P

Inventor

TAKAGI KOSUKE

JP48 patents
⚠️ This page may combine multiple inventors who share the name “TAKAGI KOSUKE”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

HITACHI INT ELECTRIC INC

20 patents
USD783351SApr 11, 2017

Gas nozzle substrate processing apparatus

HITACHI INT ELECTRIC INC473 citations99
USD739832SSep 29, 2015

Reaction tube

HITACHI INT ELECTRIC INC34 citations94
USD725055SMar 24, 2015

Reaction tube

HITACHI INT ELECTRIC INC36 citations94
USD742339SNov 3, 2015

Reaction tube

HITACHI INT ELECTRIC INC18 citations93
USD740769SOct 13, 2015

Boat for substrate processing apparatus

HITACHI INT ELECTRIC INC23 citations92
USD719114SDec 9, 2014

Reaction tube

HITACHI INT ELECTRIC INC19 citations92
USD711843SAug 26, 2014

Reaction tube

HITACHI INT ELECTRIC INC30 citations92
USD748594SFeb 2, 2016

Reaction tube

HITACHI INT ELECTRIC INC11 citations84
USD748578SFeb 2, 2016

Adapter plate

HITACHI INT ELECTRIC INC7 citations84
USD720707SJan 6, 2015

Reaction tube

HITACHI INT ELECTRIC INC14 citations84
USD739831SSep 29, 2015

Boat for substrate processing apparatus

HITACHI INT ELECTRIC INC15 citations83
US10032626B2Jul 24, 2018

Method of manufacturing semiconductor device by forming a film on a substrate, substrate processing apparatus, and recording medium

HITACHI INT ELECTRIC INC9 citations82
US11462401B2Oct 4, 2022

Substrate processing apparatus, method of manufacturing semiconductor device, and non-transitory computer-readable recording medium

HITACHI INT ELECTRIC INC2 citations73
USD748056SJan 26, 2016

Adapter plate

HITACHI INT ELECTRIC INC3 citations73
US11041240B2Jun 22, 2021

Substrate processing apparatus, method of manufacturing semiconductor device, and recording medium

HITACHI INT ELECTRIC INC2 citations72
US10081868B2Sep 25, 2018

Gas supply nozzle, substrate processing apparatus, and non-transitory computer-readable recording medium

HITACHI INT ELECTRIC INC6 citations72
US10767260B2Sep 8, 2020

Substrate processing apparatus, vaporization system and mist filter

HITACHI INT ELECTRIC INC1 citations62
US9263269B2Feb 16, 2016

Reaction tube, substrate processing apparatus and method of manufacturing semiconductor device

HITACHI INT ELECTRIC INC1 citations52
US10287680B2May 14, 2019

Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium

HITACHI INT ELECTRIC INC0 citations51
US11450524B2Sep 20, 2022

Substrate processing apparatus, method of manufacturing semiconductor device, and recording medium

HITACHI INT ELECTRIC INC0 citations50

HONDA MOTOR CO LTD

9 patents

KOKUSAI ELECTRIC CORP

5 patents

TAKAGI KOSUKE

5 patents

OLYMPUS CORP

4 patents

NAKATA TATSUO

1 patent

MATSUO YUICHIRO

1 patent

KOBAYASHI TAMIYO

1 patent

NAKANO MITSUHIRO

1 patent

AMAKAWA GENTA

1 patent