Inventor · disambiguated record
Martin Lee Riker
Also filed as: RIKER MARTIN · RIKER MARTIN LEE
47 granted patents·11 pending applications·1,175 citations·filing 2007–2024
98Inventor score
Top patents by PatentIndex Score
58 records- 0199US7942969B2Substrate cleaning chamber and componentsAPPLIED MATERIALS INC·Filed 2007·Granted May 17, 2011·492 cites·22 claims
- 0297USD801942STarget profile for a physical vapor deposition chamber targetAPPLIED MATERIALS INC·Filed 2015·Granted Nov 7, 2017·336 cites·1 claims
- 0396US9960024B2Biasable flux optimizer / collimator for PVD sputter chamberAPPLIED MATERIALS INC·Filed 2016·Granted May 1, 2018·12 cites·15 claims
- 0496US9543126B2Collimator for use in substrate processing chambersAPPLIED MATERIALS INC·Filed 2015·Granted Jan 10, 2017·21 cites·20 claims
- 0595US11810770B2Methods and apparatus for controlling ion fraction in physical vapor deposition processesAPPLIED MATERIALS INC·Filed 2021·Granted Nov 7, 2023·2 cites·20 claims
- 0694US8696878B2Wafer processing deposition shielding componentsRIKER MARTIN LEE·Filed 2012·Granted Apr 15, 2014·19 cites·6 claims
- 0794US8559159B2Electrostatic chuck and methods of use thereofROY SHAMBHU N·Filed 2011·Granted Oct 15, 2013·21 cites·20 claims
- 0893USD937329SSputter target for a physical vapor deposition chamberAPPLIED MATERIALS INC·Filed 2020·Granted Nov 30, 2021·19 cites·1 claims
- 0990USD970566SSputter target for a physical vapor deposition chamberAPPLIED MATERIALS INC·Filed 2021·Granted Nov 22, 2022·12 cites·1 claims
- 1089USD868124STarget profile for a physical vapor deposition chamber targetAPPLIED MATERIALS INC·Filed 2017·Granted Nov 26, 2019·28 cites·1 claims
- 1189US10347474B2Biasable flux optimizer / collimator for PVD sputter chamberAPPLIED MATERIALS INC·Filed 2018·Granted Jul 9, 2019·4 cites·20 claims
- 1289USD837755STarget profile for a physical vapor deposition chamber targetAPPLIED MATERIALS INC·Filed 2017·Granted Jan 8, 2019·30 cites·1 claims
- 1389USD836572STarget profile for a physical vapor deposition chamber targetAPPLIED MATERIALS INC·Filed 2016·Granted Dec 25, 2018·30 cites·1 claims
- 1488US9476122B2Wafer processing deposition shielding componentsAPPLIED MATERIALS INC·Filed 2014·Granted Oct 25, 2016·6 cites·9 claims
- 1587US11037768B2Methods and apparatus for controlling ion fraction in physical vapor deposition processesAPPLIED MATERIALS INC·Filed 2017·Granted Jun 15, 2021·4 cites·8 claims
- 1687US10727033B2Biasable flux optimizer / collimator for PVD sputter chamberAPPLIED MATERIALS INC·Filed 2019·Granted Jul 28, 2020·1 cites·20 claims
- 1787USD869409STarget profile for a physical vapor deposition chamber targetAPPLIED MATERIALS INC·Filed 2018·Granted Dec 10, 2019·22 cites·1 claims
- 1886USD946638STarget profile for a physical vapor deposition chamber targetAPPLIED MATERIALS INC·Filed 2019·Granted Mar 22, 2022·20 cites·1 claims
- 1985US10312065B2Physical vapor deposition (PVD) plasma energy control per dynamic magnetron controlAPPLIED MATERIALS INC·Filed 2016·Granted Jun 4, 2019·4 cites·20 claims
- 2084USD997111SCollimator for use in a physical vapor deposition (PVD) chamberAPPLIED MATERIALS INC·Filed 2022·Granted Aug 29, 2023·9 cites·1 claims
- 2183US9062379B2Wafer processing deposition shielding componentsRIKER MARTIN LEE·Filed 2012·Granted Jun 23, 2015·6 cites·19 claims
- 2282US12094699B2Methods and apparatus for controlling ion fraction in physical vapor deposition processesAPPLIED MATERIALS INC·Filed 2023·Granted Sep 17, 2024·0 cites·20 claims
- 2382USD998575SCollimator for use in a physical vapor deposition (PVD) chamberAPPLIED MATERIALS INC·Filed 2020·Granted Sep 12, 2023·10 cites·1 claims
- 2482US9960021B2Physical vapor deposition (PVD) target having low friction padsAPPLIED MATERIALS INC·Filed 2014·Granted May 1, 2018·5 cites·13 claims
- 2575USD1038901SCollimator for a physical vapor deposition chamberAPPLIED MATERIALS INC·Filed 2022·Granted Aug 13, 2024·5 cites·1 claims
- 2675US11309169B2Biasable flux optimizer / collimator for PVD sputter chamberAPPLIED MATERIALS INC·Filed 2020·Granted Apr 19, 2022·0 cites·20 claims
- 2773USD859333SCollimator for a physical vapor deposition chamberAPPLIED MATERIALS INC·Filed 2018·Granted Sep 10, 2019·14 cites·1 claims
- 2873USD858468SCollimator for a physical vapor deposition chamberAPPLIED MATERIALS INC·Filed 2018·Granted Sep 3, 2019·14 cites·1 claims
- 2973US8980045B2Substrate cleaning chamber and componentsRIKER MARTIN·Filed 2011·Granted Mar 17, 2015·3 cites·23 claims
- 3072US12325909B2EM source for enhanced plasma controlAPPLIED MATERIALS INC·Filed 2022·Granted Jun 10, 2025·0 cites·14 claims
- 3172USD1026839SCollimator for a physical vapor deposition (PVD) chamberAPPLIED MATERIALS INC·Filed 2022·Granted May 14, 2024·4 cites·1 claims
- 3272USD1025936SCollimator for a physical vapor deposition (PVD) chamberAPPLIED MATERIALS INC·Filed 2022·Granted May 7, 2024·4 cites·1 claims
- 3372USD1024149SCollimator for a physical vapor deposition (PVD) chamberAPPLIED MATERIALS INC·Filed 2022·Granted Apr 23, 2024·4 cites·1 claims
- 3472USD1009816SCollimator for a physical vapor deposition chamberAPPLIED MATERIALS INC·Filed 2021·Granted Jan 2, 2024·5 cites·1 claims
- 3572US10438828B2Methods and apparatus to prevent interference between processing chambersAPPLIED MATERIALS INC·Filed 2017·Granted Oct 8, 2019·1 cites·18 claims
- 3671USD1025935SCollimator for a physical vapor deposition (PVD) chamberAPPLIED MATERIALS INC·Filed 2022·Granted May 7, 2024·4 cites·1 claims
- 3770USD1026054SCollimator for a physical vapor deposition (PVD) chamberAPPLIED MATERIALS INC·Filed 2022·Granted May 7, 2024·4 cites·1 claims
- 3868US2021071294A1Methods and apparatus for controlling ion fraction in physical vapor deposition processesAPPLIED MATERIALS INC·Filed 2020·Application pending·0 cites
- 3967US2024384396A1Biased or floating process shield to reduce ion loss to control film deposition and improve step coverageAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 4066US11692262B2EM source for enhanced plasma controlAPPLIED MATERIALS INC·Filed 2020·Granted Jul 4, 2023·0 cites·18 claims
- 4163US11492699B2Substrate temperature non-uniformity reduction over target life using spacing compensationAPPLIED MATERIALS INC·Filed 2021·Granted Nov 8, 2022·0 cites·18 claims
- 4263US2009260982A1Wafer processing deposition shielding componentsAPPLIED MATERIALS INC·Filed 2009·Application pending·0 cites
- 4362US11990319B2Methods and apparatus for processing a substrateAPPLIED MATERIALS INC·Filed 2022·Granted May 21, 2024·0 cites·20 claims
- 4460US2025146119A1Dual collimator physical vapor depositions processing chamberAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 4559US11335577B2Methods and apparatus to prevent interference between processing chambersAPPLIED MATERIALS INC·Filed 2019·Granted May 17, 2022·0 cites·11 claims
- 4659US2024213007A1Power Compensation in PVD ChambersAPPLIED MATERIALS INC·Filed 2022·Application pending·0 cites
- 4755US12203163B2Methods for shaping magnetic fields during semiconductor processingAPPLIED MATERIALS INC·Filed 2021·Granted Jan 21, 2025·0 cites·18 claims
- 4854US11492697B2Apparatus for improved anode-cathode ratio for rf chambersAPPLIED MATERIALS INC·Filed 2020·Granted Nov 8, 2022·0 cites·17 claims
- 4953US11915915B2Apparatus for generating magnetic fields during semiconductor processingAPPLIED MATERIALS INC·Filed 2021·Granted Feb 27, 2024·0 cites·20 claims
- 5053US2009308739A1Wafer processing deposition shielding componentsAPPLIED MATERIALS INC·Filed 2009·Application pending·0 cites
Showing the top 50 of 58 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →