Inventor
UENO MASAAKI
JP44 patents
⚠️ This page may combine multiple inventors who share the name “UENO MASAAKI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HITACHI INT ELECTRIC INC
17 patentsUS6746908B2Jun 8, 2004
Temperature controlling method, thermal treating apparatus, and method of manufacturing semiconductor device
HITACHI INT ELECTRIC INC24 citations92
US7577493B2Aug 18, 2009
Temperature regulating method, thermal processing system and semiconductor device manufacturing method
HITACHI INT ELECTRIC INC14 citations84
US7346273B2Mar 18, 2008
Substrate processing equipment
HITACHI INT ELECTRIC INC9 citations84
US6767752B2Jul 27, 2004
Temperature control method and semiconductor device manufacturing method
HITACHI INT ELECTRIC INC8 citations74
US9695511B2Jul 4, 2017
Substrate processing apparatus, method of manufacturing semiconductor device and method of processing substrate
HITACHI INT ELECTRIC INC3 citations73
US10340151B2Jul 2, 2019
Substrate processing apparatus, heating apparatus, ceiling heat insulator, and method of manufacturing semiconductor device
HITACHI INT ELECTRIC INC2 citations72
USD803075SNov 21, 2017
Thermometry tool for substrate processing apparatus
HITACHI INT ELECTRIC INC2 citations72
US9587884B2Mar 7, 2017
Insulation structure and method of manufacturing semiconductor device
HITACHI INT ELECTRIC INC2 citations72
USD819463SJun 5, 2018
Protector tube for thermocouple
HITACHI INT ELECTRIC INC2 citations71
USD818850SMay 29, 2018
Protector tube for thermocouple
HITACHI INT ELECTRIC INC4 citations71
US7727780B2Jun 1, 2010
Substrate processing method and semiconductor manufacturing apparatus
HITACHI INT ELECTRIC INC6 citations63
US10415136B2Sep 17, 2019
Substrate processing apparatus including heating and cooling device, and ceiling part included in the same
HITACHI INT ELECTRIC INC1 citations62
US8367975B2Feb 5, 2013
Temperature adjustment method
HITACHI INT ELECTRIC INC2 citations62
US7930059B2Apr 19, 2011
Temperature regulating method, thermal processing system and semiconductor device manufacturing method
HITACHI INT ELECTRIC INC4 citations62
US7700054B2Apr 20, 2010
Substrate processing apparatus having gas side flow via gas inlet
HITACHI INT ELECTRIC INC5 citations62
US10418293B2Sep 17, 2019
Substrate processing apparatus, method of manufacturing semiconductor device, and thermocouple support
HITACHI INT ELECTRIC INC0 citations52
US9269638B2Feb 23, 2016
Temperature detecting apparatus, substrate processing apparatus and method of manufacturing semiconductor device
HITACHI INT ELECTRIC INC0 citations52
KOKUSAI ELECTRIC CORP
12 patentsUS11043402B2Jun 22, 2021
Cooling unit, heat insulating structure, and substrate processing apparatus
KOKUSAI ELECTRIC CORP4 citations73
USD860419SSep 17, 2019
Electric furnace for substrate processing apparatus
KOKUSAI ELECTRIC CORP3 citations73
USD860420SSep 17, 2019
Electric furnace for substrate processing apparatus
KOKUSAI ELECTRIC CORP3 citations73
US12504332B2Dec 23, 2025
Substrate temperature sensor, substrate retainer and substrate processing apparatus
KOKUSAI ELECTRIC CORP0 citations62
US12503770B2Dec 23, 2025
Substrate processing apparatus and non-transitory computer-readable recording medium
KOKUSAI ELECTRIC CORP0 citations62
US11906367B2Feb 20, 2024
Substrate temperature sensor, substrate retainer and substrate processing apparatus
KOKUSAI ELECTRIC CORP0 citations62
US11761087B2Sep 19, 2023
Substrate processing apparatus and non-transitory computer-readable recording medium
KOKUSAI ELECTRIC CORP0 citations62
US11049742B2Jun 29, 2021
Substrate processing apparatus, method of manufacturing semiconductor device, and thermocouple support
KOKUSAI ELECTRIC CORP0 citations62
US12293930B2May 6, 2025
Substrate processing apparatus, method of manufacturing semiconductor device and heater
KOKUSAI ELECTRIC CORP0 citations52
US12085338B2Sep 10, 2024
Heater, temperature control system, and processing apparatus
KOKUSAI ELECTRIC CORP0 citations51
US12461507B2Nov 4, 2025
Substrate processing apparatus, substrate processing method, semiconductor device manufacturing method, and control program
KOKUSAI ELECTRIC CORP0 citations48
US12566423B2Mar 3, 2026
Temperature control method, method of manufacturing semiconductor device, non-transitory computer-readable recording medium and substrate processing apparatus
KOKUSAI ELECTRIC CORP0 citations47
UENO MASAAKI
3 patentsUS8501599B2Aug 6, 2013
Substrate processing apparatus and substrate processing method
UENO MASAAKI470 citations97
US8148271B2Apr 3, 2012
Substrate processing apparatus, coolant gas supply nozzle and semiconductor device manufacturing method
UENO MASAAKI22 citations91
US8507296B2Aug 13, 2013
Substrate processing method and film forming method
UENO MASAAKI4 citations60
HAYASHIDA AKIRA
3 patentsUS8158911B2Apr 17, 2012
Heating apparatus, substrate processing apparatus employing the same, method of manufacturing semiconductor devices, and extending member
HAYASHIDA AKIRA3 citations59
US8116618B2Feb 14, 2012
Heating apparatus, substrate processing apparatus, and method of manufacturing semiconductor devices
HAYASHIDA AKIRA2 citations59
US9184069B2Nov 10, 2015
Heating apparatus, substrate processing apparatus employing the same, method of manufacturing semiconductor devices, and insulator
HAYASHIDA AKIRA1 citations48