Inventor · disambiguated record
Abdul Aziz Khaja
Also filed as: KHAJA ABDUL AZIZ
42 granted patents·24 pending applications·172 citations·filing 2014–2025
96Inventor score
Files withAPPLIED MATERIALS INC66
Top patents by PatentIndex Score
66 records- 0197US11670492B2Chamber configurations and processes for particle controlAPPLIED MATERIALS INC·Filed 2020·Granted Jun 6, 2023·5 cites·17 claims
- 0297US9466469B2Remote plasma source for controlling plasma skewAPPLIED MATERIALS INC·Filed 2016·Granted Oct 11, 2016·121 cites·20 claims
- 0392US11742185B2Uniform in situ cleaning and depositionAPPLIED MATERIALS INC·Filed 2021·Granted Aug 29, 2023·2 cites·9 claims
- 0491US11674222B2Method of in situ ceramic coating depositionAPPLIED MATERIALS INC·Filed 2020·Granted Jun 13, 2023·2 cites·19 claims
- 0591US10192717B2Conditioning remote plasma source for enhanced performance having repeatable etch and deposition ratesAPPLIED MATERIALS INC·Filed 2015·Granted Jan 29, 2019·3 cites·10 claims
- 0691US10083818B2Auto frequency tuned remote plasma sourceAPPLIED MATERIALS INC·Filed 2015·Granted Sep 25, 2018·8 cites·19 claims
- 0790US12217937B2Radio frequency source for inductively coupled and capacitively coupled plasmas in substrate processing chambersAPPLIED MATERIALS INC·Filed 2022·Granted Feb 4, 2025·1 cites·20 claims
- 0888US9711360B2Methods to improve in-film particle performance of amorphous boron-carbon hardmask process in PECVD systemAPPLIED MATERIALS INC·Filed 2016·Granted Jul 18, 2017·5 cites·20 claims
- 0987US12347653B2Uniform in situ cleaning and depositionAPPLIED MATERIALS INC·Filed 2023·Granted Jul 1, 2025·0 cites·19 claims
- 1087US11613808B2Clean processes for boron carbon film depositionAPPLIED MATERIALS INC·Filed 2020·Granted Mar 28, 2023·2 cites·15 claims
- 1185US10879041B2Method and apparatus of achieving high input impedance without using ferrite materials for RF filter applications in plasma chambersAPPLIED MATERIALS INC·Filed 2016·Granted Dec 29, 2020·4 cites·19 claims
- 1284US11299805B2Plasma corrision resistive heater for high temperature processingAPPLIED MATERIALS INC·Filed 2019·Granted Apr 12, 2022·3 cites·19 claims
- 1384US10663491B2Voltage-current probe for measuring radio-frequency electrical power in a high-temperature environment and method of calibrating the sameAPPLIED MATERIALS INC·Filed 2018·Granted May 26, 2020·1 cites·8 claims
- 1482US10276364B2Bevel etch profile controlAPPLIED MATERIALS INC·Filed 2017·Granted Apr 30, 2019·3 cites·20 claims
- 1580US12400843B2Chamber configurations and processes for particle controlAPPLIED MATERIALS INC·Filed 2023·Granted Aug 26, 2025·0 cites·19 claims
- 1680US10266943B2Plasma corrosion resistive heater for high temperature processingAPPLIED MATERIALS INC·Filed 2014·Granted Apr 23, 2019·4 cites·10 claims
- 1778US11133212B2High temperature electrostatic chuckAPPLIED MATERIALS INC·Filed 2019·Granted Sep 28, 2021·2 cites·15 claims
- 1878US10636630B2Processing chamber and method with thermal controlAPPLIED MATERIALS INC·Filed 2018·Granted Apr 28, 2020·2 cites·15 claims
- 1977US12234549B2Method of in situ ceramic coating depositionAPPLIED MATERIALS INC·Filed 2023·Granted Feb 25, 2025·0 cites·20 claims
- 2076US12334384B2Methods and apparatus for minimizing substrate backside damageAPPLIED MATERIALS INC·Filed 2023·Granted Jun 17, 2025·0 cites·17 claims
- 2176US12211728B2Electrostatic chuck design with improved chucking and arcing performanceAPPLIED MATERIALS INC·Filed 2023·Granted Jan 28, 2025·0 cites·20 claims
- 2275US2023151487A1Methods of reducing chamber residuesAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 2374US10903066B2Heater support kit for bevel etch chamberAPPLIED MATERIALS INC·Filed 2019·Granted Jan 26, 2021·1 cites·20 claims
- 2474US2025174430A1Radio frequency source for inductively coupled and capacitively coupled plasmas in substrate processing chambersAPPLIED MATERIALS INC·Filed 2025·Application pending·0 cites
- 2572US10629427B2Bevel etch profile controlAPPLIED MATERIALS INC·Filed 2019·Granted Apr 21, 2020·1 cites·20 claims
- 2672US10109462B2Dual radio-frequency tuner for process control of a plasma processAPPLIED MATERIALS INC·Filed 2018·Granted Oct 23, 2018·1 cites·20 claims
- 2771US2023170190A1Rf grounding configuration for pedestalsAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 2868US11560623B2Methods of reducing chamber residuesAPPLIED MATERIALS INC·Filed 2020·Granted Jan 24, 2023·0 cites·16 claims
- 2968US9589773B2In-situ etch rate determination for chamber clean endpointAPPLIED MATERIALS INC·Filed 2016·Granted Mar 7, 2017·1 cites·20 claims
- 3067US11948790B2Heater support kit for bevel etch chamberAPPLIED MATERIALS INC·Filed 2020·Granted Apr 2, 2024·0 cites·20 claims
- 3164US11699577B2Treatment for high-temperature cleansAPPLIED MATERIALS INC·Filed 2021·Granted Jul 11, 2023·0 cites·20 claims
- 3264US2025297358A1Self-planarizing selective carbon gapfill depositionAPPLIED MATERIALS INC·Filed 2025·Application pending·0 cites
- 3362US10923334B2Selective deposition of hardmaskAPPLIED MATERIALS INC·Filed 2019·Granted Feb 16, 2021·0 cites·23 claims
- 3462US2024352580A1Side pumping chamber and downstream residue management hardwareAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 3561US11875969B2Process chamber with reduced plasma arcAPPLIED MATERIALS INC·Filed 2020·Granted Jan 16, 2024·0 cites·20 claims
- 3660US11682574B2Electrostatic chuck design with improved chucking and arcing performanceAPPLIED MATERIALS INC·Filed 2019·Granted Jun 20, 2023·0 cites·20 claims
- 3760US11569072B2RF grounding configuration for pedestalsAPPLIED MATERIALS INC·Filed 2019·Granted Jan 31, 2023·0 cites·19 claims
- 3860US10930475B2Graded in-situ charge trapping layers to enable electrostatic chucking and excellent particle performance for boron-doped carbon filmsAPPLIED MATERIALS INC·Filed 2018·Granted Feb 23, 2021·0 cites·20 claims
- 3960US10916407B2Conditioning remote plasma source for enhanced performance having repeatable etch and deposition ratesAPPLIED MATERIALS INC·Filed 2018·Granted Feb 9, 2021·0 cites·19 claims
- 4059US2025372379A1Hard mask stress modulation using low energy implantAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 4159US2025060321A1Optical inspection of wafers in manufacturing systemsAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 4259US2021111000A1Method and apparatus of achieving high input impedance without using ferrite materials for rf filter applications in plasmaAPPLIED MATERIALS INC·Filed 2020·Application pending·0 cites
- 4358US11756819B2Methods and apparatus for minimizing substrate backside damageAPPLIED MATERIALS INC·Filed 2020·Granted Sep 12, 2023·0 cites·10 claims
- 4458US2025357137A1Deposition film tuning and temperature tuning for etch uniformityAPPLIED MATERIALS INC·Filed 2025·Application pending·0 cites
- 4555US2025313948A1High-density plasma (hdp) topography improvement with partial gapfill carbonAPPLIED MATERIALS INC·Filed 2025·Application pending·0 cites
- 4654US12488981B2Systems and methods for deposition residue controlAPPLIED MATERIALS INC·Filed 2020·Granted Dec 2, 2025·0 cites·7 claims
- 4754US11894228B2Treatments for controlling deposition defectsAPPLIED MATERIALS INC·Filed 2021·Granted Feb 6, 2024·0 cites·20 claims
- 4854US11515150B2Hardmask tuning by electrode adjustmentAPPLIED MATERIALS INC·Filed 2020·Granted Nov 29, 2022·0 cites·20 claims
- 4954US10128088B2Graded in-situ charge trapping layers to enable electrostatic chucking and excellent particle performance for boron-doped carbon filmsAPPLIED MATERIALS INC·Filed 2016·Granted Nov 13, 2018·0 cites·20 claims
- 5054US2025181067A1Fault event recovery in multi-slot processing chambersAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
Showing the top 50 of 66 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →