Inventor · disambiguated record
Ankur Agarwal
Also filed as: AGARWAL ANKUR · AGARWAL ANKUR BHUSHAN
18 granted patents·9 pending applications·214 citations·filing 2005–2019
93Inventor score
Top patents by PatentIndex Score
27 records- 0197US8382999B2Pulsed plasma high aspect ratio dielectric processAPPLIED MATERIALS INC·Filed 2010·Granted Feb 26, 2013·55 cites·9 claims
- 0296US8962488B2Synchronized radio frequency pulsing for plasma etchingAPPLIED MATERIALS INC·Filed 2013·Granted Feb 24, 2015·30 cites·15 claims
- 0394US9745663B2Symmetrical inductively coupled plasma source with symmetrical flow chamberAPPLIED MATERIALS INC·Filed 2012·Granted Aug 29, 2017·8 cites·18 claims
- 0494US8404598B2Synchronized radio frequency pulsing for plasma etchingLIAO BRYAN·Filed 2010·Granted Mar 26, 2013·77 cites·20 claims
- 0591US10790180B2Electrostatic chuck with variable pixelated magnetic fieldAPPLIED MATERIALS INC·Filed 2019·Granted Sep 29, 2020·5 cites·9 claims
- 0690US8974684B2Synchronous embedded radio frequency pulsing for plasma etchingBANNA SAMER·Filed 2012·Granted Mar 10, 2015·15 cites·18 claims
- 0786US10131994B2Inductively coupled plasma source with top coil over a ceiling and an independent side coil and independent air flowAPPLIED MATERIALS INC·Filed 2012·Granted Nov 20, 2018·4 cites·13 claims
- 0886US9896769B2Inductively coupled plasma source with multiple dielectric windows and window-supporting structureAPPLIED MATERIALS INC·Filed 2012·Granted Feb 20, 2018·4 cites·15 claims
- 0981US10573493B2Inductively coupled plasma apparatusAPPLIED MATERIALS INC·Filed 2016·Granted Feb 25, 2020·2 cites·12 claims
- 1080US8980760B2Methods and apparatus for controlling plasma in a process chamberAGARWAL ANKUR·Filed 2012·Granted Mar 17, 2015·7 cites·20 claims
- 1178US9520294B2Atomic layer etch process using an electron beamAPPLIED MATERIALS INC·Filed 2014·Granted Dec 13, 2016·3 cites·16 claims
- 1267US9362131B2Fast atomic layer etch process using an electron beamAPPLIED MATERIALS INC·Filed 2014·Granted Jun 7, 2016·1 cites·20 claims
- 1366US10460968B2Electrostatic chuck with variable pixelated magnetic fieldAPPLIED MATERIALS INC·Filed 2013·Granted Oct 29, 2019·1 cites·6 claims
- 1466US2019085467A1Plasma Reactor Having Radial Struts for Substrate SupportAPPLIED MATERIALS INC·Filed 2018·Application pending·0 cites
- 1563US2017350017A1Symmetrical Inductively Coupled Plasma Source with Symmetrical Flow ChamberAPPLIED MATERIALS INC·Filed 2017·Application pending·0 cites
- 1663US2017350018A1Inductively Coupled Plasma Source with Multiple Dielectric Windows and Window Supporting StructureAPPLIED MATERIALS INC·Filed 2017·Application pending·0 cites
- 1761US7704878B2Contact spacer formation using atomic layer depositionADVANCED MICRO DEVICES INC·Filed 2005·Granted Apr 27, 2010·2 cites·22 claims
- 1859US2011094994A1Inductively coupled plasma apparatusAPPLIED MATERIALS INC·Filed 2010·Application pending·0 cites
- 1956US2019348260A1Method and apparatus for ion energy distribution manipulation for plasma processing chambers that allows ion energy boosting through amplitude modulationAPPLIED MATERIALS INC·Filed 2019·Application pending·0 cites
- 2055US2013134129A1Inductively coupled plasma apparatusAPPLIED MATERIALS INC·Filed 2013·Application pending·0 cites
- 2152US10395896B2Method and apparatus for ion energy distribution manipulation for plasma processing chambers that allows ion energy boosting through amplitude modulationAPPLIED MATERIALS INC·Filed 2017·Granted Aug 27, 2019·0 cites·20 claims
- 2248US9449796B2Plasma processing system including a symmetrical remote plasma source for minimal ion energyAPPLIED MATERIALS INC·Filed 2014·Granted Sep 20, 2016·0 cites·20 claims
- 2343US9978606B2Methods for atomic level resolution and plasma processing controlAPPLIED MATERIALS INC·Filed 2016·Granted May 22, 2018·0 cites·20 claims
- 2443US2013098555A1Electron beam plasma source with profiled conductive fins for uniform plasma generationBERA KALLOL·Filed 2012·Application pending·0 cites
- 2541US8562742B2Apparatus for radial delivery of gas to a chamber and methods of use thereofLEE JARED AHMAD·Filed 2010·Granted Oct 22, 2013·0 cites·20 claims
- 2641US2013105085A1Plasma reactor with chamber wall temperature controlAPPLIED MATERIALS INC·Filed 2012·Application pending·0 cites
- 2738US2011097901A1Dual mode inductively coupled plasma reactor with adjustable phase coil assemblyAPPLIED MATERIALS INC·Filed 2010·Application pending·0 cites
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