P

Inventor

OKADA MITSUHIRO

JP114 patents
⚠️ This page may combine multiple inventors who share the name “OKADA MITSUHIRO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TOKYO ELECTRON LTD

22 patents
US9922824B2Mar 20, 2018

Method of forming silicon film

TOKYO ELECTRON LTD338 citations99
US7758920B2Jul 20, 2010

Method and apparatus for forming silicon-containing insulating film

TOKYO ELECTRON LTD81 citations98
US7462571B2Dec 9, 2008

Film formation method and apparatus for semiconductor process for forming a silicon nitride film

TOKYO ELECTRON LTD91 citations98
US8946065B2Feb 3, 2015

Method of forming seed layer and method of forming silicon-containing thin film

TOKYO ELECTRON LTD9 citations84
US7964516B2Jun 21, 2011

Film formation apparatus for semiconductor process and method for using same

TOKYO ELECTRON LTD9 citations84
USD620085SJul 20, 2010

Gas supply pipe for manufacturing semiconductor wafers

TOKYO ELECTRON LTD10 citations84
US7611995B2Nov 3, 2009

Method for removing silicon oxide film and processing apparatus

TOKYO ELECTRON LTD16 citations84
USD588078SMar 10, 2009

Heat dissipation deterrence link for semiconductor manufacture

TOKYO ELECTRON LTD13 citations84
US7416978B2Aug 26, 2008

Film forming method, film forming system and recording medium

TOKYO ELECTRON LTD14 citations84
US8343594B2Jan 1, 2013

Film formation method and apparatus for semiconductor process

TOKYO ELECTRON LTD8 citations83
US7713354B2May 11, 2010

Film forming method, film forming system and recording medium

TOKYO ELECTRON LTD6 citations74
US10570508B2Feb 25, 2020

Film forming apparatus, film forming method and heat insulating member

TOKYO ELECTRON LTD2 citations73
US9758865B2Sep 12, 2017

Silicon film forming method, thin film forming method and cross-sectional shape control method

TOKYO ELECTRON LTD4 citations73
US10460950B2Oct 29, 2019

Substrate processing system and substrate processing method

TOKYO ELECTRON LTD2 citations72
US9540743B2Jan 10, 2017

Amorphous silicon crystallizing method, crystallized silicon film forming method, semiconductor device manufacturing method and film forming apparatus

TOKYO ELECTRON LTD3 citations68
US11551933B2Jan 10, 2023

Substrate processing method and substrate processing apparatus

TOKYO ELECTRON LTD0 citations63
US7696106B2Apr 13, 2010

Film formation method and apparatus for semiconductor process

TOKYO ELECTRON LTD6 citations62
US7211514B2May 1, 2007

Heat-processing method for semiconductor process under a vacuum pressure

TOKYO ELECTRON LTD3 citations62
US12482663B2Nov 25, 2025

Processing apparatus

TOKYO ELECTRON LTD0 citations61
US11600490B2Mar 7, 2023

Silicon film forming method and substrate processing apparatus

TOKYO ELECTRON LTD0 citations61
US11251034B2Feb 15, 2022

Film forming method and substrate processing apparatus

TOKYO ELECTRON LTD0 citations61
US10892162B2Jan 12, 2021

Silicon film forming method and substrate processing apparatus

TOKYO ELECTRON LTD0 citations61

MITSUBA CORP

7 patents

HITACHI LTD

6 patents

OKADA MITSUHIRO

4 patents

ALPS ELECTRIC CO LTD

4 patents

ADEKA CORP

2 patents

YAMAHA MOTOR CO LTD

1 patent

WATANABE MASAHISA

1 patent

SUMITOMO CHEMICAL CO

1 patent

SANYO ELECTRIC CO

1 patent

YAZAKI CORP

1 patent

Showing the top 50 of 114 patents by PatentIndex Score.