P

Inventor

WATANABE KATSUHIDE

JP50 patents
⚠️ This page may combine multiple inventors who share the name “WATANABE KATSUHIDE”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

EBARA CORP

42 patents
USD633452SMar 1, 2011

Elastic membrane for semiconductor wafer polishing apparatus

EBARA CORP342 citations99
US5765800AJun 16, 1998

Vibration damping apparatus

EBARA CORP98 citations97
US5904608AMay 18, 1999

Polishing apparatus having interlock function

EBARA CORP56 citations96
US5876012AMar 2, 1999

Vibration cancellation apparatus

EBARA CORP59 citations95
US5397212AMar 14, 1995

Robot with dust-free and maintenance-free actuators

EBARA CORP88 citations94
US5142175AAug 25, 1992

Magnetic bearing system

EBARA CORP40 citations93
US5951368ASep 14, 1999

Polishing apparatus

EBARA CORP34 citations92
US5471802ADec 5, 1995

Electromagnetically suspended floating floor apparatus

EBARA CORP20 citations92
US5449985ASep 12, 1995

Zero-power control type vibration eliminating apparatus

EBARA CORP21 citations92
US6515388B1Feb 4, 2003

Magnetic levitation control apparatus

EBARA CORP24 citations91
US6042454AMar 28, 2000

System for detecting the endpoint of the polishing of a semiconductor wafer by a semiconductor wafer polisher

EBARA CORP28 citations91
US5720010AFeb 17, 1998

Control system for a linear actuator including magnetic bearings for levitating a robot arm

EBARA CORP30 citations91
US5793598AAug 11, 1998

Magnetically levitated vibration damping apparatus

EBARA CORP27 citations90
US6437864B1Aug 20, 2002

Stage positioning device

EBARA CORP36 citations89
US5385217AJan 31, 1995

Vibration eliminating apparatus for elminating vibration of an installation floor

EBARA CORP35 citations89
US11450544B2Sep 20, 2022

Substrate processing apparatus, substrate processing system, and substrate processing method

EBARA CORP8 citations86
US10665487B2May 26, 2020

Substrate processing apparatus, substrate processing system, and substrate processing method

EBARA CORP8 citations84
USD729753SMay 19, 2015

Elastic membrane for semiconductor wafer polishing

EBARA CORP7 citations84
US8859070B2Oct 14, 2014

Elastic membrane

EBARA CORP16 citations84
US9156130B2Oct 13, 2015

Method of adjusting profile of a polishing member used in a polishing apparatus, and polishing apparatus

EBARA CORP11 citations83
US9108292B2Aug 18, 2015

Method of obtaining a sliding distance distribution of a dresser on a polishing member, method of obtaining a sliding vector distribution of a dresser on a polishing member, and polishing apparatus

EBARA CORP19 citations83
US8382558B2Feb 26, 2013

Apparatus for dressing a polishing pad, chemical mechanical polishing apparatus and method

EBARA CORP14 citations83
US4910449AMar 20, 1990

System for preventing unbalance vibrations and synchronous disturbance vibrations

EBARA CORP17 citations74
US10056277B2Aug 21, 2018

Polishing method

EBARA CORP2 citations73
US9999955B2Jun 19, 2018

Polishing apparatus and polished-state monitoring method

EBARA CORP4 citations73
US6183342B1Feb 6, 2001

Polishing apparatus

EBARA CORP10 citations73
US8951813B2Feb 10, 2015

Method of polishing a substrate having a film on a surface of the substrate for semiconductor manufacturing

EBARA CORP5 citations72
US9073170B2Jul 7, 2015

Polishing apparatus having thermal energy measuring means

EBARA CORP2 citations63
US5814814ASep 29, 1998

Electron microscope

EBARA CORP6 citations63
US12062563B2Aug 13, 2024

Substrate processing apparatus, substrate processing system, and substrate processing method

EBARA CORP0 citations62
US12036634B2Jul 16, 2024

Substrate processing control system, substrate processing control method, and program

EBARA CORP1 citations62
US6536735B2Mar 25, 2003

Vibration isolating apparatus for table for mounting device sensitive to vibrations and method therefor

EBARA CORP4 citations59
US12076834B2Sep 3, 2024

Eddy current sensor

EBARA CORP0 citations52
US11833636B2Dec 5, 2023

Substrate polishing apparatus, method of creating thickness map, and method of polishing a substrate

EBARA CORP0 citations52
US11673222B2Jun 13, 2023

Polishing head system and polishing apparatus

EBARA CORP0 citations52
US11465254B2Oct 11, 2022

Polishing machine and a polishing method for a substrate

EBARA CORP0 citations52
US9149903B2Oct 6, 2015

Polishing apparatus having substrate holding apparatus

EBARA CORP0 citations52
US12017323B2Jun 25, 2024

Polishing head system and polishing apparatus

EBARA CORP0 citations51
US11759912B2Sep 19, 2023

Magnetic element and eddy current sensor using the same

EBARA CORP0 citations51
US10500691B2Dec 10, 2019

Substrate processing apparatus and substrate processing method

EBARA CORP0 citations51
US12179310B2Dec 31, 2024

Output signal processing apparatus for eddy current sensor

EBARA CORP0 citations50
US5760578AJun 2, 1998

Inductive displacement sensor system detecting displacements in two directions using a multi-bridge circuit

EBARA CORP0 citations39

NAT AEROSPACE LAB

2 patents

FUKUSHIMA MAKOTO

2 patents

WATANABE KATSUHIDE

1 patent

EBARA RES CO LTD

1 patent

TOKYO ELECTRON LTD

1 patent

KIOXIA CORP

1 patent