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Top panel for microwave introduction window of a plasma processing apparatus

98
Assignee: TOKYO ELECTRON LTDPriority: Jul 29, 2005Filed: Jan 30, 2006Granted: Jun 2, 2009
Est. expiryJul 29, 2025(expired)· nominal 20-yr term from priority
Inventors:Kinya OtaCai Zhong TianJunichi Kitagawa
98
PatentIndex Score
424
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14
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1
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Claims

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CLAIM 
     
       The ornamental design for a top panel for microwave introduction window of a plasma processing apparatus, as shown and described.

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