Inventor · disambiguated record
Rui Cheng
Also filed as: CHENG RUI · CHENG RUI-HUANG
73 granted patents·37 pending applications·115 citations·filing 2003–2025
98Inventor score
Files withAPPLIED MATERIALS INC94CHENGDU BOE OPTOELECT TECH CO5UNITED MICROELECTRONICS CORP3APPLIED MAERIALS INC1CHENG RUI1
Top patents by PatentIndex Score
110 records- 0197US10636669B2Seam healing using high pressure annealAPPLIED MATERIALS INC·Filed 2019·Granted Apr 28, 2020·15 cites·20 claims
- 0297US10319600B1Thermal silicon etchAPPLIED MATERIALS INC·Filed 2018·Granted Jun 11, 2019·34 cites·20 claims
- 0394US11527408B2Multiple spacer patterning schemesAPPLIED MATERIALS INC·Filed 2020·Granted Dec 13, 2022·4 cites·8 claims
- 0494US10886140B23D NAND etchAPPLIED MATERIALS INC·Filed 2019·Granted Jan 5, 2021·9 cites·19 claims
- 0593US10192775B2Methods for gapfill in high aspect ratio structuresAPPLIED MATERIALS INC·Filed 2017·Granted Jan 29, 2019·7 cites·13 claims
- 0691US10460933B2Two-step process for gapfilling high aspect ratio trenches with amorphous silicon filmAPPLIED MATERIALS INC·Filed 2018·Granted Oct 29, 2019·5 cites·20 claims
- 0790US11640905B2Plasma enhanced deposition of silicon-containing films at low temperatureAPPLIED MATERIALS INC·Filed 2020·Granted May 2, 2023·2 cites·20 claims
- 0890US10626495B2Bottom-up growth of silicon oxide and silicon nitride using sequential deposition-etch-treat processingAPPLIED MATERIALS INC·Filed 2018·Granted Apr 21, 2020·2 cites·20 claims
- 0988US10559465B2Pre-treatment approach to improve continuity of ultra-thin amorphous silicon film on silicon oxideAPPLIED MATERIALS INC·Filed 2018·Granted Feb 11, 2020·5 cites·20 claims
- 1088US10410872B2Borane mediated dehydrogenation process from silane and alkylsilane species for spacer and hardmask applicationAPPLIED MATERIALS INC·Filed 2017·Granted Sep 10, 2019·5 cites·16 claims
- 1188US9991118B2Hybrid carbon hardmask for lateral hardmask recess reductionAPPLIED MATERIALS INC·Filed 2017·Granted Jun 5, 2018·4 cites·19 claims
- 1288US9865459B2Plasma treatment to improve adhesion between hardmask film and silicon oxide filmAPPLIED MATERIALS INC·Filed 2016·Granted Jan 9, 2018·5 cites·21 claims
- 1387US11981998B2Systems and methods for substrate support temperature controlAPPLIED MATERIALS INC·Filed 2020·Granted May 14, 2024·1 cites·12 claims
- 1485US12421607B2Systems and methods for substrate support temperature controlAPPLIED MATERIALS INC·Filed 2024·Granted Sep 23, 2025·0 cites·15 claims
- 1582US12205818B2Boron concentration tunability in boron-silicon filmsAPPLIED MATERIALS INC·Filed 2024·Granted Jan 21, 2025·0 cites·18 claims
- 1682US11361991B2Method for Si gap fill by PECVDAPPLIED MATERIALS INC·Filed 2019·Granted Jun 14, 2022·2 cites·11 claims
- 1782US9640400B1Conformal doping in 3D si structure using conformal dopant depositionAPPLIED MATERIALS INC·Filed 2015·Granted May 2, 2017·3 cites·17 claims
- 1881US11145509B2Method for forming and patterning a layer and/or substrateAPPLIED MATERIALS INC·Filed 2020·Granted Oct 12, 2021·1 cites·17 claims
- 1980US12482646B2Processes for depositing SiB filmsAPPLIED MATERIALS INC·Filed 2024·Granted Nov 25, 2025·0 cites·20 claims
- 2079US12062567B2Systems and methods for substrate support temperature controlAPPLIED MATERIALS INC·Filed 2020·Granted Aug 13, 2024·1 cites·14 claims
- 2179US10529568B2PECVD tungsten containing hardmask films and methods of makingAPPLIED MATERIALS INC·Filed 2017·Granted Jan 7, 2020·2 cites·12 claims
- 2279US10510589B2Cyclic conformal deposition/anneal/etch for Si gapfillAPPLIED MATERIALS INC·Filed 2018·Granted Dec 17, 2019·2 cites·20 claims
- 2379US10276379B2Treatment approach to improve film roughness by improving nucleation/adhesion of silicon oxideAPPLIED MATERIALS INC·Filed 2018·Granted Apr 30, 2019·2 cites·20 claims
- 2479US2025324897A1Display panelCHENGDU BOE OPTOELECT TECH CO·Filed 2025·Application pending·0 cites
- 2579US2025112046A1Boron concentration tunability in boron-silicon filmsAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 2678US9624577B2Deposition of metal doped amorphous carbon filmAPPLIED MATERIALS INC·Filed 2015·Granted Apr 18, 2017·2 cites·8 claims
- 2777US12451345B2PECVD of SiBN thin films with low leakage currentAPPLIED MATERIALS INC·Filed 2024·Granted Oct 21, 2025·0 cites·20 claims
- 2877US2025305142A1Remote capacitively coupled plasma deposition of amorphous siliconAPPLIED MATERIALS INC·Filed 2025·Application pending·0 cites
- 2974US12382820B2Display panelCHENGDU BOE OPTOELECT TECH CO·Filed 2022·Granted Aug 5, 2025·0 cites·17 claims
- 3074US11848232B2Method for Si gap fill by PECVDAPPLIED MATERIALS INC·Filed 2022·Granted Dec 19, 2023·0 cites·20 claims
- 3174US10410864B2Hybrid carbon hardmask for lateral hardmask recess reductionAPPLIED MATERIALS INC·Filed 2018·Granted Sep 10, 2019·1 cites·19 claims
- 3273US11939675B2Apparatus and methods for improving thermal chemical vapor deposition (CVD) uniformityAPPLIED MATERIALS INC·Filed 2018·Granted Mar 26, 2024·1 cites·20 claims
- 3372US11488856B2Methods for gapfill in high aspect ratio structuresAPPLIED MATERIALS INC·Filed 2020·Granted Nov 1, 2022·0 cites·15 claims
- 3472US2025037996A1Seam removal in high aspect ratio gap-fillAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 3570US2023093450A1Multiple spacer patterning schemesAPPLIED MATERIALS INC·Filed 2022·Application pending·0 cites
- 3670US2023340661A1Gapfill Process Using Pulsed High-Frequency Radio-Frequency (HFRF) PlasmaAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 3769US11961739B2Boron concentration tunability in boron-silicon filmsAPPLIED MATERIALS INC·Filed 2020·Granted Apr 16, 2024·0 cites·8 claims
- 3869US11705335B2Conformal high concentration boron doping of semiconductorsAPPLIED MATERIALS INC·Filed 2022·Granted Jul 18, 2023·0 cites·20 claims
- 3969US2025230541A1Gapfill Process Using Pulsed High-Frequency Radio-Frequency (HFRF) PlasmaAPPLIED MATERIALS INC·Filed 2025·Application pending·0 cites
- 4069US2023178419A1Scaled liner layer for isolation structureAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 4168US12183578B2Method for forming and patterning a layer and/or substrateAPPLIED MATERIALS INC·Filed 2021·Granted Dec 31, 2024·0 cites·19 claims
- 4268US11769666B2Selective deposition of silicon using deposition-treat-etch processAPPLIED MATERIALS INC·Filed 2021·Granted Sep 26, 2023·0 cites·20 claims
- 4367US12033848B2Processes for depositing sib filmsAPPLIED MATERIALS INC·Filed 2021·Granted Jul 9, 2024·0 cites·20 claims
- 4467US11515170B23D NAND etchAPPLIED MATERIALS INC·Filed 2020·Granted Nov 29, 2022·0 cites·18 claims
- 4566US11236418B2Bottom-up growth of silicon oxide and silicon nitride using sequential deposition-etch-treat processingAPPLIED MATERIALS INC·Filed 2020·Granted Feb 1, 2022·0 cites·20 claims
- 4665US11315787B2Multiple spacer patterning schemesAPPLIED MATERIALS INC·Filed 2020·Granted Apr 26, 2022·0 cites·14 claims
- 4764US12142480B2Seam removal in high aspect ratio gap-fillAPPLIED MATERIALS INC·Filed 2021·Granted Nov 12, 2024·0 cites·11 claims
- 4864US2023146981A1Hydrogen management in plasma deposited filmsAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 4964US2025207284A1Growth of vertically-aligned nanowires on conductive surfacesUNIV CARNEGIE MELLON·Filed 2023·Application pending·0 cites
- 5063US12197479B2Semantic matching and retrieval method and apparatus and non-transitory computer-readable mediumCHENG RUI·Filed 2023·Granted Jan 14, 2025·0 cites·14 claims
Showing the top 50 of 110 patent records by PatentIndex Score.
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