Inventor
ALLEN ADOLPH MILLER
US38 patents
⚠️ This page may combine multiple inventors who share the name “ALLEN ADOLPH MILLER”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
APPLIED MATERIALS INC
34 patentsUSD797067SSep 12, 2017
Target profile for a physical vapor deposition chamber target
APPLIED MATERIALS INC355 citations98
US9460959B1Oct 4, 2016
Methods for pre-cleaning conductive interconnect structures
APPLIED MATERIALS INC113 citations97
USD825504SAug 14, 2018
Target profile for a physical vapor deposition chamber target
APPLIED MATERIALS INC34 citations93
US7422664B2Sep 9, 2008
Method for plasma ignition
APPLIED MATERIALS INC9 citations81
US10347475B2Jul 9, 2019
Holding assembly for substrate processing chamber
APPLIED MATERIALS INC7 citations79
US11810770B2Nov 7, 2023
Methods and apparatus for controlling ion fraction in physical vapor deposition processes
APPLIED MATERIALS INC2 citations73
US11037768B2Jun 15, 2021
Methods and apparatus for controlling ion fraction in physical vapor deposition processes
APPLIED MATERIALS INC4 citations73
US10763090B2Sep 1, 2020
High pressure RF-DC sputtering and methods to improve film uniformity and step-coverage of this process
APPLIED MATERIALS INC3 citations73
US9909206B2Mar 6, 2018
Process kit having tall deposition ring and deposition ring clamp
APPLIED MATERIALS INC6 citations72
US12368024B2Jul 22, 2025
Methods and apparatus for processing a substrate
APPLIED MATERIALS INC2 citations71
US11473189B2Oct 18, 2022
Method for particle removal from wafers through plasma modification in pulsed PVD
APPLIED MATERIALS INC2 citations70
US11049701B2Jun 29, 2021
Biased cover ring for a substrate processing system
APPLIED MATERIALS INC3 citations70
US9991101B2Jun 5, 2018
Magnetron assembly for physical vapor deposition chamber
APPLIED MATERIALS INC3 citations69
US11658016B2May 23, 2023
Shield for a substrate processing chamber
APPLIED MATERIALS INC2 citations68
US11586160B2Feb 21, 2023
Reducing substrate surface scratching using machine learning
APPLIED MATERIALS INC2 citations68
US10972280B2Apr 6, 2021
Blockchain for distributed authentication of hardware operating profile
APPLIED MATERIALS INC3 citations66
US12094699B2Sep 17, 2024
Methods and apparatus for controlling ion fraction in physical vapor deposition processes
APPLIED MATERIALS INC0 citations62
US10563304B2Feb 18, 2020
Methods and apparatus for dynamically treating atomic layer deposition films in physical vapor deposition chambers
APPLIED MATERIALS INC1 citations62
US9343664B2May 17, 2016
Pattern fortification for HDD bit patterned media pattern transfer
APPLIED MATERIALS INC2 citations62
US12112890B2Oct 8, 2024
Top magnets for decreased non-uniformity in PVD
APPLIED MATERIALS INC0 citations59
US11932934B2Mar 19, 2024
Method for particle removal from wafers through plasma modification in pulsed PVD
APPLIED MATERIALS INC0 citations59
US11835927B2Dec 5, 2023
Reducing substrate surface scratching using machine learning
APPLIED MATERIALS INC0 citations58
US12136544B2Nov 5, 2024
Etch uniformity improvement for single turn internal coil PVD chamber
APPLIED MATERIALS INC0 citations56
US10283334B2May 7, 2019
Methods and apparatus for maintaining low non-uniformity over target life
APPLIED MATERIALS INC0 citations52
US10242873B2Mar 26, 2019
RF power compensation to control film stress, density, resistivity, and/or uniformity through target life
APPLIED MATERIALS INC0 citations52
US9499901B2Nov 22, 2016
High density TiN RF/DC PVD deposition with stress tuning
APPLIED MATERIALS INC1 citations52
US10283345B2May 7, 2019
Methods for pre-cleaning conductive materials on a substrate
APPLIED MATERIALS INC0 citations51
US9660185B2May 23, 2017
Pattern fortification for HDD bit patterned media pattern transfer
APPLIED MATERIALS INC0 citations51
US7829456B2Nov 9, 2010
Method to modulate coverage of barrier and seed layer using titanium nitride
APPLIED MATERIALS INC1 citations51
US10541169B2Jan 21, 2020
Method and system for balancing the electrostatic chucking force on a substrate
APPLIED MATERIALS INC0 citations48
US10400327B2Sep 3, 2019
Counter based time compensation to reduce process shifting in reactive magnetron sputtering reactor
APPLIED MATERIALS INC0 citations41
US10266940B2Apr 23, 2019
Auto capacitance tuner current compensation to control one or more film properties through target life
APPLIED MATERIALS INC0 citations41
US9611539B2Apr 4, 2017
Crystalline orientation and overhang control in collision based RF plasmas
APPLIED MATERIALS INC0 citations41
US10858727B2Dec 8, 2020
High density, low stress amorphous carbon film, and process and equipment for its deposition
APPLIED MATERIALS INC0 citations40