P

Inventor

KITAGAWA JUNICHI

JP61 patents
⚠️ This page may combine multiple inventors who share the name “KITAGAWA JUNICHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TOKYO ELECTRON LTD

19 patents
USD593585SJun 2, 2009

Top panel for microwave introduction window of a plasma processing apparatus

TOKYO ELECTRON LTD424 citations98
USD571831SJun 24, 2008

Top panel for microwave introduction window of a plasma processing apparatus

TOKYO ELECTRON LTD437 citations98
USD571383SJun 17, 2008

Top panel for microwave introduction window of a plasma processing apparatus

TOKYO ELECTRON LTD431 citations98
USD572733SJul 8, 2008

Top panel for microwave introduction window of a plasma processing apparatus

TOKYO ELECTRON LTD26 citations92
USD571833SJun 24, 2008

Top panel for microwave introduction window of plasma processing apparatus

TOKYO ELECTRON LTD24 citations92
US8372761B2Feb 12, 2013

Plasma oxidation processing method, plasma processing apparatus and storage medium

TOKYO ELECTRON LTD9 citations83
US7875322B2Jan 25, 2011

Plasma processing method

TOKYO ELECTRON LTD16 citations83
USD571832SJun 24, 2008

Top panel for microwave introduction window of a plasma processing apparatus

TOKYO ELECTRON LTD15 citations83
US8034179B2Oct 11, 2011

Method for insulating film formation, storage medium from which information is readable with computer, and processing system

TOKYO ELECTRON LTD3 citations63
US7910493B2Mar 22, 2011

Semiconductor device manufacturing method, semiconductor device, plasma nitriding treatment method, control program and computer storage medium

TOKYO ELECTRON LTD2 citations63
US7807234B2Oct 5, 2010

Plasma processing method, plasma processing apparatus, and computer recording medium

TOKYO ELECTRON LTD2 citations63
US8034183B2Oct 11, 2011

Cleaning method and plasma processing method

TOKYO ELECTRON LTD4 citations62
US7972973B2Jul 5, 2011

Method for forming silicon oxide film, plasma processing apparatus and storage medium

TOKYO ELECTRON LTD3 citations62
US7632758B2Dec 15, 2009

Process and apparatus for forming oxide film, and electronic device material

TOKYO ELECTRON LTD2 citations62
USD594485SJun 16, 2009

Top panel for microwave introduction window of a plasma processing apparatus

TOKYO ELECTRON LTD3 citations62
US7955922B2Jun 7, 2011

Manufacturing method of fin-type field effect transistor

TOKYO ELECTRON LTD3 citations61
US7910495B2Mar 22, 2011

Plasma oxidizing method, plasma processing apparatus, and storage medium

TOKYO ELECTRON LTD5 citations61
US8026187B2Sep 27, 2011

Method of forming silicon oxide film and method of production of semiconductor memory device using this method

TOKYO ELECTRON LTD0 citations52
US8043979B2Oct 25, 2011

Plasma oxidizing method, storage medium, and plasma processing apparatus

TOKYO ELECTRON LTD0 citations51

JFE STEEL CORP

13 patents

OLYMPUS OPTICAL CO

4 patents

OLYMPUS CORP

3 patents

HONDA MOTOR CO LTD

2 patents

NIPPON KOKAN KK

2 patents

HORI MASARU

1 patent

UNIV NAGOYA NAT UNIV CORP

1 patent

KABE YOSHIRO

1 patent

KITAGAWA JUNICHI

1 patent

FUJINO YUTAKA

1 patent

MONDEN TAICHI

1 patent

NORO HISATO

1 patent

Showing the top 50 of 61 patents by PatentIndex Score.