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Sputter target for a physical vapor deposition chamber

90
Assignee: APPLIED MATERIALS INCPriority: Mar 23, 2020Filed: Oct 26, 2021Granted: Nov 22, 2022
Est. expiryMar 23, 2040(~13.7 yrs left)· nominal 20-yr term from priority
Inventors:Martin Lee RikerWilliam FruchtermanIlya LavitskySrinivasa Rao YedlaKirankumar Neelasandra Savandaiah
90
PatentIndex Score
12
Cited by
136
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1
Claims

Claims

exact text as granted — not AI-modified
CLAIM 
     
       We claim the ornamental design for a sputter target for a physical vapor deposition chamber, as shown and described.

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