Inventor · disambiguated record
Akinori Ebe
Also filed as: EBE AKINORI
16 granted patents·15 pending applications·105 citations·filing 1992–2022
92Inventor score
Files withSETSUHARA YUICHI9NISSIN ELECTRIC CO LTD8EMD CORP7EBE AKINORI2NISSIN ELECTRIC CO LTD AND EMD2
Top patents by PatentIndex Score
31 records- 0177US7880392B2Plasma producing method and apparatus as well as plasma processing apparatusNISSIN ELECTRIC CO LTD·Filed 2006·Granted Feb 1, 2011·5 cites·16 claims
- 0275US6620247B2Thin polycrystalline silicon film forming apparatusNISSIN ELECTRIC CO LTD·Filed 2002·Granted Sep 16, 2003·15 cites·8 claims
- 0374US8917022B2Plasma generation device and plasma processing deviceEBE AKINORI·Filed 2009·Granted Dec 23, 2014·4 cites·45 claims
- 0473US7785441B2Plasma generator, plasma control method, and method of producing substrateJAPAN SCIENCE & TECH AGENCY·Filed 2003·Granted Aug 31, 2010·9 cites·10 claims
- 0565US6294479B1Film forming method and apparatusNISSIN ELECTRIC CO LTD·Filed 1995·Granted Sep 25, 2001·29 cites·3 claims
- 0663US9078336B2Radio-frequency antenna unit and plasma processing apparatusSETSUHARA YUICHI·Filed 2009·Granted Jul 7, 2015·1 cites·12 claims
- 0763US8916034B2Thin-film forming sputtering systemSETSUHARA YUICHI·Filed 2009·Granted Dec 23, 2014·2 cites·10 claims
- 0859US8444806B2Plasma generator, plasma control method and method of producing substrateMIYAKE SHOJI·Filed 2010·Granted May 21, 2013·2 cites·8 claims
- 0955US12354839B2Radio-frequency antenna and plasma processing deviceEMD CORP·Filed 2021·Granted Jul 8, 2025·0 cites·17 claims
- 1055US11785701B2Plasma generatorEMD CORP·Filed 2021·Granted Oct 10, 2023·0 cites·8 claims
- 1155US2010189921A1Plasma generating method, plasma generating apparatus, and plasma processing apparatusNISSIN ELECTRIC CO LTD AND EMD·Filed 2010·Application pending·0 cites
- 1254US2007193513A1Plasma generating method, plasma generating apparatus, and plasma processing apparatusEMD CORP·Filed 2007·Application pending·0 cites
- 1353US5316802AMethod of forming copper film on substrateNISSIN ELECTRIC CO LTD·Filed 1992·Granted May 31, 1994·9 cites·3 claims
- 1450US2024194462A1Sputtering apparatusOGAWA SOICHI·Filed 2022·Application pending·0 cites
- 1549US5501911ACopper crystal film coated organic substrateNISSIN ELECTRIC CO LTD·Filed 1993·Granted Mar 26, 1996·7 cites·2 claims
- 1647US2007193512A1Plasma generating method, plasma generating apparatus, and plasma processing apparatusNISSIN ELECTRIC CO LTD AND EMD·Filed 2007·Application pending·0 cites
- 1746US6447850B1Polycrystalline silicon thin film forming methodNISSIN ELECTRIC CO LTD·Filed 1999·Granted Sep 10, 2002·10 cites·13 claims
- 1844US8931433B2Plasma processing apparatusSETSUHARA YUICHI·Filed 2008·Granted Jan 13, 2015·0 cites·12 claims
- 1943US2013043128A1Sputtering systemEMD CORP·Filed 2011·Application pending·0 cites
- 2041US6103321AMethod of manufacturing an ultraviolet resistant objectNISSIN ELECTRIC CO LTD·Filed 1998·Granted Aug 15, 2000·8 cites·19 claims
- 2141US2021127476A1Plasma sourceEMD CORP·Filed 2020·Application pending·0 cites
- 2240US2007144672A1Plasma producing method and apparatus as well as plasma processing apparatusEMD CORP·Filed 2006·Application pending·0 cites
- 2337US2013220548A1Plasma processing deviceSETSUHARA YUICHI·Filed 2011·Application pending·0 cites
- 2437US2014216928A1Thin-film formation sputtering deviceSETSUHARA YUICHI·Filed 2011·Application pending·0 cites
- 2536US2014210337A1Antenna for plasma processing device, and plasma processing device using the sameSETSUHARA YUICHI·Filed 2011·Application pending·0 cites
- 2635US2012031563A1Plasma processing deviceSETSUHARA YUICHI·Filed 2010·Application pending·0 cites
- 2735US2013192759A1Plasma processing deviceSETSUHARA YUICHI·Filed 2011·Application pending·0 cites
- 2834US2012031562A1Plasma processing apparatusSETSUHARA YUICHI·Filed 2010·Application pending·0 cites
- 2934US2014150975A1Plasma processing deviceEBE AKINORI·Filed 2010·Application pending·0 cites
- 3032US5496772AMethod of manufacturing film carrier type substrateNISSIN ELECTRIC CO LTD·Filed 1992·Granted Mar 5, 1996·4 cites·2 claims
- 3132US2019333735A1Plasma source and plasma processing apparatusEMD CORP·Filed 2017·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →