USD1066275SActiveUtility
Baffle for anti-rotation process kit for substrate processing chamber
Est. expiryApr 4, 2042(~15.7 yrs left)· nominal 20-yr term from priority
85
PatentIndex Score
10
Cited by
66
References
1
Claims
Claims
exact text as granted — not AI-modifiedCLAIM
The ornamental design for a baffle for anti-rotation process kit for substrate processing chamber, as shown and described.Join the waitlist — get patent alerts
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