Inventor

KOKUBO TADAYOSHI

JP33 patents

Patents

33 patents

US5576143ANov 19, 1996

Light-sensitive composition

FUJI PHOTO FILM CO LTD133 citations98

US5360692ANov 1, 1994

Positive type 1,2-naphthoquinonediazide photoresist composition containing benzotriazole light absorbing agent

FUJI PHOTO FILM CO LTD116 citations98

US5110709AMay 5, 1992

Light-sensitive positive working composition containing a pisolfone compound

FUJI PHOTO FILM CO LTD77 citations96

US5707777AJan 13, 1998

Light-sensitive composition

FUJI PHOTO FILM CO LTD51 citations93

US5290658AMar 1, 1994

Positive type photoresist composition comprising polyaromatic hydroxy quinone diazide esters as the photosensitive ingredient

FUJI PHOTO FILM CO LTD23 citations93

US5153096AOct 6, 1992

Positive type photoresist composition comprising as a photosensitive ingredient a derivative of a triphenylmethane condensed with an o-quinone diazide

FUJI PHOTO FILM CO LTD25 citations93

US5565300AOct 15, 1996

Positive photoresist composition

FUJI PHOTO FILM CO LTD34 citations92

US5389492AFeb 14, 1995

Resist composition comprising a siloxane or silsesquioxane polymer having silanol groups in a composition with a naphthoquinone compound

FUJI PHOTO FILM CO LTD32 citations92

US5340697AAug 23, 1994

Positive photoresist composition comprising a novolak resin having a cycloalkylidene-bisphenol group

FUJI PHOTO FILM CO LTD9 citations74

US5429905AJul 4, 1995

Positive working photoresist composition containing naphthoquinone diazide sulfonic acid ester of polyhydroxy compound

FUJI PHOTO FILM CO LTD11 citations74

US5340688AAug 23, 1994

Positive type photoresist composition

FUJI PHOTO FILM CO LTD8 citations74

US5324619AJun 28, 1994

Positive quinone diazide photoresist composition containing select polyhydroxy additive

FUJI PHOTO FILM CO LTD7 citations74

US5248582ASep 28, 1993

Positive-type photoresist composition

FUJI PHOTO FILM CO LTD12 citations74

US5130224AJul 14, 1992

Positive-working photoresist composition

FUJI PHOTO FILM CO LTD9 citations74

US5089373AFeb 18, 1992

Positive photoresist composition utilizing O-quinonediazide and novolak resin

FUJI PHOTO FILM CO LTD13 citations74

US5030550AJul 9, 1991

Developer for positive type photoresists

FUJI PHOTO FILM CO LTD13 citations74

US4894311AJan 16, 1990

Positive-working photoresist composition

FUJI PHOTO FILM CO LTD16 citations74

US4657846AApr 14, 1987

Silver halide photographic printing paper

FUJI PHOTO FILM CO LTD11 citations74

US4639416AJan 27, 1987

Internal latent image-type silver halide emulsion

FUJI PHOTO FILM CO LTD9 citations74

US4592991AJun 3, 1986

Silver halide photographic printing paper

FUJI PHOTO FILM CO LTD14 citations74

US5380618AJan 10, 1995

Micropattern-forming material having a low molecular weight novolak resin, a quinone diazide sulfonyl ester and a solvent

FUJI PHOTO FILM CO LTD10 citations73

US4842986AJun 27, 1989

Positively working resist material

FUJI PHOTO FILM CO LTD7 citations72

US5576139ANov 19, 1996

Positive type photoresist composition comprising a novolak resin made with a silica-magnesia solid catalyst

FUJI PHOTO FILM CO LTD3 citations63

US5318875AJun 7, 1994

Positive quinonediazide photoresist composition containing select hydroxyphenol additive

FUJI PHOTO FILM CO LTD3 citations63

US5324618AJun 28, 1994

Positive type quinonediazide photoresist composition containing select tetraphenolic additive

FUJI PHOTO FILM CO LTD1 citations52

KOKUBO TADAYOSHI

Patents

Light-sensitive composition

Positive type 1,2-naphthoquinonediazide photoresist composition containing benzotriazole light absorbing agent

Light-sensitive positive working composition containing a pisolfone compound

Light-sensitive composition

Positive type photoresist composition comprising polyaromatic hydroxy quinone diazide esters as the photosensitive ingredient

Positive type photoresist composition comprising as a photosensitive ingredient a derivative of a triphenylmethane condensed with an o-quinone diazide

Positive photoresist composition

Resist composition comprising a siloxane or silsesquioxane polymer having silanol groups in a composition with a naphthoquinone compound

Negative type photoresist composition

Positive-type photoresist composition

Positive-working photoresist composition

Positive-working photoresist composition

Positive-working o-quinone diazide photoresist composition

Silver halide photographic light-sensitive material

Heat-developable photographic material

Heat-developable photographic material

Positive photoresist composition comprising a novolak resin having a cycloalkylidene-bisphenol group

Positive working photoresist composition containing naphthoquinone diazide sulfonic acid ester of polyhydroxy compound

Positive type photoresist composition

Positive quinone diazide photoresist composition containing select polyhydroxy additive

Positive-type photoresist composition

Positive-working photoresist composition

Positive photoresist composition utilizing O-quinonediazide and novolak resin

Developer for positive type photoresists

Positive-working photoresist composition

Silver halide photographic printing paper

Internal latent image-type silver halide emulsion

Silver halide photographic printing paper

Micropattern-forming material having a low molecular weight novolak resin, a quinone diazide sulfonyl ester and a solvent

Positively working resist material

Positive type photoresist composition comprising a novolak resin made with a silica-magnesia solid catalyst

Positive quinonediazide photoresist composition containing select hydroxyphenol additive

Positive type quinonediazide photoresist composition containing select tetraphenolic additive