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Inventor

ALLEN ADOLPH MILLER

US38 patents
⚠️ This page may combine multiple inventors who share the name “ALLEN ADOLPH MILLER”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

APPLIED MATERIALS INC

34 patents
USD797067SSep 12, 2017

Target profile for a physical vapor deposition chamber target

APPLIED MATERIALS INC355 citations98
US9460959B1Oct 4, 2016

Methods for pre-cleaning conductive interconnect structures

APPLIED MATERIALS INC113 citations97
USD825504SAug 14, 2018

Target profile for a physical vapor deposition chamber target

APPLIED MATERIALS INC34 citations93
US7422664B2Sep 9, 2008

Method for plasma ignition

APPLIED MATERIALS INC9 citations81
US10347475B2Jul 9, 2019

Holding assembly for substrate processing chamber

APPLIED MATERIALS INC7 citations79
US11810770B2Nov 7, 2023

Methods and apparatus for controlling ion fraction in physical vapor deposition processes

APPLIED MATERIALS INC2 citations73
US11037768B2Jun 15, 2021

Methods and apparatus for controlling ion fraction in physical vapor deposition processes

APPLIED MATERIALS INC4 citations73
US10763090B2Sep 1, 2020

High pressure RF-DC sputtering and methods to improve film uniformity and step-coverage of this process

APPLIED MATERIALS INC3 citations73
US9909206B2Mar 6, 2018

Process kit having tall deposition ring and deposition ring clamp

APPLIED MATERIALS INC6 citations72
US12368024B2Jul 22, 2025

Methods and apparatus for processing a substrate

APPLIED MATERIALS INC2 citations71
US11473189B2Oct 18, 2022

Method for particle removal from wafers through plasma modification in pulsed PVD

APPLIED MATERIALS INC2 citations70
US11049701B2Jun 29, 2021

Biased cover ring for a substrate processing system

APPLIED MATERIALS INC3 citations70
US9991101B2Jun 5, 2018

Magnetron assembly for physical vapor deposition chamber

APPLIED MATERIALS INC3 citations69
US11658016B2May 23, 2023

Shield for a substrate processing chamber

APPLIED MATERIALS INC2 citations68
US11586160B2Feb 21, 2023

Reducing substrate surface scratching using machine learning

APPLIED MATERIALS INC2 citations68
US10972280B2Apr 6, 2021

Blockchain for distributed authentication of hardware operating profile

APPLIED MATERIALS INC3 citations66
US12094699B2Sep 17, 2024

Methods and apparatus for controlling ion fraction in physical vapor deposition processes

APPLIED MATERIALS INC0 citations62
US10563304B2Feb 18, 2020

Methods and apparatus for dynamically treating atomic layer deposition films in physical vapor deposition chambers

APPLIED MATERIALS INC1 citations62
US9343664B2May 17, 2016

Pattern fortification for HDD bit patterned media pattern transfer

APPLIED MATERIALS INC2 citations62
US12112890B2Oct 8, 2024

Top magnets for decreased non-uniformity in PVD

APPLIED MATERIALS INC0 citations59
US11932934B2Mar 19, 2024

Method for particle removal from wafers through plasma modification in pulsed PVD

APPLIED MATERIALS INC0 citations59
US11835927B2Dec 5, 2023

Reducing substrate surface scratching using machine learning

APPLIED MATERIALS INC0 citations58
US12136544B2Nov 5, 2024

Etch uniformity improvement for single turn internal coil PVD chamber

APPLIED MATERIALS INC0 citations56
US10283334B2May 7, 2019

Methods and apparatus for maintaining low non-uniformity over target life

APPLIED MATERIALS INC0 citations52
US10242873B2Mar 26, 2019

RF power compensation to control film stress, density, resistivity, and/or uniformity through target life

APPLIED MATERIALS INC0 citations52
US9499901B2Nov 22, 2016

High density TiN RF/DC PVD deposition with stress tuning

APPLIED MATERIALS INC1 citations52
US10283345B2May 7, 2019

Methods for pre-cleaning conductive materials on a substrate

APPLIED MATERIALS INC0 citations51
US9660185B2May 23, 2017

Pattern fortification for HDD bit patterned media pattern transfer

APPLIED MATERIALS INC0 citations51
US7829456B2Nov 9, 2010

Method to modulate coverage of barrier and seed layer using titanium nitride

APPLIED MATERIALS INC1 citations51
US10541169B2Jan 21, 2020

Method and system for balancing the electrostatic chucking force on a substrate

APPLIED MATERIALS INC0 citations48
US10400327B2Sep 3, 2019

Counter based time compensation to reduce process shifting in reactive magnetron sputtering reactor

APPLIED MATERIALS INC0 citations41
US10266940B2Apr 23, 2019

Auto capacitance tuner current compensation to control one or more film properties through target life

APPLIED MATERIALS INC0 citations41
US9611539B2Apr 4, 2017

Crystalline orientation and overhang control in collision based RF plasmas

APPLIED MATERIALS INC0 citations41
US10858727B2Dec 8, 2020

High density, low stress amorphous carbon film, and process and equipment for its deposition

APPLIED MATERIALS INC0 citations40

SCHEIBLE KATHLEEN

1 patent

VARIAN SEMICONDUCTOR EQUIPMENT ASS INC

1 patent

ALLEN ADOLPH MILLER

1 patent

GE ZHENBIN

1 patent