USD937329SActiveUtility

Sputter target for a physical vapor deposition chamber

93
Assignee: APPLIED MATERIALS INCPriority: Mar 23, 2020Filed: Mar 23, 2020Granted: Nov 30, 2021
Est. expiryMar 23, 2040(~13.7 yrs left)· nominal 20-yr term from priority
Inventors:Martin Lee RikerWilliam FruchtermanIlya LavitskySrinivasa Rao YedlaKirankumar Neelasandra Savandaiah
93
PatentIndex Score
19
Cited by
167
References
1
Claims

Claims

exact text as granted — not AI-modified
CLAIM 
     
       We claim the ornamental design for a sputter target for a physical vapor deposition chamber, as shown and described.

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