Inventor
UEMURA TAKASHI
JP42 patents
⚠️ This page may combine multiple inventors who share the name “UEMURA TAKASHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SUMITOMO ELECTRIC INDUSTRIES
12 patentsUS5821003AOct 13, 1998
Organic electroluminescent device
SUMITOMO ELECTRIC INDUSTRIES59 citations94
US6646164B2Nov 11, 2003
Triphenylamine derivative and organic electroluminescence device comprising the same
SUMITOMO ELECTRIC INDUSTRIES22 citations92
US6337146B1Jan 8, 2002
Hydrogen-occluding layered material
SUMITOMO ELECTRIC INDUSTRIES23 citations92
US6329076B1Dec 11, 2001
Hydrogen storage material and manufacturing method of the same
SUMITOMO ELECTRIC INDUSTRIES27 citations91
US6641647B2Nov 4, 2003
Hydrogen-permeable structure and method of manufacturing the same
SUMITOMO ELECTRIC INDUSTRIES13 citations84
US6572683B2Jun 3, 2003
Substance separation structure and method of preparing the same
SUMITOMO ELECTRIC INDUSTRIES17 citations84
US5637260AJun 10, 1997
Process for producing stabilized carbon cluster conducting material
SUMITOMO ELECTRIC INDUSTRIES15 citations82
US6828037B2Dec 7, 2004
Hydrogen-permeable structure and method for manufacture thereof or repair thereof
SUMITOMO ELECTRIC INDUSTRIES9 citations74
US5635455AJun 3, 1997
Process for producing stabilized carbon cluster conducting or superconducting material
SUMITOMO ELECTRIC INDUSTRIES7 citations73
US5792567AAug 11, 1998
Triazole derivatives and organic electroluminescent devices produced therefrom
SUMITOMO ELECTRIC INDUSTRIES13 citations71
US5589281ADec 31, 1996
Stabilized carbon cluster conducting or superconducting material, process for producing the same, device using carbon cluster, and process for producing the device
SUMITOMO ELECTRIC INDUSTRIES3 citations62
US7618744B2Nov 17, 2009
Thin film lithium battery
SUMITOMO ELECTRIC INDUSTRIES1 citations50
HITACHI HIGH TECH CORP
11 patentsUSD770992SNov 8, 2016
Electrode cover for a plasma processing apparatus
HITACHI HIGH TECH CORP107 citations98
USD812578SMar 13, 2018
Upper chamber for a plasma processing apparatus
HITACHI HIGH TECH CORP21 citations94
USD804436SDec 5, 2017
Upper chamber for a plasma processing apparatus
HITACHI HIGH TECH CORP37 citations94
USD802790SNov 14, 2017
Cover ring for a plasma processing apparatus
HITACHI HIGH TECH CORP18 citations92
USD802545SNov 14, 2017
Lower chamber for a plasma processing apparatus
HITACHI HIGH TECH CORP13 citations84
US11600472B2Mar 7, 2023
Vacuum processing apparatus and operating method of vacuum processing apparatus
HITACHI HIGH TECH CORP6 citations70
US10763088B2Sep 1, 2020
Vacuum processing apparatus
HITACHI HIGH TECH CORP1 citations62
US11776792B2Oct 3, 2023
Plasma processing apparatus and plasma processing method
HITACHI HIGH TECH CORP1 citations57
US11355319B2Jun 7, 2022
Plasma processing apparatus
HITACHI HIGH TECH CORP1 citations56
US10665436B2May 26, 2020
Plasma processing apparatus
HITACHI HIGH TECH CORP1 citations56
US12211674B2Jan 28, 2025
Plasma processing apparatus
HITACHI HIGH TECH CORP0 citations43