P

Inventor

SUENAGA YUTAKA

JP46 patents
⚠️ This page may combine multiple inventors who share the name “SUENAGA YUTAKA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

NIKON CORP

39 patents
US6633365B2Oct 14, 2003

Projection optical system and exposure apparatus having the projection optical system

NIKON CORP471 citations99
US6451507B1Sep 17, 2002

Exposure apparatus and method

NIKON CORP55 citations96
US6377338B1Apr 23, 2002

Exposure apparatus and method

NIKON CORP49 citations96
US6213610B1Apr 10, 2001

Catoptric reduction projection optical system and exposure apparatus and method using same

NIKON CORP80 citations96
US5668673ASep 16, 1997

Catadioptric reduction projection optical system

NIKON CORP62 citations96
US5220454AJun 15, 1993

Cata-dioptric reduction projection optical system

NIKON CORP72 citations96
US5694241ADec 2, 1997

Catadioptric reduction projection optical system and exposure apparatus employing the same

NIKON CORP92 citations95
US5592329AJan 7, 1997

Catadioptric optical system

NIKON CORP74 citations95
US6302548B2Oct 16, 2001

Catoptric reduction projection optical system and exposure apparatus and method using same

NIKON CORP43 citations93
US6108140AAug 22, 2000

Catadioptric reduction projection optical system and method

NIKON CORP19 citations93
US5978155ANov 2, 1999

Adapters for correcting spherical aberrations of objective lens

NIKON CORP20 citations93
US5930049AJul 27, 1999

Projection optical system and method of using such system for manufacturing devices

NIKON CORP48 citations93
US5920432AJul 6, 1999

Microscope objective lens

NIKON CORP24 citations93
US5589988ADec 31, 1996

Retrofocus-type wide angle lens system having a fixed front lens group and a movable rear lens group

NIKON CORP20 citations93
US7079314B1Jul 18, 2006

Catadioptric optical system and exposure apparatus equipped with the same

NIKON CORP45 citations92
US6084723AJul 4, 2000

Exposure apparatus

NIKON CORP31 citations92
US5943172AAug 24, 1999

Projection optical system and projection exposure apparatus

NIKON CORP34 citations92
US5940220AAug 17, 1999

Microscope objective lens with variable correction of aberrations imparted by transparent body between the specimen and the objective lens

NIKON CORP27 citations92
US5835282ANov 10, 1998

Zoom lens system

NIKON CORP22 citations92
US5831776ANov 3, 1998

Projection optical system and projection exposure apparatus

NIKON CORP38 citations92
US5831770ANov 3, 1998

Projection optical system and exposure apparatus provided therewith

NIKON CORP50 citations92
US5805344ASep 8, 1998

Projection optical system and projection exposure apparatus

NIKON CORP34 citations92
US4795244AJan 3, 1989

Projection type exposure apparatus

NIKON CORP38 citations92
US6259557B1Jul 10, 2001

Device and method for dark field illumination

NIKON CORP35 citations91
US5835285ANov 10, 1998

Projection optical system and exposure apparatus using the same

NIKON CORP42 citations91
US5781278AJul 14, 1998

Projection optical system and exposure apparatus with the same

NIKON CORP47 citations91
US5532878AJul 2, 1996

Objective lens system for microscope

NIKON CORP32 citations89
US6452723B1Sep 17, 2002

Exposure apparatus and method

NIKON CORP10 citations82
US5712735AJan 27, 1998

Catadioptric reduction projection optical system

NIKON CORP12 citations82
US4798962AJan 17, 1989

Multi-wavelength projection exposure and alignment apparatus

NIKON CORP22 citations81
US6707601B2Mar 16, 2004

Exposure apparatus and method

NIKON CORP4 citations74
US6646797B2Nov 11, 2003

Exposure apparatus and method

NIKON CORP6 citations74
US5844728ADec 1, 1998

Catadioptric reduction projection optical system

NIKON CORP4 citations74
US5477388ADec 19, 1995

Inverse telescopic wide angle lens

NIKON CORP14 citations73
US5889617AMar 30, 1999

Objective lens systems

NIKON CORP8 citations72
US5708531AJan 13, 1998

Objective lens system

NIKON CORP14 citations72
US6856377B2Feb 15, 2005

Relay image optical system, and illuminating optical device and exposure system provided with the optical system

NIKON CORP2 citations63
US6118596ASep 12, 2000

Catadioptric reduction projection optical system and method

NIKON CORP3 citations63
US5751486AMay 12, 1998

Shake-preventing correction optical system

NIKON CORP6 citations62

NIPPON KOGAKU KK

5 patents

(unassigned)

1 patent

SUENAGA YUTAKA

1 patent