Inventor · disambiguated record
Paul Ackmann
Also filed as: ACKMANN PAUL · ACKMANN PAUL W · ACKMANN PAUL WILLARD
35 granted patents·3 pending applications·267 citations·filing 1983–2021
96Inventor score
Files withGLOBALFOUNDRIES INC24ADVANCED MICRO DEVICES INC6GLOBALFOUNDRIES SG PTE LTD4NING GUO XIANG2GLOBALFOUNDRIES US INC1
Top patents by PatentIndex Score
38 records- 0194US9500945B1Pattern classification based proximity corrections for reticle fabricationGLOBALFOUNDRIES SG PTE LTD·Filed 2015·Granted Nov 22, 2016·9 cites·20 claims
- 0291US6405144B1Method and apparatus for programmed latency for improving wafer-to-wafer uniformityADVANCED MICRO DEVICES INC·Filed 2000·Granted Jun 11, 2002·62 cites·52 claims
- 0383US5757673AAutomated data management system for analysis and control of photolithography stepper performanceADVANCED MICRO DEVICES INC·Filed 1996·Granted May 26, 1998·53 cites·26 claims
- 0476US8907496B1Circuit structures and methods of fabrication with enhanced contact via electrical connectionGLOBALFOUNDRIES INC·Filed 2013·Granted Dec 9, 2014·4 cites·20 claims
- 0575US10923388B2Gap fill void and connection structuresGLOBALFOUNDRIES INC·Filed 2019·Granted Feb 16, 2021·1 cites·18 claims
- 0674US8010915B2Grid-based fragmentation for optical proximity correction in photolithography mask applicationsGLOBALFOUNDRIES INC·Filed 2008·Granted Aug 30, 2011·4 cites·20 claims
- 0771US6271602B1Method for reducing the susceptibility to chemical-mechanical polishing damage of an alignment mark formed in a semiconductor substrateADVANCED MICRO DEVICES INC·Filed 1999·Granted Aug 7, 2001·39 cites·23 claims
- 0869US4508815ARecessed metallizationMOSTEK CORP·Filed 1983·Granted Apr 2, 1985·30 cites·4 claims
- 0968US10002827B2Method for selective re-routing of selected areas in a target layer and in adjacent interconnecting layers of an IC deviceGLOBALFOUNDRIES INC·Filed 2017·Granted Jun 19, 2018·1 cites·9 claims
- 1068US9817927B2Hard mask etch and dielectric etch aware overlap for via and metal layersGLOBALFOUNDRIES INC·Filed 2015·Granted Nov 14, 2017·2 cites·20 claims
- 1168US9368453B2Overlay mark dependent dummy fill to mitigate gate height variationGLOBALFOUNDRIES INC·Filed 2015·Granted Jun 14, 2016·1 cites·15 claims
- 1267US9250538B2Efficient optical proximity correction repair flow method and apparatusGLOBALFOUNDRIES INC·Filed 2014·Granted Feb 2, 2016·1 cites·13 claims
- 1367US5586059AAutomated data management system for analysis and control of photolithography stepper performanceADVANCED MICRO DEVICES INC·Filed 1995·Granted Dec 17, 1996·40 cites·26 claims
- 1466US11651992B2Gap fill void and connection structuresGLOBALFOUNDRIES US INC·Filed 2021·Granted May 16, 2023·0 cites·20 claims
- 1565US9341961B2Cross technology reticle (CTR) or multi-layer reticle (MLR) CDU, registration, and overlay techniquesNING GUO XIANG·Filed 2013·Granted May 17, 2016·1 cites·7 claims
- 1663US9029855B2Layout for reticle and wafer scanning electron microscope registration or overlay measurementsNING GUO XIANG·Filed 2013·Granted May 12, 2015·2 cites·12 claims
- 1761US9535319B2Reticle, system comprising a plurality of reticles and method for the formation thereofGLOBALFOUNDRIES INC·Filed 2015·Granted Jan 3, 2017·1 cites·28 claims
- 1859US9236301B2Customized alleviation of stresses generated by through-substrate via(S)GLOBALFOUNDRIES INC·Filed 2013·Granted Jan 12, 2016·1 cites·17 claims
- 1957US9658531B2Semiconductor device resolution enhancement by etching multiple sides of a maskGLOBALFOUNDRIES INC·Filed 2014·Granted May 23, 2017·0 cites·11 claims
- 2056US9323882B2Metrology pattern layout and method of use thereofGLOBALFOUNDRIES INC·Filed 2014·Granted Apr 26, 2016·0 cites·18 claims
- 2154US10816483B2Double pass diluted ultraviolet reticle inspectionGLOBALFOUNDRIES INC·Filed 2018·Granted Oct 27, 2020·0 cites·12 claims
- 2254US9252061B2Overlay mark dependent dummy fill to mitigate gate height variationGLOBALFOUNDRIES INC·Filed 2014·Granted Feb 2, 2016·0 cites·13 claims
- 2354US8895211B2Semiconductor device resolution enhancement by etching multiple sides of a maskGLOBALFOUNDRIES INC·Filed 2012·Granted Nov 25, 2014·0 cites·17 claims
- 2453US9817940B2Method wherein test cells and dummy cells are included into a layout of an integrated circuitGLOBALFOUNDRIES INC·Filed 2017·Granted Nov 14, 2017·0 cites·16 claims
- 2551US9864831B2Metrology pattern layout and method of use thereofGLOBALFOUNDRIES INC·Filed 2016·Granted Jan 9, 2018·0 cites·20 claims
- 2651US9798238B2Cross technology reticle (CTR) or multi-layer reticle (MLR) CDU, registration, and overlay techniquesGLOBALFOUNDRIES SG PTE LTD·Filed 2016·Granted Oct 24, 2017·0 cites·5 claims
- 2750US9791772B2Monitoring pattern for devicesGLOBALFOUNDRIES SG PTE LTD·Filed 2013·Granted Oct 17, 2017·0 cites·13 claims
- 2849US9384318B2Mask error compensation by optical modeling calibrationGLOBALFOUNDRIES INC·Filed 2014·Granted Jul 5, 2016·0 cites·17 claims
- 2947US9672313B2Method for selective re-routing of selected areas in a target layer and in adjacent interconnecting layers of an IC deviceGLOBALFOUNDRIES INC·Filed 2015·Granted Jun 6, 2017·0 cites·11 claims
- 3047US9672312B2Method wherein test cells and dummy cells are included into a layout of an integrated circuitGLOBALFOUNDRIES INC·Filed 2015·Granted Jun 6, 2017·0 cites·22 claims
- 3147US9645486B2Multiple threshold convergent OPC modelGLOBALFOUNDRIES INC·Filed 2014·Granted May 9, 2017·0 cites·17 claims
- 3245US6207966B1Mark protection with transparent filmADVANCED MICRO DEVICES INC·Filed 1998·Granted Mar 27, 2001·12 cites·29 claims
- 3344US10401724B2Pellicle replacement in EUV mask flowGLOBALFOUNDRIES INC·Filed 2017·Granted Sep 3, 2019·0 cites·20 claims
- 3444US9136223B2Forming alignment mark and resulting markGLOBALFOUNDRIES INC·Filed 2013·Granted Sep 15, 2015·0 cites·17 claims
- 3543US2015028482A1Device layout for reducing through-silicon-via stressGLOBALFOUNDRIES INC·Filed 2013·Application pending·0 cites
- 3642US2015006138A1Optical proximity correction for connecting via between layers of a deviceGLOBALFOUNDRIES INC·Filed 2013·Application pending·0 cites
- 3740US2015221565A1Layout for reticle and wafer scanning electron microscope registration or overlay measurementsGLOBALFOUNDRIES SG PTE LTD·Filed 2015·Application pending·0 cites
- 3834US6178256B1Removal of reticle effect on critical dimension by reticle rotationADVANCED MICRO DEVICES INC·Filed 1998·Granted Jan 23, 2001·3 cites·10 claims
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