Inventor
YEDLA SRINIVASA RAO
IN20 patents
Patents
20 patentsUSD937329SNov 30, 2021
Sputter target for a physical vapor deposition chamber
APPLIED MATERIALS INC19 citations93
USD970566SNov 22, 2022
Sputter target for a physical vapor deposition chamber
APPLIED MATERIALS INC12 citations84
US12080571B2Sep 3, 2024
Substrate processing module and method of moving a workpiece
APPLIED MATERIALS INC5 citations74
US10998209B2May 4, 2021
Substrate processing platforms including multiple processing chambers
APPLIED MATERIALS INC2 citations73
US11817331B2Nov 14, 2023
Substrate holder replacement with protective disk during pasting process
APPLIED MATERIALS INC2 citations72
US11749542B2Sep 5, 2023
Apparatus, system, and method for non-contact temperature monitoring of substrate supports
APPLIED MATERIALS INC3 citations72
US11600507B2Mar 7, 2023
Pedestal assembly for a substrate processing chamber
APPLIED MATERIALS INC2 citations72
US12347719B2Jul 1, 2025
Floating pin for substrate transfer
APPLIED MATERIALS INC3 citations71
US11610799B2Mar 21, 2023
Electrostatic chuck having a heating and chucking capabilities
APPLIED MATERIALS INC2 citations69
US12506020B2Dec 23, 2025
Substrate processing module and method of moving a workpiece
APPLIED MATERIALS INC0 citations62
US12266551B2Apr 1, 2025
Apparatus, system, and method for non-contact temperature monitoring of substrate supports
APPLIED MATERIALS INC0 citations62
US12217982B2Feb 4, 2025
Isolated volume seals and method of forming an isolated volume within a processing chamber
APPLIED MATERIALS INC0 citations61
US11955355B2Apr 9, 2024
Isolated volume seals and method of forming an isolated volume within a processing chamber
APPLIED MATERIALS INC1 citations61
US11646217B2May 9, 2023
Transfer apparatus and substrate-supporting member
APPLIED MATERIALS INC0 citations61
US12043896B2Jul 23, 2024
Symmetric pump down mini-volume with laminar flow cavity gas injection for high and low pressure
APPLIED MATERIALS INC0 citations59
US11674227B2Jun 13, 2023
Symmetric pump down mini-volume with laminar flow cavity gas injection for high and low pressure
APPLIED MATERIALS INC0 citations59
US11492697B2Nov 8, 2022
Apparatus for improved anode-cathode ratio for rf chambers
APPLIED MATERIALS INC0 citations58
US12509756B2Dec 30, 2025
Reduced substrate process chamber cavity volume
APPLIED MATERIALS INC0 citations51
US12195314B2Jan 14, 2025
Cathode exchange mechanism to improve preventative maintenance time for cluster system
APPLIED MATERIALS INC0 citations51
US12002668B2Jun 4, 2024
Thermal management hardware for uniform temperature control for enhanced bake-out for cluster tool
APPLIED MATERIALS INC0 citations48