P

Inventor

ISHIGAMI TAKASHI

JP64 patents
⚠️ This page may combine multiple inventors who share the name “ISHIGAMI TAKASHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TOSHIBA KK

21 patents
US6033536AMar 7, 2000

Magnetron sputtering method and sputtering target

TOSHIBA KK56 citations96
US5686980ANov 11, 1997

Light-shielding film, useable in an LCD, in which fine particles of a metal or semi-metal are dispersed in and throughout an inorganic insulating film

TOSHIBA KK112 citations96
US5418071AMay 23, 1995

Sputtering target and method of manufacturing the same

TOSHIBA KK67 citations96
US5196916AMar 23, 1993

Highly purified metal material and sputtering target using the same

TOSHIBA KK54 citations96
US6329275B1Dec 11, 2001

Interconnector line of thin film, sputter target for forming the wiring film and electronic component using the same

TOSHIBA KK76 citations95
US6736947B1May 18, 2004

Sputtering target, A1 interconnection film, and electronic component

TOSHIBA KK18 citations93
US5204057AApr 20, 1993

Highly purified titanium material and its named article, a sputtering target

TOSHIBA KK31 citations93
US5679983AOct 21, 1997

Highly purified metal material and sputtering target using the same

TOSHIBA KK22 citations92
US5470527ANov 28, 1995

Ti-W sputtering target and method for manufacturing same

TOSHIBA KK53 citations92
US5458697AOct 17, 1995

Highly purified metal material and sputtering target using the same

TOSHIBA KK28 citations92
US6165607ADec 26, 2000

Sputtering target and antiferromagnetic film and magneto-resistance effect element formed by using the same

TOSHIBA KK44 citations91
US4891066AJan 2, 1990

Highly pure titanium

TOSHIBA KK31 citations91
US4793854ADec 27, 1988

Highly pure titanium and process for producing the same

TOSHIBA KK31 citations91
US7998324B2Aug 16, 2011

Sputtering target and process for producing si oxide film therewith

TOSHIBA KK7 citations83
US5530467AJun 25, 1996

Sputtering target, film resistor and thermal printer head

TOSHIBA KK18 citations82
US6929726B2Aug 16, 2005

Sputtering target, Al interconnection film, and electronic component

TOSHIBA KK6 citations74
US6210634B1Apr 3, 2001

Highly purified titanium material, method for preparation of it and sputtering target using it

TOSHIBA KK10 citations74
US5584906ADec 17, 1996

Highly purified titanium material, method for preparation of it and sputtering target using it

TOSHIBA KK10 citations74
USRE41975ENov 30, 2010

Interconnector line of thin film, sputter target for forming the wiring film and electronic component using the same

TOSHIBA KK6 citations73
US4634635AJan 6, 1987

Black ornament

TOSHIBA KK15 citations73
USRE34598EMay 3, 1994

Highly pure titanium

TOSHIBA KK6 citations72

HITACHI LTD

10 patents

NEC CORP

6 patents

HITACHI AUTOMOTIVE SYSTEMS LTD

3 patents

NEC ELECTRONICS CORP

2 patents

ISHIGAMI TAKASHI

2 patents

SAITO YASUYUKI

1 patent

NAGANAWA TAKASHI

1 patent

HIRAMATSU HIROMICHI

1 patent

SUGIMOTO SHINJI

1 patent

RENESAS ELECTRONICS CORP

1 patent

TANAKA YUICHIRO

1 patent

Showing the top 50 of 64 patents by PatentIndex Score.