Inventor · disambiguated record
Aiping Wu
Also filed as: WU AIPING
21 granted patents·13 pending applications·62 citations·filing 2005–2023
92Inventor score
Top patents by PatentIndex Score
34 records- 0194US12110435B2Etching composition and method for selectively removing silicon nitride during manufacture of a semiconductor deviceVERSUM MAT US LLC·Filed 2022·Granted Oct 8, 2024·3 cites·18 claims
- 0288US8361237B2Wet clean compositions for CoWP and porous dielectricsAIR PROD & CHEM·Filed 2009·Granted Jan 29, 2013·19 cites·11 claims
- 0384US9201308B2Water-rich stripping and cleaning formulation and method for using sameAIR PROD & CHEM·Filed 2013·Granted Dec 1, 2015·3 cites·20 claims
- 0481US7888302B2Aqueous based residue removers comprising fluorideAIR PROD & CHEM·Filed 2005·Granted Feb 15, 2011·6 cites·18 claims
- 0581US7879782B2Aqueous cleaning composition and method for using sameAIR PROD & CHEM·Filed 2005·Granted Feb 1, 2011·8 cites·11 claims
- 0679US7534753B2pH buffered aqueous cleaning composition and method for removing photoresist residueAIR PROD & CHEM·Filed 2006·Granted May 19, 2009·7 cites·25 claims
- 0778US7879783B2Cleaning composition for semiconductor substratesAIR PROD & CHEM·Filed 2007·Granted Feb 1, 2011·6 cites·21 claims
- 0867US10400167B2Etching compositions and methods for using sameVERSUM MAT US LLC·Filed 2016·Granted Sep 3, 2019·1 cites·22 claims
- 0967US9042142B2Multi-level voltage converterGUAN ERYONG·Filed 2010·Granted May 26, 2015·5 cites·18 claims
- 1065US10073351B2Semi-aqueous photoresist or semiconductor manufacturing residue stripping and cleaning composition with improved silicon passivationAIR PROD & CHEM·Filed 2015·Granted Sep 11, 2018·1 cites·16 claims
- 1164US8889609B2Cleaning formulations and method of using the cleaning formulationsWU AIPING·Filed 2012·Granted Nov 18, 2014·1 cites·21 claims
- 1261US8772214B2Aqueous cleaning composition for removing residues and method using sameWU AIPING·Filed 2005·Granted Jul 8, 2014·2 cites·20 claims
- 1360US12298669B2Composition comprising three alkanolamines and a hydroxylamine for removing etch residuesVERSUM MAT US LLC·Filed 2020·Granted May 13, 2025·0 cites·11 claims
- 1459US12281251B2Etching composition and method for selectively removing silicon nitride during manufacture of a semiconductor deviceVERSUM MAT US LLC·Filed 2020·Granted Apr 22, 2025·0 cites·23 claims
- 1559US2025002823A1Compositions For Removing Photoresist And Etch Residue From A Substrate With Copper Corrosion Inhibitor And Uses ThereofVERSUM MAT US LLC·Filed 2022·Application pending·0 cites
- 1655US2010151206A1Method for Removal of Carbon From An Organosilicate MaterialAIR PROD & CHEM·Filed 2009·Application pending·0 cites
- 1755US2025304856A1Formulated Alkaline Chemistry For Polysilicon ExhumeVERSUM MAT US LLC·Filed 2023·Application pending·0 cites
- 1854US12325844B2Photoresist removerVERSUM MAT US LLC·Filed 2020·Granted Jun 10, 2025·0 cites·18 claims
- 1953US2024392194A1Post-Dry Etching Photoresist And Metal Containing Residue Removal FormulationVERSUM MAT US LLC·Filed 2022·Application pending·0 cites
- 2052US11091727B2Post etch residue cleaning compositions and methods of using the sameVERSUM MAT US LLC·Filed 2019·Granted Aug 17, 2021·0 cites·17 claims
- 2152US2024271040A1Etching Solution For Selectively Removing Silicon-Germanium Alloy From A Silicon-Germanium/ Silicon Stack During Manufacture Of A Semiconductor DeviceVERSUM MAT US LLC·Filed 2022·Application pending·0 cites
- 2251US2013295334A1Method for Removal of Carbon from an Organosilicate MaterialAIR PROD & CHEM·Filed 2013·Application pending·0 cites
- 2351US2014100151A1Stripping and Cleaning Compositions for Removal of Thick Film ResistAIR PROD & CHEM·Filed 2013·Application pending·0 cites
- 2448US8518865B2Water-rich stripping and cleaning formulation and method for using sameRAO MADHUKAR BHASKARA·Filed 2010·Granted Aug 27, 2013·0 cites·6 claims
- 2547US9536730B2Cleaning formulationsAIR PROD & CHEM·Filed 2013·Granted Jan 3, 2017·0 cites·21 claims
- 2647US7682458B2Aqueous based residue removers comprising fluorideAIR PROD & CHEM·Filed 2005·Granted Mar 23, 2010·0 cites·11 claims
- 2747US2016152930A1Stripping and Cleaning Compositions for Removal of Thick Film ResistAIR PROD & CHEM·Filed 2016·Application pending·0 cites
- 2845US8288330B2Composition and method for photoresist removalWU AIPING·Filed 2007·Granted Oct 16, 2012·0 cites·14 claims
- 2945US2022298417A1Liquid Compositions For Selectively Removing Polysilicon Over P-Doped Silicon And Silicon-Germanium During Manufacture Of A Semiconductor DeviceVERSUM MAT US LLC·Filed 2020·Application pending·0 cites
- 3044US2022243150A1Cleaning Composition For Semiconductor SubstratesVERSUM MAT US LLC·Filed 2020·Application pending·0 cites
- 3142US2006003910A1Composition and method comprising same for removing residue from a substrateHSU JIUN Y·Filed 2005·Application pending·0 cites
- 3241US8283260B2Process for restoring dielectric propertiesWEIGEL SCOTT JEFFREY·Filed 2009·Granted Oct 9, 2012·0 cites·8 claims
- 3337US2012295447A1Compositions and Methods for Texturing of Silicon WafersTAMBOLI DNYANESH CHANDRAKANT·Filed 2011·Application pending·0 cites
- 3437US2013130508A1Compositions and Methods for Texturing of Silicon WafersWU AIPING·Filed 2012·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →