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Elastic membrane for semiconductor wafer polishing

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Assignee: FUKUSHIMA MAKOTOPriority: Dec 28, 2010Filed: Jan 28, 2011Granted: Aug 19, 2014
Est. expiryDec 28, 2030(~4.5 yrs left)· nominal 20-yr term from priority
Inventors:Makoto FukushimaHozumi YasudaOsamu NabeyaKatsuhide WatanabeKeisuke Namiki
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PatentIndex Score
7
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80
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1
Claims

Claims

exact text as granted — not AI-modified
CLAIM 
     
       The ornamental design for an elastic membrane for semiconductor wafer polishing, as shown and described.

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