Inventor
YAGI NORIAKI
JP50 patents
⚠️ This page may combine multiple inventors who share the name “YAGI NORIAKI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOSHIBA KK
38 patentsUS5503681AApr 2, 1996
Method of cleaning an object
TOSHIBA KK106 citations99
US5660917AAug 26, 1997
Thermal conductivity sheet
TOSHIBA KK219 citations98
US5769962AJun 23, 1998
Cleaning method
TOSHIBA KK38 citations96
US5741365AApr 21, 1998
Continuous method for cleaning industrial parts using a polyorganosiloxane
TOSHIBA KK57 citations96
US5716456AFeb 10, 1998
Method for cleaning an object with an agent including water and a polyorganosiloxane
TOSHIBA KK42 citations96
US5443747AAug 22, 1995
Cleaning compositions
TOSHIBA KK65 citations96
US5418071AMay 23, 1995
Sputtering target and method of manufacturing the same
TOSHIBA KK67 citations96
US5196916AMar 23, 1993
Highly purified metal material and sputtering target using the same
TOSHIBA KK54 citations96
US6329275B1Dec 11, 2001
Interconnector line of thin film, sputter target for forming the wiring film and electronic component using the same
TOSHIBA KK76 citations95
US5654115AAug 5, 1997
Hydrogen-absorbing alloy for battery, method of manufacturing the same, and secondary nickel-metal hydride battery
TOSHIBA KK92 citations95
US10231305B2Mar 12, 2019
White light source system
TOSHIBA KK15 citations94
US5409517AApr 25, 1995
Sputtering target and method of manufacturing the same
TOSHIBA KK44 citations94
US5204057AApr 20, 1993
Highly purified titanium material and its named article, a sputtering target
TOSHIBA KK31 citations93
US5679983AOct 21, 1997
Highly purified metal material and sputtering target using the same
TOSHIBA KK22 citations92
US5470527ANov 28, 1995
Ti-W sputtering target and method for manufacturing same
TOSHIBA KK53 citations92
US5458697AOct 17, 1995
Highly purified metal material and sputtering target using the same
TOSHIBA KK28 citations92
US5302817AApr 12, 1994
X-ray detector and X-ray examination system utilizing fluorescent material
TOSHIBA KK53 citations92
US5612571AMar 18, 1997
Sputtered silicide film
TOSHIBA KK18 citations91
US5508000AApr 16, 1996
Sputtering target and method of manufacturing the same
TOSHIBA KK26 citations91
US11094679B2Aug 17, 2021
White light source system
TOSHIBA KK4 citations84
US10674577B2Jun 2, 2020
White light source system
TOSHIBA KK6 citations84
US10375786B2Aug 6, 2019
White light source system
TOSHIBA KK6 citations84
US6309593B1Oct 30, 2001
Refractory metal silicide target, method of manufacturing the target, refractory metal silicide thin film, and semiconductor device
TOSHIBA KK15 citations82
US5741367AApr 21, 1998
Method for drying parts using a polyorganosiloxane
TOSHIBA KK12 citations82
US5538024AJul 23, 1996
Cleaning method and cleaning apparatus
TOSHIBA KK15 citations82
US6210634B1Apr 3, 2001
Highly purified titanium material, method for preparation of it and sputtering target using it
TOSHIBA KK10 citations74
US5584906ADec 17, 1996
Highly purified titanium material, method for preparation of it and sputtering target using it
TOSHIBA KK10 citations74
US5086554AFeb 11, 1992
Method of manufacturing a magnetic core
TOSHIBA KK12 citations74
US10420183B2Sep 17, 2019
White light source and white light source system
TOSHIBA KK6 citations73
USRE41975ENov 30, 2010
Interconnector line of thin film, sputter target for forming the wiring film and electronic component using the same
TOSHIBA KK6 citations73
US5843372ADec 1, 1998
Hydrogen-absorbing alloy for battery, method of manufacturing the same, and secondary nickel-metal hydride battery
TOSHIBA KK11 citations73
US5728228AMar 17, 1998
Method for removing residual liquid from parts using a polyorganosiloxane
TOSHIBA KK4 citations73
US6352628B2Mar 5, 2002
Refractory metal silicide target, method of manufacturing the target, refractory metal silicide thin film, and semiconductor device
TOSHIBA KK8 citations72
US6400025B1Jun 4, 2002
Highly purified titanium material, method for preparation of it and sputtering target using it
TOSHIBA KK4 citations63
US5772781AJun 30, 1998
Method for cleaning an object using an agent that includes a polyorganosiloxane or isoparaffin
TOSHIBA KK2 citations63
US4983943AJan 8, 1991
Magnetic core and method of manufacturing same
TOSHIBA KK3 citations63
US5288561AFeb 22, 1994
High temperature heat-treating jig
TOSHIBA KK4 citations58
US5370837ADec 6, 1994
High temperature heat-treating jig
TOSHIBA KK0 citations47
SEOUL SEMICONDUCTOR CO LTD
6 patentsUS11721675B2Aug 8, 2023
White light source system
SEOUL SEMICONDUCTOR CO LTD4 citations85
US11978726B2May 7, 2024
White light source system
SEOUL SEMICONDUCTOR CO LTD2 citations73
US12072069B2Aug 27, 2024
Method for using white light source, and white light source
SEOUL SEMICONDUCTOR CO LTD2 citations72
US12546443B2Feb 10, 2026
Method for using white light source, and white light source
SEOUL SEMICONDUCTOR CO LTD0 citations62
US12482794B2Nov 25, 2025
White light source system
SEOUL SEMICONDUCTOR CO LTD0 citations62
US11430771B2Aug 30, 2022
White light source system
SEOUL SEMICONDUCTOR CO LTD0 citations62
TOSHIBA SILICONE
5 patentsUS6136766AOct 24, 2000
Cleaning compositions
TOSHIBA SILICONE106 citations98
US5985810ANov 16, 1999
Cleaning compositions
TOSHIBA SILICONE109 citations98
US5977040ANov 2, 1999
Cleaning compositions
TOSHIBA SILICONE113 citations98
US5888312AMar 30, 1999
Cleaning method
TOSHIBA SILICONE8 citations74
US5833761ANov 10, 1998
Method of cleaning an object including a cleaning step and a vapor drying step
TOSHIBA SILICONE10 citations74