Inventor
AIURA KAZUHIRO
JP20 patents
⚠️ This page may combine multiple inventors who share the name “AIURA KAZUHIRO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
14 patentsUS12142496B2Nov 12, 2024
Substrate processing apparatus and substrate processing method
TOKYO ELECTRON LTD2 citations72
USD934991SNov 2, 2021
Component of a liquid discharge nozzle for semiconductor substrate processing apparatus
TOKYO ELECTRON LTD5 citations72
US12176224B2Dec 24, 2024
Substrate processing apparatus and substrate processing method
TOKYO ELECTRON LTD0 citations62
USD930796SSep 14, 2021
Liquid discharge nozzle for semiconductor substrate processing apparatus
TOKYO ELECTRON LTD0 citations62
USD929534SAug 31, 2021
Liquid discharge nozzle for semiconductor substrate processing apparatus
TOKYO ELECTRON LTD1 citations62
US11776824B2Oct 3, 2023
Processing liquid ejection nozzle, nozzle arm, substrate processing apparatus, and substrate processing method
TOKYO ELECTRON LTD1 citations60
US9245737B2Jan 26, 2016
Liquid treatment apparatus and liquid treatment method
TOKYO ELECTRON LTD2 citations60
US9105671B2Aug 11, 2015
Liquid processing apparatus and liquid processing method
TOKYO ELECTRON LTD3 citations60
US11024518B2Jun 1, 2021
Substrate processing apparatus, substrate processing method and recording medium
TOKYO ELECTRON LTD0 citations52
US9768039B2Sep 19, 2017
Substrate processing apparatus
TOKYO ELECTRON LTD1 citations51
US12569887B2Mar 10, 2026
Substrate processing apparatus and substrate processing method
TOKYO ELECTRON LTD0 citations50
US10580669B2Mar 3, 2020
Substrate processing apparatus and nozzle
TOKYO ELECTRON LTD0 citations49
US10486208B2Nov 26, 2019
Substrate processing apparatus, method of cleaning substrate processing apparatus, and storage medium
TOKYO ELECTRON LTD0 citations41
US8865483B2Oct 21, 2014
Substrate processing apparatus and substrate processing method
TOKYO ELECTRON LTD0 citations41