Inventor
KOUZUMA YUTAKA
JP20 patents
⚠️ This page may combine multiple inventors who share the name “KOUZUMA YUTAKA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HITACHI HIGH TECH CORP
18 patentsUSD900760SNov 3, 2020
Ion shield plate for semiconductor manufacturing apparatus
HITACHI HIGH TECH CORP26 citations93
USD864885SOct 29, 2019
Infrared lamp heater transmission window for semiconductor manufacturing apparatus
HITACHI HIGH TECH CORP24 citations92
USD924824SJul 13, 2021
Ion shield plate base for semiconductor manufacturing apparatus
HITACHI HIGH TECH CORP10 citations84
USD901407SNov 10, 2020
Integrated type ion shield for semiconductor manufacturing apparatus
HITACHI HIGH TECH CORP9 citations83
US12449825B2Oct 21, 2025
Gas supply control device
HITACHI HIGH TECH CORP2 citations74
US10825664B2Nov 3, 2020
Wafer processing method and wafer processing apparatus
HITACHI HIGH TECH CORP3 citations73
US10325781B2Jun 18, 2019
Etching method and etching apparatus
HITACHI HIGH TECH CORP3 citations73
US11915951B2Feb 27, 2024
Plasma processing method
HITACHI HIGH TECH CORP1 citations62
US11557463B2Jan 17, 2023
Vacuum processing apparatus
HITACHI HIGH TECH CORP0 citations62
US11515167B2Nov 29, 2022
Plasma etching method and plasma processing apparatus
HITACHI HIGH TECH CORP1 citations62
US10937635B2Mar 2, 2021
Vacuum processing apparatus
HITACHI HIGH TECH CORP0 citations62
US12224158B2Feb 11, 2025
Plasma processing apparatus
HITACHI HIGH TECH CORP0 citations61
US10872779B2Dec 22, 2020
Plasma etching method and plasma etching apparatus
HITACHI HIGH TECH CORP1 citations59
US11835465B2Dec 5, 2023
Detecting method and detecting device of gas components and processing apparatus using detecting device of gas components
HITACHI HIGH TECH CORP0 citations52
US10290472B2May 14, 2019
Vacuum processing apparatus
HITACHI HIGH TECH CORP0 citations52
US11276579B2Mar 15, 2022
Substrate processing method and plasma processing apparatus
HITACHI HIGH TECH CORP0 citations51
US12442455B2Oct 14, 2025
Gas supply apparatus, vacuum processing apparatus, and gas supply method
HITACHI HIGH TECH CORP0 citations48
US10141207B2Nov 27, 2018
Operation method of plasma processing apparatus
HITACHI HIGH TECH CORP0 citations41