Inventor
KINSHO TAKESHI
JP262 patents
⚠️ This page may combine multiple inventors who share the name “KINSHO TAKESHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SHINETSU CHEMICAL CO
34 patentsUS6448420B1Sep 10, 2002
Acid-decomposable ester compound suitable for use in resist material
SHINETSU CHEMICAL CO160 citations99
US6312867B1Nov 6, 2001
Ester compounds, polymers, resist compositions and patterning process
SHINETSU CHEMICAL CO209 citations99
US6280898B1Aug 28, 2001
Lactone-containing compounds, polymers, resist compositions, and patterning method
SHINETSU CHEMICAL CO229 citations99
US7084303B2Aug 1, 2006
Tertiary amine compounds having an ester structure and processes for preparing same
SHINETSU CHEMICAL CO79 citations98
US7511169B2Mar 31, 2009
Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process
SHINETSU CHEMICAL CO45 citations96
US6147249ANov 14, 2000
Ester compounds, polymers, resist composition and patterning process
SHINETSU CHEMICAL CO81 citations96
US8048610B2Nov 1, 2011
Sulfonium salt-containing polymer, resist composition, and patterning process
SHINETSU CHEMICAL CO32 citations93
US7981589B2Jul 19, 2011
Fluorinated monomer, fluorinated polymer, resist composition and patterning process
SHINETSU CHEMICAL CO22 citations93
US7919226B2Apr 5, 2011
Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process
SHINETSU CHEMICAL CO19 citations93
US7670751B2Mar 2, 2010
Photoacid generator, resist composition, and patterning process
SHINETSU CHEMICAL CO26 citations93
US7569324B2Aug 4, 2009
Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process
SHINETSU CHEMICAL CO18 citations93
US6946233B2Sep 20, 2005
Polymer, resist material and patterning method
SHINETSU CHEMICAL CO25 citations93
US6746818B2Jun 8, 2004
(Meth)acrylates having lactone structure, polymers, photoresist compositions and patterning process
SHINETSU CHEMICAL CO48 citations93
US6703183B2Mar 9, 2004
Polymer, resist composition and patterning process
SHINETSU CHEMICAL CO23 citations93
US6673515B2Jan 6, 2004
Polymer, resist composition and patterning process
SHINETSU CHEMICAL CO20 citations93
US6673518B2Jan 6, 2004
Polymer, resist composition and patterning process
SHINETSU CHEMICAL CO20 citations93
US6605408B2Aug 12, 2003
Resist composition and patterning process
SHINETSU CHEMICAL CO29 citations93
US6492090B2Dec 10, 2002
Polymers, resist compositions and patterning process
SHINETSU CHEMICAL CO25 citations93
US6444396B1Sep 3, 2002
Ester compounds, polymers, resist composition and patterning process
SHINETSU CHEMICAL CO24 citations93
US6284429B1Sep 4, 2001
Ester compounds, polymers, resist compositions and patterning process
SHINETSU CHEMICAL CO50 citations93
US5454977AOct 3, 1995
Silacyclohexane compound, a method of preparing it and a liquid crystal composition containing it
SHINETSU CHEMICAL CO23 citations93
US9372404B2Jun 21, 2016
Organic film composition, method for forming organic film and patterning process using this, and heat-decomposable polymer
SHINETSU CHEMICAL CO8 citations84
US8349533B2Jan 8, 2013
Resist lower-layer composition containing thermal acid generator, resist lower layer film-formed substrate, and patterning process
SHINETSU CHEMICAL CO14 citations84
US7871752B2Jan 18, 2011
Lactone-containing compound, polymer, resist composition, and patterning process
SHINETSU CHEMICAL CO11 citations84
USRE41580EAug 24, 2010
Lactone-containing compounds, polymers, resist compositions, and patterning method
SHINETSU CHEMICAL CO8 citations84
US7741015B2Jun 22, 2010
Patterning process and resist composition
SHINETSU CHEMICAL CO14 citations84
US7678530B2Mar 16, 2010
Lactone-containing compound, polymer, resist composition, and patterning process
SHINETSU CHEMICAL CO9 citations84
US7611821B2Nov 3, 2009
Positive resist compositions and patterning process
SHINETSU CHEMICAL CO15 citations84
US7556909B2Jul 7, 2009
Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process
SHINETSU CHEMICAL CO9 citations84
US7531290B2May 12, 2009
Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process
SHINETSU CHEMICAL CO17 citations84
US7531289B2May 12, 2009
Fluorinated monomer having cyclic structure, manufacturing method, polymer, photoresist composition and patterning process
SHINETSU CHEMICAL CO16 citations84
US7312288B2Dec 25, 2007
Polymerizable fluorinated ester compounds and their preparing processes
SHINETSU CHEMICAL CO12 citations84
US6794111B2Sep 21, 2004
Polymers, resist compositions and patterning process, novel tetrahydrofuran compounds and their preparation
SHINETSU CHEMICAL CO16 citations84
US6566038B2May 20, 2003
Polymers, resist compositions and patterning process
SHINETSU CHEMICAL CO13 citations84
OHASHI MASAKI
5 patentsUS8105748B2Jan 31, 2012
Polymerizable anion-containing sulfonium salt and polymer, resist composition, and patterning process
OHASHI MASAKI81 citations98
US8057985B2Nov 15, 2011
Polymerizable anion-containing sulfonium salt and polymer, resist composition, and patterning process
OHASHI MASAKI52 citations94
US8114571B2Feb 14, 2012
Photoacid generator, resist composition, and patterning process
OHASHI MASAKI29 citations92
US8394570B2Mar 12, 2013
Sulfonium salt, acid generator, resist composition, photomask blank, and patterning process
OHASHI MASAKI12 citations84
US8283104B2Oct 9, 2012
Sulfonate and its derivative, photosensitive acid generator, and resist composition and patterning process using the same
OHASHI MASAKI14 citations84
WATANABE SATOSHI
2 patentsOHSAWA YOUICHI
2 patentsSHI ETSU CHEMICAL CO LTD
1 patentHATAKEYAMA JUN
1 patentIBM
1 patentOGIHARA TSUTOMU
1 patentWATANABE TAKERU
1 patentTAKEDA TAKANOBU
1 patentEUDYNA DEVICES INC
1 patentShowing the top 50 of 262 patents by PatentIndex Score.