Inventor · disambiguated record
Majeed A. Foad
Also filed as: FOAD MAJEED · FOAD MAJEED A · FOAD MAJEED ALI
77 granted patents·30 pending applications·621 citations·filing 1996–2025
99Inventor score
Files withAPPLIED MATERIALS INC70INTUITIVE SURGICAL OPERATIONS6FOAD MAJEED A5UNIV CALIFORNIA3HANAWA HIROJI2
Top patents by PatentIndex Score
107 records- 0198US9829805B2Vapor deposition deposited photoresist, and manufacturing and lithography systems thereforAPPLIED MATERIALS INC·Filed 2016·Granted Nov 28, 2017·14 cites·12 claims
- 0298US9632411B2Vapor deposition deposited photoresist, and manufacturing and lithography systems thereforAPPLIED MATERIALS INC·Filed 2013·Granted Apr 25, 2017·26 cites·8 claims
- 0397US9612522B2Extreme ultraviolet mask blank production system with thin absorber and manufacturing system thereforAPPLIED MATERIALS INC·Filed 2015·Granted Apr 4, 2017·36 cites·12 claims
- 0496US8709924B2Method for conformal plasma immersed ion implantation assisted by atomic layer depositionHANAWA HIROJI·Filed 2011·Granted Apr 29, 2014·30 cites·7 claims
- 0596US5977552ABoron ion sources for ion implantation apparatusAPPLIED MATERIALS INC·Filed 1997·Granted Nov 2, 1999·120 cites·27 claims
- 0695US11700993B2Electronic assemblies including a conformal moisture barrierINTUITIVE SURGICAL OPERATIONS·Filed 2020·Granted Jul 18, 2023·3 cites·20 claims
- 0792US9739913B2Extreme ultraviolet capping layer and method of manufacturing and lithography thereofAPPLIED MATERIALS INC·Filed 2015·Granted Aug 22, 2017·8 cites·17 claims
- 0891US9581889B2Planarized extreme ultraviolet lithography blank with absorber and manufacturing system thereforAPPLIED MATERIALS INC·Filed 2015·Granted Feb 28, 2017·3 cites·10 claims
- 0990US9354508B2Planarized extreme ultraviolet lithography blank, and manufacturing and lithography systems thereforAPPLIED MATERIALS INC·Filed 2013·Granted May 31, 2016·5 cites·32 claims
- 1090US7225047B2Method, system and medium for controlling semiconductor wafer processes using critical dimension measurementsAPPLIED MATERIALS INC·Filed 2002·Granted May 29, 2007·46 cites·44 claims
- 1190US5969366AIon implanter with post mass selection decelerationAPPLIED MATERIALS INC·Filed 1996·Granted Oct 19, 1999·67 cites·18 claims
- 1288US11493841B2Glass ceramic for ultraviolet lithography and method of manufacturing thereofAPPLIED MATERIALS INC·Filed 2019·Granted Nov 8, 2022·2 cites·14 claims
- 1388US9508375B2Modification of magnetic properties of films using ion and neutral beam implantationFOAD MAJEED A·Filed 2010·Granted Nov 29, 2016·5 cites·9 claims
- 1487US9870935B2Monitoring system for deposition and method of operation thereofAPPLIED MATERIALS INC·Filed 2015·Granted Jan 16, 2018·4 cites·7 claims
- 1587US7531469B2Dosimetry using optical emission spectroscopy/residual gas analyzer in conjunction with ion currentAPPLIED MATERIALS INC·Filed 2007·Granted May 12, 2009·8 cites·16 claims
- 1686US9018110B2Apparatus and methods for microwave processing of semiconductor substratesSTOWELL MICHAEL W·Filed 2012·Granted Apr 28, 2015·7 cites·18 claims
- 1785US9581890B2Extreme ultraviolet reflective element with multilayer stack and method of manufacturing thereofAPPLIED MATERIALS INC·Filed 2015·Granted Feb 28, 2017·3 cites·20 claims
- 1885US8535766B2Patterning of magnetic thin film using energized ionsVERHAVERBEKE STEVEN·Filed 2008·Granted Sep 17, 2013·8 cites·9 claims
- 1985US8354035B2Method for removing implanted photo resist from hard disk drive substratesAPPLIED MATERIALS INC·Filed 2010·Granted Jan 15, 2013·4 cites·19 claims
- 2085US7732269B2Method of ultra-shallow junction formation using Si film alloyed with carbonAPPLIED MATERIALS INC·Filed 2007·Granted Jun 8, 2010·10 cites·2 claims
- 2185US7078302B2Gate electrode dopant activation method for semiconductor manufacturing including a laser annealAPPLIED MATERIALS INC·Filed 2004·Granted Jul 18, 2006·28 cites·33 claims
- 2284US10209613B2System and method for manufacturing planarized extreme ultraviolet lithography blankAPPLIED MATERIALS INC·Filed 2016·Granted Feb 19, 2019·2 cites·15 claims
- 2384US9595436B2Growing graphene on substratesAPPLIED MATERIALS INC·Filed 2013·Granted Mar 14, 2017·4 cites·19 claims
- 2484US7482255B2Method of ion implantation to reduce transient enhanced diffusionGRAOUI HOUDA·Filed 2005·Granted Jan 27, 2009·14 cites·24 claims
- 2583US9915621B2Extreme ultraviolet (EUV) substrate inspection system with simplified optics and method of manufacturing thereofAPPLIED MATERIALS INC·Filed 2014·Granted Mar 13, 2018·4 cites·12 claims
- 2683US8551578B2Patterning of magnetic thin film using energized ions and thermal excitationNALAMASU OMKARAM·Filed 2008·Granted Oct 8, 2013·9 cites·8 claims
- 2782US8316867B2Electrostatic chuck cleaning during semiconductor substrate processingJENNINGS DEAN C·Filed 2011·Granted Nov 27, 2012·5 cites·17 claims
- 2881US12178398B2Electronic assemblies including a conformal moisture barrierINTUITIVE SURGICAL OPERATIONS·Filed 2023·Granted Dec 31, 2024·0 cites·20 claims
- 2981US7993465B2Electrostatic chuck cleaning during semiconductor substrate processingAPPLIED MATERIALS INC·Filed 2006·Granted Aug 9, 2011·6 cites·15 claims
- 3081US7968439B2Plasma immersion ion implantation method using a pure or nearly pure silicon seasoning layer on the chamber interior surfacesAPPLIED MATERIALS INC·Filed 2008·Granted Jun 28, 2011·6 cites·13 claims
- 3181US2025185894A1Electronic assemblies including a conformal moisture barrierINTUITIVE SURGICAL OPERATIONS·Filed 2024·Application pending·0 cites
- 3279US8900405B2Plasma immersion ion implantation reactor with extended cathode process ringPORSHNEV PETER I·Filed 2007·Granted Dec 2, 2014·6 cites·18 claims
- 3378US7713757B2Method for measuring dopant concentration during plasma ion implantationAPPLIED MATERIALS INC·Filed 2008·Granted May 11, 2010·4 cites·25 claims
- 3477US9343347B2Portable electrostatic chuck carrier for thin substratesAPPLIED MATERIALS INC·Filed 2013·Granted May 17, 2016·3 cites·20 claims
- 3575US7659184B2Plasma immersion ion implantation process with chamber seasoning and seasoning layer plasma discharging for wafer dechuckingAPPLIED MATERIALS INC·Filed 2008·Granted Feb 9, 2010·3 cites·13 claims
- 3674US8747942B2Carbon nanotube-based solar cellsNALAMASU OMKARAM·Filed 2010·Granted Jun 10, 2014·3 cites·13 claims
- 3774US7871828B2In-situ dose monitoring using optical emission spectroscopyAPPLIED MATERIALS INC·Filed 2008·Granted Jan 18, 2011·4 cites·8 claims
- 3873US8642128B2Enhanced scavenging of residual fluorine radicals using silicon coating on process chamber wallsCHOI DONGWON·Filed 2010·Granted Feb 4, 2014·4 cites·17 claims
- 3973US7691755B2Plasma immersion ion implantation with highly uniform chamber seasoning process for a toroidal source reactorAPPLIED MATERIALS INC·Filed 2007·Granted Apr 6, 2010·4 cites·16 claims
- 4073US7611976B2Gate electrode dopant activation method for semiconductor manufacturingAPPLIED MATERIALS INC·Filed 2006·Granted Nov 3, 2009·3 cites·43 claims
- 4172US10763091B2Physical vapor deposition chamber particle reduction apparatus and methodsAPPLIED MATERIALS INC·Filed 2017·Granted Sep 1, 2020·1 cites·18 claims
- 4271US7811877B2Method of controlling metal silicide formationAPPLIED MATERIALS INC·Filed 2007·Granted Oct 12, 2010·3 cites·20 claims
- 4371US7674723B2Plasma immersion ion implantation using an electrode with edge-effect suppression by a downwardly curving edgeAPPLIED MATERIALS INC·Filed 2008·Granted Mar 9, 2010·2 cites·18 claims
- 4470US10551732B2Extreme ultraviolet mask blank production system with thin absorber and manufacturing system thereforAPPLIED MATERIALS INC·Filed 2018·Granted Feb 4, 2020·1 cites·15 claims
- 4569US10012908B2Extreme ultraviolet reflective element with multilayer stack and method of manufacturing thereofAPPLIED MATERIALS INC·Filed 2017·Granted Jul 3, 2018·0 cites·18 claims
- 4669US8317970B2Ceiling electrode with process gas dispersers housing plural inductive RF power applicators extending into the plasmaLAI CANFENG·Filed 2008·Granted Nov 27, 2012·3 cites·9 claims
- 4768US9263078B2Patterning of magnetic thin film using energized ionsAPPLIED MATERIALS INC·Filed 2013·Granted Feb 16, 2016·0 cites·5 claims
- 4868US6200883B1Ion implantation methodAPPLIED MATERIALS INC·Filed 1997·Granted Mar 13, 2001·33 cites·18 claims
- 4967US8927400B2Safe handling of low energy, high dose arsenic, phosphorus, and boron implanted wafersAPPLIED MATERIALS INC·Filed 2014·Granted Jan 6, 2015·1 cites·11 claims
- 5067US8003500B2Plasma immersion ion implantation process with chamber seasoning and seasoning layer plasma discharging for wafer dechuckingAPPLIED MATERIALS INC·Filed 2009·Granted Aug 23, 2011·1 cites·7 claims
Showing the top 50 of 107 patent records by PatentIndex Score.
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