Inventor
BYUN DANIEL SANG
US12 patents
Patents
12 patentsUS11462389B2Oct 4, 2022
Pulsed-voltage hardware assembly for use in a plasma processing system
APPLIED MATERIALS INC12 citations93
USD1049067SOct 29, 2024
Ring for an anti-rotation process kit for a substrate processing chamber
APPLIED MATERIALS INC24 citations91
US11848176B2Dec 19, 2023
Plasma processing using pulsed-voltage and radio-frequency power
APPLIED MATERIALS INC5 citations86
US11776789B2Oct 3, 2023
Plasma processing assembly using pulsed-voltage and radio-frequency power
APPLIED MATERIALS INC6 citations85
US11462388B2Oct 4, 2022
Plasma processing assembly using pulsed-voltage and radio-frequency power
APPLIED MATERIALS INC6 citations85
USD1066275SMar 11, 2025
Baffle for anti-rotation process kit for substrate processing chamber
APPLIED MATERIALS INC10 citations83
US12237148B2Feb 25, 2025
Plasma processing assembly using pulsed-voltage and radio-frequency power
APPLIED MATERIALS INC2 citations74
US12009236B2Jun 11, 2024
Sensors and system for in-situ edge ring erosion monitor
APPLIED MATERIALS INC3 citations73
US11764041B2Sep 19, 2023
Adjustable thermal break in a substrate support
APPLIED MATERIALS INC4 citations72
US12255051B2Mar 18, 2025
Multi-shape voltage pulse trains for uniformity and etch profile tuning
APPLIED MATERIALS INC3 citations71
US11894255B2Feb 6, 2024
Sheath and temperature control of process kit
APPLIED MATERIALS INC0 citations51
US12354847B2Jul 8, 2025
Methods and apparatus for conductance liners in semiconductor process chambers
APPLIED MATERIALS INC0 citations50