Inventor

INOUE SOICHI

JP120 patents

⚠️ This page may combine multiple inventors who share the name “INOUE SOICHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

INOUE SOICHI

TOSHIBA KK

Method of setting process parameter and method of setting process parameter and/or design rule

Exposure apparatus and method

Projectin exposure apparatus

Projection exposure apparatus

Optical proximity correction system

Design layout preparing method

Optical proximity correction method

Method of repairing defect of structure

Mask and method for focus monitoring

Control method for exposure apparatus and control method for semiconductor manufacturing apparatus

Pattern forming method

Filter manufacturing apparatus

Focused ion beam deposition using TMCTS

Phase shifting mask comprising a multilayer structure and method of forming a pattern using the same

Micropattern forming method

Pattern forming method and semiconductor device manufactured by using said pattern forming method

Method for correcting a mask pattern, a computer program product, a method for producing a photomask, and method for manufacturing a semiconductor device

Method of setting process parameter and method of setting process parameter and/or design rule

Inspection method of photo mask for use in manufacturing semiconductor device

Mask pattern correction method, mask pattern creation system using the correction method, and computer-readable recording medium

Alignment method, overlay deviation inspection method and photomask

Method and apparatus for correcting mask pattern, mask having corrected mask pattern, and storage medium storing program for executing the method for correcting mask pattern

Method of processing exposure mask-pattern data, simulation using this method, and recording medium

Semiconductor integrated circuit designing method and system

Pattern size evaluation apparatus

Method of examining an exposure tool

Exposure monitor mask, exposure adjusting method and method of manufacturing semiconductor devices

Mask pattern correction method and a recording medium which records a mask pattern correction program

Topography simulation method

Profile simulation method

Method and system for evaluating distribution of absorption light amount in optical lithography

Semiconductor device fabrication method and semiconductor device

Focus monitoring method, exposure apparatus, and exposure mask

Method of manufacturing a semiconductor device, method of manufacturing a photomask, and a master mask

Exposure dose measuring method and exposure dose measuring mask

Parameter adjustment method, semiconductor device manufacturing method, and recording medium

Semiconductor integrated circuit designing method and system using a design rule modification

Design pattern data preparing method, mask pattern data preparing method, mask manufacturing method, semiconductor device manufacturing method, and program recording medium

Method for correcting a mask pattern, system for correcting a mask pattern, program, method for manufacturing a photomask and method for manufacturing a semiconductor device

Exposure control method and method of manufacturing a semiconductor device

Exposure method for correcting a focal point, and a method for manufacturing a semiconductor device

Photomask having a focus monitor pattern

Method of manufacturing a photo mask and method of manufacturing a semiconductor device

Pattern forming method and semiconductor device manufactured by using said pattern forming method

Monitoring method, exposure method, a manufacturing method for a semiconductor device, including an etching method and exposure processing unit

Exposure mask pattern correction method, pattern formation method, and a program product for operating a computer

NIKON CORP

TOSHIBA MEMORY CORP

Semiconductor memory device and method for manufacturing same

KOTANI TOSHIYA

Method for making a design layout of a semiconductor integrated circuit