Inventor
TSUCHIYA YOSHINORI
JP66 patents
⚠️ This page may combine multiple inventors who share the name “TSUCHIYA YOSHINORI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOSHIBA KK
35 patentsUS7807990B2Oct 5, 2010
Semiconductor device
TOSHIBA KK22 citations93
US7563678B2Jul 21, 2009
Semiconductor device and method of manufacturing the same
TOSHIBA KK21 citations93
US7485936B2Feb 3, 2009
Semiconductor device and method of manufacturing the same
TOSHIBA KK16 citations93
US8367507B1Feb 5, 2013
Manufacturing method of semiconductor device
TOSHIBA KK14 citations84
US7964489B2Jun 21, 2011
Semiconductor device
TOSHIBA KK13 citations84
US7807538B2Oct 5, 2010
Method of forming a silicide layer while applying a compressive or tensile strain to impurity layers
TOSHIBA KK11 citations84
US7667273B2Feb 23, 2010
Semiconductor device and method for manufacturing the same
TOSHIBA KK12 citations84
US7514753B2Apr 7, 2009
Semiconductor device
TOSHIBA KK13 citations84
US7429777B2Sep 30, 2008
Semiconductor device with a gate electrode having a laminate structure
TOSHIBA KK10 citations84
US7541657B2Jun 2, 2009
Semiconductor device and method for manufacturing the same
TOSHIBA KK6 citations74
US7456096B2Nov 25, 2008
Method of manufacturing silicide layer for semiconductor device
TOSHIBA KK8 citations74
US7432570B2Oct 7, 2008
Semiconductor device and manufacturing method thereof
TOSHIBA KK5 citations74
US7429776B2Sep 30, 2008
Semiconductor device and method for manufacturing the same
TOSHIBA KK4 citations74
US7391085B2Jun 24, 2008
Semiconductor device
TOSHIBA KK7 citations74
US8053300B2Nov 8, 2011
Semiconductor device
TOSHIBA KK2 citations63
US7986014B2Jul 26, 2011
Semiconductor device
TOSHIBA KK2 citations63
US7977182B2Jul 12, 2011
Method of manufacturing MISFET with low contact resistance
TOSHIBA KK5 citations63
US7902612B2Mar 8, 2011
Semiconductor device and method of manufacturing the same
TOSHIBA KK2 citations63
US7863695B2Jan 4, 2011
Complementary MISFET semiconductor device having an atomic density ratio aluminum/lanthanum (Al/La) in the gate insulating layer of PMIS is larger than that of the NMIS
TOSHIBA KK5 citations63
US7745888B2Jun 29, 2010
Method of making p-channel and n-channel MIS transistors using single film formation of TaC
TOSHIBA KK2 citations63
US7727832B2Jun 1, 2010
Semiconductor device and method for manufacturing the same
TOSHIBA KK2 citations63
US7728394B2Jun 1, 2010
Semiconductor device and manufacturing method thereof
TOSHIBA KK2 citations63
US7642165B2Jan 5, 2010
Semiconductor device and fabrication method thereof
TOSHIBA KK5 citations63
US7632728B2Dec 15, 2009
Method of forming TaC gate electrodes with crystal orientation ratio defining the work function
TOSHIBA KK2 citations63
US7612413B2Nov 3, 2009
Semiconductor device and manufacturing method thereof
TOSHIBA KK2 citations63
US7608896B2Oct 27, 2009
Semiconductor device
TOSHIBA KK2 citations63
US7601623B2Oct 13, 2009
Method of manufacturing a semiconductor device with a gate electrode having a laminate structure
TOSHIBA KK2 citations63
US7576397B2Aug 18, 2009
Semiconductor device
TOSHIBA KK2 citations63
US7410855B2Aug 12, 2008
Semiconductor device
TOSHIBA KK2 citations63
US7416967B2Aug 26, 2008
Semiconductor device, and method for manufacturing the same
TOSHIBA KK3 citations62
USRE47640EOct 8, 2019
Semiconductor device
TOSHIBA KK0 citations52
USRE46271EJan 10, 2017
Semiconductor device
TOSHIBA KK0 citations52
US9105709B2Aug 11, 2015
Semiconductor device and method for manufacturing the same
TOSHIBA KK1 citations52
US8790983B2Jul 29, 2014
Semiconductor device and method for manufacturing the same
TOSHIBA KK0 citations52
US8357580B2Jan 22, 2013
Semiconductor device and method of manufacturing semiconductor device
TOSHIBA KK1 citations52
TSUCHIYA YOSHINORI
6 patentsUS8120117B2Feb 21, 2012
Semiconductor device with metal gate
TSUCHIYA YOSHINORI15 citations84
US8766334B2Jul 1, 2014
Semiconductor device with low resistance gate electrode and method of manufacturing the same
TSUCHIYA YOSHINORI1 citations52
US8669562B2Mar 11, 2014
Semiconductor device and method for manufacturing the same
TSUCHIYA YOSHINORI1 citations52
US8592924B2Nov 26, 2013
Semiconductor device including gate electrode having a laminate structure and a plug electrically connected thereto
TSUCHIYA YOSHINORI0 citations52
US8587060B2Nov 19, 2013
Semiconductor device and method for manufacturing the same
TSUCHIYA YOSHINORI1 citations52
US8217440B2Jul 10, 2012
Semiconductor device and method of fabricating the same
TSUCHIYA YOSHINORI1 citations52
ICHIHARA REIKA
4 patentsUS8174080B2May 8, 2012
Semiconductor device
ICHIHARA REIKA2 citations63
US8129792B2Mar 6, 2012
Semiconductor device and method for manufacturing the same
ICHIHARA REIKA3 citations62
US8304304B2Nov 6, 2012
Semiconductor device
ICHIHARA REIKA0 citations52
US8263452B2Sep 11, 2012
Semiconductor device
ICHIHARA REIKA0 citations52
DENSO CORP
3 patentsUS10084052B2Sep 25, 2018
Semiconductor device and method for manufacturing the same
DENSO CORP4 citations73
US10381469B2Aug 13, 2019
Semiconductor device and method of manufacturing the same
DENSO CORP2 citations72
US10121663B2Nov 6, 2018
Semiconductor device and method for producing same
DENSO CORP2 citations72
ENSUIKO SUGAR REFINING
1 patentSHIMIZU TATSUO
1 patentShowing the top 50 of 66 patents by PatentIndex Score.