Inventor
WU DIEN-YEH
US64 patents
⚠️ This page may combine multiple inventors who share the name “WU DIEN-YEH”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
APPLIED MATERIALS INC
40 patentsUS7591907B2Sep 22, 2009
Apparatus for hybrid chemical processing
APPLIED MATERIALS INC375 citations99
US7204886B2Apr 17, 2007
Apparatus and method for hybrid chemical processing
APPLIED MATERIALS INC525 citations99
US6916398B2Jul 12, 2005
Gas delivery apparatus and method for atomic layer deposition
APPLIED MATERIALS INC646 citations99
US6905541B2Jun 14, 2005
Method and apparatus of generating PDMAT precursor
APPLIED MATERIALS INC119 citations99
USRE47440EJun 18, 2019
Apparatus and method for providing uniform flow of gas
APPLIED MATERIALS INC360 citations98
US7780789B2Aug 24, 2010
Vortex chamber lids for atomic layer deposition
APPLIED MATERIALS INC458 citations98
US7780785B2Aug 24, 2010
Gas delivery apparatus for atomic layer deposition
APPLIED MATERIALS INC61 citations98
US7402210B2Jul 22, 2008
Apparatus and method for hybrid chemical processing
APPLIED MATERIALS INC61 citations98
US7228873B2Jun 12, 2007
Valve design and configuration for fast delivery system
APPLIED MATERIALS INC61 citations98
US7682946B2Mar 23, 2010
Apparatus and process for plasma-enhanced atomic layer deposition
APPLIED MATERIALS INC40 citations96
US7270709B2Sep 18, 2007
Method and apparatus of generating PDMAT precursor
APPLIED MATERIALS INC50 citations96
US7066194B2Jun 27, 2006
Valve design and configuration for fast delivery system
APPLIED MATERIALS INC61 citations96
US6955211B2Oct 18, 2005
Method and apparatus for gas temperature control in a semiconductor processing system
APPLIED MATERIALS INC70 citations95
US7780788B2Aug 24, 2010
Gas delivery apparatus for atomic layer deposition
APPLIED MATERIALS INC17 citations92
US7699023B2Apr 20, 2010
Gas delivery apparatus for atomic layer deposition
APPLIED MATERIALS INC34 citations92
US7597758B2Oct 6, 2009
Chemical precursor ampoule for vapor deposition processes
APPLIED MATERIALS INC16 citations92
US7524374B2Apr 28, 2009
Method and apparatus for generating a precursor for a semiconductor processing system
APPLIED MATERIALS INC26 citations92
US11715667B2Aug 1, 2023
Thermal process chamber lid with backside pumping
APPLIED MATERIALS INC5 citations85
US8955547B2Feb 17, 2015
Apparatus and method for providing uniform flow of gas
APPLIED MATERIALS INC15 citations84
US7833358B2Nov 16, 2010
Method of recovering valuable material from exhaust gas stream of a reaction chamber
APPLIED MATERIALS INC17 citations84
US10407771B2Sep 10, 2019
Atomic layer deposition chamber with thermal lid
APPLIED MATERIALS INC12 citations81
US7588736B2Sep 15, 2009
Apparatus and method for generating a chemical precursor
APPLIED MATERIALS INC7 citations74
US11555244B2Jan 17, 2023
High temperature dual chamber showerhead
APPLIED MATERIALS INC4 citations73
US9109754B2Aug 18, 2015
Apparatus and method for providing uniform flow of gas
APPLIED MATERIALS INC4 citations73
US11335591B2May 17, 2022
Thermal process chamber lid with backside pumping
APPLIED MATERIALS INC2 citations72
US10982326B2Apr 20, 2021
Counter-flow multi inject for atomic layer deposition chamber
APPLIED MATERIALS INC3 citations72
US10487399B2Nov 26, 2019
Atomic layer deposition chamber with counter-flow multi inject
APPLIED MATERIALS INC3 citations72
US9947578B2Apr 17, 2018
Methods for forming low-resistance contacts through integrated process flow systems
APPLIED MATERIALS INC2 citations72
US9466524B2Oct 11, 2016
Method of depositing metals using high frequency plasma
APPLIED MATERIALS INC2 citations63
US9145612B2Sep 29, 2015
Deposition of N-metal films comprising aluminum alloys
APPLIED MATERIALS INC3 citations63
USD1089130SAug 19, 2025
Process chamber manifold
APPLIED MATERIALS INC1 citations62
US12387975B2Aug 12, 2025
Thermal process chamber lid with backside pumping
APPLIED MATERIALS INC0 citations62
US12230479B2Feb 18, 2025
Processing chamber with multiple plasma units
APPLIED MATERIALS INC0 citations62
US11955319B2Apr 9, 2024
Processing chamber with multiple plasma units
APPLIED MATERIALS INC0 citations62
US11658014B2May 23, 2023
Apparatuses and methods of protecting nickel and nickel containing components with thin films
APPLIED MATERIALS INC0 citations62
US11421322B2Aug 23, 2022
Blocker plate for use in a substrate process chamber
APPLIED MATERIALS INC0 citations62
USRE48994EMar 29, 2022
Apparatus and method for providing uniform flow of gas
APPLIED MATERIALS INC0 citations62
US11133155B2Sep 28, 2021
Apparatus for depositing metal films with plasma treatment
APPLIED MATERIALS INC0 citations62
US10508339B2Dec 17, 2019
Blocker plate for use in a substrate process chamber
APPLIED MATERIALS INC1 citations62
USD1112376SFeb 10, 2026
Process chamber mixer
APPLIED MATERIALS INC0 citations60
CHEN LING
3 patentsUS8668776B2Mar 11, 2014
Gas delivery apparatus and method for atomic layer deposition
CHEN LING21 citations92
US8070879B2Dec 6, 2011
Apparatus and method for hybrid chemical processing
CHEN LING29 citations92
US8062422B2Nov 22, 2011
Method and apparatus for generating a precursor for a semiconductor processing system
CHEN LING1 citations62
APPLIED MATERISALS INC
1 patentMA PAUL
1 patentCUVALCI OLKAN
1 patentMA PAUL F
1 patentCHU SCHUBERT S
1 patentWU DIEN-YEH
1 patentAPPLIED MAT INC
1 patentShowing the top 50 of 64 patents by PatentIndex Score.