Inventor

KOTANI TOSHIYA

JP97 patents

⚠️ This page may combine multiple inventors who share the name “KOTANI TOSHIYA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

KOTANI TOSHIYA

TOSHIBA KK

Method of setting process parameter and method of setting process parameter and/or design rule

Design layout preparing method

Pattern creation method, mask manufacturing method and semiconductor device manufacturing method

Method and system for correcting a mask pattern design

Pattern forming method and semiconductor device manufactured by using said pattern forming method

Method of setting process parameter and method of setting process parameter and/or design rule

Mask pattern correction method, mask pattern creation system using the correction method, and computer-readable recording medium

Semiconductor integrated circuit designing method and system

Mask pattern correction method and a recording medium which records a mask pattern correction program

Mask manufacturing system, mask data creating method and manufacturing method of semiconductor device

Design pattern correction method and mask pattern producing method

Photomask management method and photomask wash limit generating method

Parameter adjustment method, semiconductor device manufacturing method, and recording medium

Method of determining photo mask, method of manufacturing semiconductor device, and computer program product

Semiconductor integrated circuit designing method and system using a design rule modification

Design pattern data preparing method, mask pattern data preparing method, mask manufacturing method, semiconductor device manufacturing method, and program recording medium

Method for correcting a mask pattern, system for correcting a mask pattern, program, method for manufacturing a photomask and method for manufacturing a semiconductor device

Pattern correcting method, mask making method, method of manufacturing semiconductor device, pattern correction system, and computer-readable recording medium having pattern correction program recorded therein

Pattern dimension correction method and verification method using OPC, mask and semiconductor device fabricated by using the correction method, and system and software product for executing the correction method

Method of manufacturing a photo mask and method of manufacturing a semiconductor device

Pattern correction method of semiconductor device

Mask data generating apparatus, a computer implemented method for generating mask data and a computer program for controlling the mask data generating apparatus

Pattern forming method and semiconductor device manufactured by using said pattern forming method

Semiconductor memory device

Mask data processing method for optimizing hierarchical structure

Method for correcting a mask pattern, system for correcting a mask pattern, program, method for manufacturing a photomask and method for manufacturing a semiconductor device

Method for making a design layout and mask

Pattern data correction method, pattern checking method, pattern check program, photo mask producing method, and semiconductor device manufacturing method

Pattern-producing method for semiconductor device

Calculating method, verification method, verification program and verification system for edge deviation quantity, and semiconductor device manufacturing method

Pattern formation method, mask for exposure used for pattern formation, and method of manufacturing the same

Method of designing an LSI pattern to be formed on a specimen with a bent portion

Mask pattern design method and a photomask

Mask pattern preparing method and photomask

Structure inspection method, pattern formation method, process condition determination method and resist pattern evaluation apparatus

Mask pattern generating method and manufacturing method of semiconductor apparatus

Semiconductor device, method for making pattern layout, method for making mask pattern, method for making layout, method for manufacturing photo mask, photo mask, and method for manufacturing semiconductor device

Mask pattern correcting method, mask pattern inspecting method, photo mask manufacturing method, and semiconductor device manufacturing method

Mask pattern preparation method, semiconductor device manufacturing method and recording medium

Semiconductor device and method for manufacturing

System, method and program for generating mask data, exposure mask and semiconductor device in consideration of optical proximity effects

Calculating method, verification method, verification program and verification system for edge deviation quantity, and semiconductor device manufacturing method

Method and system for forming a mask pattern, method of manufacturing a semiconductor device, system forming a mask pattern on data, cell library and method of forming a photomask

KOTANI TOSHIYA

Method for making a design layout of a semiconductor integrated circuit

Pattern generating method, method of manufacturing semiconductor device, computer program product, and pattern-shape-determination-parameter generating method

TOSHIBA MEMORY CORP

Method of wiring layout, semiconductor device, program for supporting design of wiring layout, and method for manufacturing semiconductor device

Method of wiring layout, semiconductor device, program for supporting design of wiring layout, and method for manufacturing semiconductor device

FUKUHARA KAZUYA

Mask pattern correcting method

IZUHA KYOKO

Method and system for correcting a mask pattern design

HASHIMOTO TAKAKI

Semiconductor device and manufacturing method of semiconductor device