P

Inventor

AMANO YOSHIFUMI

JP52 patents
⚠️ This page may combine multiple inventors who share the name “AMANO YOSHIFUMI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TOKYO ELECTRON LTD

27 patents
US8828183B2Sep 9, 2014

Substrate processing apparatus and substrate processing method

TOKYO ELECTRON LTD30 citations90
US9859136B2Jan 2, 2018

Substrate processing apparatus and substrate processing method

TOKYO ELECTRON LTD5 citations82
US9623434B2Apr 18, 2017

Substrate processing apparatus

TOKYO ELECTRON LTD3 citations73
US12142496B2Nov 12, 2024

Substrate processing apparatus and substrate processing method

TOKYO ELECTRON LTD2 citations72
USD934991SNov 2, 2021

Component of a liquid discharge nozzle for semiconductor substrate processing apparatus

TOKYO ELECTRON LTD5 citations72
US10643865B2May 5, 2020

Substrate cleaning apparatus

TOKYO ELECTRON LTD3 citations72
US11437252B2Sep 6, 2022

Substrate processing apparatus and substrate processing method

TOKYO ELECTRON LTD2 citations71
US10217628B2Feb 26, 2019

Substrate processing apparatus and processing method of substrate processing apparatus

TOKYO ELECTRON LTD2 citations71
US9536761B2Jan 3, 2017

Substrate liquid processing apparatus

TOKYO ELECTRON LTD5 citations71
US10046372B2Aug 14, 2018

Liquid processing apparatus

TOKYO ELECTRON LTD4 citations68
US12176224B2Dec 24, 2024

Substrate processing apparatus and substrate processing method

TOKYO ELECTRON LTD0 citations62
USD930796SSep 14, 2021

Liquid discharge nozzle for semiconductor substrate processing apparatus

TOKYO ELECTRON LTD0 citations62
USD929534SAug 31, 2021

Liquid discharge nozzle for semiconductor substrate processing apparatus

TOKYO ELECTRON LTD1 citations62
US11069546B2Jul 20, 2021

Substrate processing system

TOKYO ELECTRON LTD1 citations62
US12300524B2May 13, 2025

Substrate processing system

TOKYO ELECTRON LTD0 citations61
US11018035B2May 25, 2021

Substrate processing system

TOKYO ELECTRON LTD0 citations61
US11776824B2Oct 3, 2023

Processing liquid ejection nozzle, nozzle arm, substrate processing apparatus, and substrate processing method

TOKYO ELECTRON LTD1 citations60
US12133297B2Oct 29, 2024

Substrate processing apparatus

TOKYO ELECTRON LTD0 citations52
US9564347B2Feb 7, 2017

Liquid processing apparatus and liquid processing method

TOKYO ELECTRON LTD0 citations52
US10128137B2Nov 13, 2018

Management method of substrate processing apparatus and substrate processing system

TOKYO ELECTRON LTD0 citations51
US9793142B2Oct 17, 2017

Substrate processing apparatus and substrate processing method

TOKYO ELECTRON LTD1 citations51
US12569887B2Mar 10, 2026

Substrate processing apparatus and substrate processing method

TOKYO ELECTRON LTD0 citations50
US11011436B2May 18, 2021

Substrate processing apparatus, control method of substrate processing apparatus and substrate processing system

TOKYO ELECTRON LTD0 citations50
US10707102B2Jul 7, 2020

Substrate processing apparatus and substrate processing method

TOKYO ELECTRON LTD0 citations50
US9782807B2Oct 10, 2017

Substrate processing system, method for controlling substrate processing system, and storage medium

TOKYO ELECTRON LTD0 citations50
US9308559B2Apr 12, 2016

Substrate processing apparatus, substrate processing method and storage medium

TOKYO ELECTRON LTD0 citations42
US9895711B2Feb 20, 2018

Substrate liquid processing apparatus, substrate liquid processing method and substrate processing apparatus

TOKYO ELECTRON LTD0 citations40

SONY CORP

8 patents

AMANO YOSHIFUMI

7 patents

TECHNOLOGY TRADE & TRANSFER

6 patents

HIGASHIJIMA JIRO

1 patent

NAKANO VINEGAR CO LTD

1 patent

Showing the top 50 of 52 patents by PatentIndex Score.