Inventor · disambiguated record
Daniel Sang Byun
Also filed as: BYUN DANIEL · BYUN DANIEL SANG
15 granted patents·6 pending applications·91 citations·filing 2009–2024
92Inventor score
Top patents by PatentIndex Score
21 records- 0198US11848176B2Plasma processing using pulsed-voltage and radio-frequency powerAPPLIED MATERIALS INC·Filed 2021·Granted Dec 19, 2023·5 cites·25 claims
- 0298US11776789B2Plasma processing assembly using pulsed-voltage and radio-frequency powerAPPLIED MATERIALS INC·Filed 2022·Granted Oct 3, 2023·6 cites·20 claims
- 0398US11462388B2Plasma processing assembly using pulsed-voltage and radio-frequency powerAPPLIED MATERIALS INC·Filed 2021·Granted Oct 4, 2022·6 cites·20 claims
- 0497US12237148B2Plasma processing assembly using pulsed-voltage and radio-frequency powerAPPLIED MATERIALS INC·Filed 2023·Granted Feb 25, 2025·2 cites·21 claims
- 0597US11462389B2Pulsed-voltage hardware assembly for use in a plasma processing systemAPPLIED MATERIALS INC·Filed 2021·Granted Oct 4, 2022·12 cites·17 claims
- 0695US11764041B2Adjustable thermal break in a substrate supportAPPLIED MATERIALS INC·Filed 2020·Granted Sep 19, 2023·4 cites·18 claims
- 0794USD1049067SRing for an anti-rotation process kit for a substrate processing chamberAPPLIED MATERIALS INC·Filed 2022·Granted Oct 29, 2024·24 cites·1 claims
- 0894US10745805B2Plasma resistant coating of porous body by atomic layer depositionAPPLIED MATERIALS INC·Filed 2017·Granted Aug 18, 2020·10 cites·24 claims
- 0992US12255051B2Multi-shape voltage pulse trains for uniformity and etch profile tuningAPPLIED MATERIALS INC·Filed 2022·Granted Mar 18, 2025·3 cites·21 claims
- 1085USD1066275SBaffle for anti-rotation process kit for substrate processing chamberAPPLIED MATERIALS INC·Filed 2022·Granted Mar 11, 2025·10 cites·1 claims
- 1185US12009236B2Sensors and system for in-situ edge ring erosion monitorAPPLIED MATERIALS INC·Filed 2019·Granted Jun 11, 2024·3 cites·7 claims
- 1283US10975469B2Plasma resistant coating of porous body by atomic layer depositionAPPLIED MATERIALS INC·Filed 2017·Granted Apr 13, 2021·3 cites·18 claims
- 1374US2024321610A1Sensors and system for in-situ edge ring erosion monitorAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 1468US8797705B2Methods and arrangement for plasma dechuck optimization based on coupling of plasma signaling to substrate position and potentialVALCORE JR JOHN C·Filed 2009·Granted Aug 5, 2014·3 cites·20 claims
- 1554US2024145220A1Electrostatic chuck assemblyAPPLIED MATERIALS INC·Filed 2022·Application pending·0 cites
- 1648US12354847B2Methods and apparatus for conductance liners in semiconductor process chambersAPPLIED MATERIALS INC·Filed 2020·Granted Jul 8, 2025·0 cites·20 claims
- 1748US2011024049A1Light-up prevention in electrostatic chucksC O LAM RES CORP·Filed 2009·Application pending·0 cites
- 1847US11894255B2Sheath and temperature control of process kitAPPLIED MATERIALS INC·Filed 2020·Granted Feb 6, 2024·0 cites·20 claims
- 1946US2021287881A1Methods and apparatus for tuning semiconductor processesAPPLIED MATERIALS INC·Filed 2021·Application pending·0 cites
- 2045US2021391146A1Rf frequency control and ground path return in semiconductor process chambersAPPLIED MATERIALS INC·Filed 2020·Application pending·0 cites
- 2139US2018337026A1Erosion resistant atomic layer deposition coatingsAPPLIED MATERIALS INC·Filed 2018·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →