
SHINETSU CHEMICAL CO7 citations74
US6403823B2Jun 11, 2002
Ester compounds having alicyclic structure and method for preparing same
SHINETSU CHEMICAL CO9 citations74
US6030746AFeb 29, 2000
Di- and triphenyl monoterpene hydrocarbon derivatives, dissolution inhibitors, and chemically amplified positive resist compositions
SHINETSU CHEMICAL CO13 citations74
US5856561AJan 5, 1999
Bisphenol carboxylic acid tertiary ester derivatives and chemically amplified positive resist compositions
SHINETSU CHEMICAL CO11 citations72
WATANABE TAKERU
2 patentsSHI ETSU CHEMICAL CO LTD
1 patentEUDYNA DEVICES INC
1 patentTAKEMURA KATSUYA
1 patentSHINACHI SATOSHI
1 patentShowing the top 50 of 88 patents by PatentIndex Score.