Inventor
ISHIGAMI TAKASHI
JP64 patents
⚠️ This page may combine multiple inventors who share the name “ISHIGAMI TAKASHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOSHIBA KK
21 patentsUS6033536AMar 7, 2000
Magnetron sputtering method and sputtering target
TOSHIBA KK56 citations96
US5686980ANov 11, 1997
Light-shielding film, useable in an LCD, in which fine particles of a metal or semi-metal are dispersed in and throughout an inorganic insulating film
TOSHIBA KK112 citations96
US5418071AMay 23, 1995
Sputtering target and method of manufacturing the same
TOSHIBA KK67 citations96
US5196916AMar 23, 1993
Highly purified metal material and sputtering target using the same
TOSHIBA KK54 citations96
US6329275B1Dec 11, 2001
Interconnector line of thin film, sputter target for forming the wiring film and electronic component using the same
TOSHIBA KK76 citations95
US6736947B1May 18, 2004
Sputtering target, A1 interconnection film, and electronic component
TOSHIBA KK18 citations93
US5204057AApr 20, 1993
Highly purified titanium material and its named article, a sputtering target
TOSHIBA KK31 citations93
US5679983AOct 21, 1997
Highly purified metal material and sputtering target using the same
TOSHIBA KK22 citations92
US5470527ANov 28, 1995
Ti-W sputtering target and method for manufacturing same
TOSHIBA KK53 citations92
US5458697AOct 17, 1995
Highly purified metal material and sputtering target using the same
TOSHIBA KK28 citations92
US6165607ADec 26, 2000
Sputtering target and antiferromagnetic film and magneto-resistance effect element formed by using the same
TOSHIBA KK44 citations91
US4891066AJan 2, 1990
Highly pure titanium
TOSHIBA KK31 citations91
US4793854ADec 27, 1988
Highly pure titanium and process for producing the same
TOSHIBA KK31 citations91
US7998324B2Aug 16, 2011
Sputtering target and process for producing si oxide film therewith
TOSHIBA KK7 citations83
US5530467AJun 25, 1996
Sputtering target, film resistor and thermal printer head
TOSHIBA KK18 citations82
US6929726B2Aug 16, 2005
Sputtering target, Al interconnection film, and electronic component
TOSHIBA KK6 citations74
US6210634B1Apr 3, 2001
Highly purified titanium material, method for preparation of it and sputtering target using it
TOSHIBA KK10 citations74
US5584906ADec 17, 1996
Highly purified titanium material, method for preparation of it and sputtering target using it
TOSHIBA KK10 citations74
USRE41975ENov 30, 2010
Interconnector line of thin film, sputter target for forming the wiring film and electronic component using the same
TOSHIBA KK6 citations73
US4634635AJan 6, 1987
Black ornament
TOSHIBA KK15 citations73
USRE34598EMay 3, 1994
Highly pure titanium
TOSHIBA KK6 citations72
HITACHI LTD
10 patentsUS6229241B1May 8, 2001
Structure and manufacturing method for motor and stator
HITACHI LTD90 citations98
US7825562B2Nov 2, 2010
Rotary electric machine, crank-shaped continuously winding coil, distribution winding stator and forming method thereof
HITACHI LTD25 citations92
US7453179B2Nov 18, 2008
DC brushless motor for electrical power steering and the production method thereof
HITACHI LTD17 citations92
US6222296B1Apr 24, 2001
Electric motor having a stator with an end core part having a different shape than a central core part
HITACHI LTD22 citations92
US8384263B2Feb 26, 2013
Rotating electrical machine having a compact stator
HITACHI LTD13 citations84
US8354769B2Jan 15, 2013
Rotating electrical machine and manufacturing method of a stator thereof
HITACHI LTD11 citations84
US8030812B2Oct 4, 2011
Rotating electric apparatus and method for connecting stator coils thereof
HITACHI LTD16 citations84
US7936100B2May 3, 2011
Stator for rotating machine and rotating machine using the same
HITACHI LTD11 citations84
US7242128B2Jul 10, 2007
DC brushless motor for electrical power steering and the production method thereof
HITACHI LTD8 citations74
US7683516B2Mar 23, 2010
Production method for rotating electric machine and stator coils, and electric power steering motor
HITACHI LTD5 citations63
NEC CORP
6 patentsUS6091081AJul 18, 2000
Insulating film comprising amorphous carbon fluoride, a semiconductor device comprising such an insulating film
NEC CORP55 citations96
US6097094AAug 1, 2000
Semiconductor device having wiring layers and method of fabricating the same
NEC CORP21 citations93
US5593923AJan 14, 1997
Method of fabricating semiconductor device having refractory metal silicide layer on impurity region using damage implant and single step anneal
NEC CORP20 citations90
US6241859B1Jun 5, 2001
Method of forming a self-aligned refractory metal silicide layer
NEC CORP7 citations74
US6127267AOct 3, 2000
Fabrication method of semiconductor device equipped with silicide layer
NEC CORP14 citations74
US6372628B1Apr 16, 2002
Insulating film comprising amorphous carbon fluoride, a semiconductor device comprising such an insulating film, and a method for manufacturing the semiconductor device
NEC CORP11 citations73
HITACHI AUTOMOTIVE SYSTEMS LTD
3 patentsUS9496773B2Nov 15, 2016
Rotating electrical machine and method for manufacturing rotating electrical machine
HITACHI AUTOMOTIVE SYSTEMS LTD27 citations94
US10348149B2Jul 9, 2019
Stator for rotating electric machine and rotating electric machine including the stator
HITACHI AUTOMOTIVE SYSTEMS LTD2 citations72
US9281724B2Mar 8, 2016
Rotating electrical machine including concentrated single-layer winding coil
HITACHI AUTOMOTIVE SYSTEMS LTD2 citations63
NEC ELECTRONICS CORP
2 patentsUS7138700B2Nov 21, 2006
Semiconductor device with guard ring for preventing water from entering circuit region from outside
NEC ELECTRONICS CORP26 citations92
US7230337B2Jun 12, 2007
Semiconductor device including ladder-shaped siloxane hydride and method for manufacturing same
NEC ELECTRONICS CORP9 citations73
ISHIGAMI TAKASHI
2 patentsSAITO YASUYUKI
1 patentNAGANAWA TAKASHI
1 patentHIRAMATSU HIROMICHI
1 patentSUGIMOTO SHINJI
1 patentRENESAS ELECTRONICS CORP
1 patentTANAKA YUICHIRO
1 patentShowing the top 50 of 64 patents by PatentIndex Score.