Inventor · disambiguated record
Aksel Goehnermeier
Also filed as: GOEHNERMEIER AKSEL
33 granted patents·5 pending applications·174 citations·filing 2004–2021
96Inventor score
Files withZEISS CARL SMT GMBH12ZEISS CARL SMT AG8ZEISS CARL INDUSTRIELLE MESSTECHNIK GMBH4GOEHNERMEIER AKSEL3TOTZECK MICHAEL2
Top patents by PatentIndex Score
38 records- 0195US7847921B2Microlithographic exposure method as well as a projection exposure system for carrying out the methodZEISS CARL SMT AG·Filed 2008·Granted Dec 7, 2010·30 cites·7 claims
- 0295US7408616B2Microlithographic exposure method as well as a projection exposure system for carrying out the methodZEISS CARL SMT AG·Filed 2004·Granted Aug 5, 2008·70 cites·44 claims
- 0393US8325322B2Optical correction deviceHAUF MARKUS·Filed 2010·Granted Dec 4, 2012·16 cites·20 claims
- 0492US9442393B2Projection exposure tool for microlithography and method for microlithographic imagingZEISS CARL SMT GMBH·Filed 2014·Granted Sep 13, 2016·5 cites·20 claims
- 0587US9046792B2Projection exposure tool for microlithography and method for microlithographic imagingZEISS CARL SMT GMBH·Filed 2013·Granted Jun 2, 2015·6 cites·22 claims
- 0684US8027088B2Catadioptric projection objective with tilted deflecting mirrors, projection exposure apparatus, projection exposure method, and mirrorZEISS CARL SMT GMBH·Filed 2007·Granted Sep 27, 2011·6 cites·32 claims
- 0783US9709902B2Projection exposure tool for microlithography and method for microlithographic imagingZEISS CARL SMT GMBH·Filed 2016·Granted Jul 18, 2017·2 cites·20 claims
- 0881US8081295B2Projection exposure method and projection exposure system thereforGOEHNERMEIER AKSEL·Filed 2005·Granted Dec 20, 2011·6 cites·28 claims
- 0978US10209411B2Multilayer mirrorZEISS CARL SMT GMBH·Filed 2016·Granted Feb 19, 2019·4 cites·16 claims
- 1078US8228483B2Projection objective for microlithography, projection exposure apparatus, projection exposure method and optical correction plateLOERING ULRICH·Filed 2010·Granted Jul 24, 2012·6 cites·20 claims
- 1177US8358402B2Method of structuring a photosensitive materialZEISS CARL SMT GMBH·Filed 2010·Granted Jan 22, 2013·2 cites·22 claims
- 1276US10309765B2Coordinate measuring machine having an improved optical sensing system and related methodZEISS CARL INDUSTRIELLE MESSTECHNIK GMBH·Filed 2017·Granted Jun 4, 2019·3 cites·16 claims
- 1376US9110383B2Projection exposure method and projection exposure system thereforGOEHNERMEIER AKSEL·Filed 2011·Granted Aug 18, 2015·2 cites·25 claims
- 1475US10345570B2Device for optical examination of a specimen, method for examining a specimen and method for transferring a device into an operation-ready stateZEISS CARL MICROSCOPY GMBH·Filed 2016·Granted Jul 9, 2019·2 cites·47 claims
- 1572US9826201B2Method and measuring machine for determining dimensional properties of a measurement objectZEISS CARL INDUSTRIELLE MESSTECHNIK GMBH·Filed 2016·Granted Nov 21, 2017·2 cites·15 claims
- 1672US9383190B1Measuring apparatus and method for determining dimensional characteristics of a measurement objectZEISS IND MESSTECHNIK GMBH·Filed 2014·Granted Jul 5, 2016·3 cites·16 claims
- 1766US9063439B2Projection objective for microlithography with stray light compensation and related methodsGOEHNERMEIER AKSEL·Filed 2009·Granted Jun 23, 2015·2 cites·40 claims
- 1866US7508489B2Method of manufacturing a miniaturized deviceZEISS CARL SMT AG·Filed 2005·Granted Mar 24, 2009·2 cites·20 claims
- 1965US8659745B2Optical system with an exchangeable, manipulable correction arrangement for reducing image aberrationsZEISS CARL SMT GMBH·Filed 2013·Granted Feb 25, 2014·1 cites·32 claims
- 2059US10303068B2Projection exposure tool for microlithography and method for microlithographic imagingZEISS CARL SMT GMBH·Filed 2017·Granted May 28, 2019·0 cites·18 claims
- 2158US2016116851A1Projection exposure tool for microlithography and method for microlithographic imagingZEISS CARL SMT GMBH·Filed 2015·Application pending·0 cites
- 2256US9025137B2Method of structuring a photosensitive materialZEISS CARL SMT GMBH·Filed 2012·Granted May 5, 2015·0 cites·19 claims
- 2355US8107054B2Microlithographic projection exposure apparatusTOTZECK MICHAEL·Filed 2008·Granted Jan 31, 2012·0 cites·24 claims
- 2454US8982325B2Microlithographic projection exposure apparatusTOTZECK MICHAEL·Filed 2011·Granted Mar 17, 2015·0 cites·24 claims
- 2554US7239447B2Objective with crystal lensesZEISS CARL SMT AG·Filed 2004·Granted Jul 3, 2007·4 cites·33 claims
- 2653US11933597B2System and method for optical object coordinate determinationZEISS CARL INDUSTRIELLE MESSTECHNIK GMBH·Filed 2021·Granted Mar 19, 2024·0 cites·17 claims
- 2752US8411356B2Catadioptric projection objective with tilted deflecting mirrors, projection exposure apparatus, projection exposure method, and mirrorMUELLER RALF·Filed 2011·Granted Apr 2, 2013·0 cites·20 claims
- 2851US8767181B2Microlithographic exposure method as well as a projection exposure system for carrying out the methodGRUNER TORALF·Filed 2010·Granted Jul 1, 2014·0 cites·19 claims
- 2951US8542342B2Method of manufacturing a miniaturized deviceSCHWAB MARKUS·Filed 2009·Granted Sep 24, 2013·0 cites·22 claims
- 3048US2009213352A1Method for improving the imaging properties of an optical system, and such an optical systemZEISS CARL SMT AG·Filed 2009·Application pending·0 cites
- 3146US8339575B2Off-axis objectives with rotatable optical elementPAZIDIS ALEXANDRA·Filed 2008·Granted Dec 25, 2012·0 cites·15 claims
- 3246US2007242250A1Objective with crystal lensesZEISS CARL SMT AG·Filed 2007·Application pending·0 cites
- 3345US8542346B2Optical system with an exchangeable, manipulable correction arrangement for reducing image aberrationsLIMBACH GUIDO·Filed 2009·Granted Sep 24, 2013·0 cites·33 claims
- 3444US9298097B2Projection exposure apparatus for EUV microlithography and method for microlithographic exposureZEISS CARL SMT GMBH·Filed 2013·Granted Mar 29, 2016·0 cites·24 claims
- 3543US9581910B2Method of lithographically transferring a pattern on a light sensitive surface and illumination system of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2015·Granted Feb 28, 2017·0 cites·21 claims
- 3642US10495441B2Probing element and coordinate measuring machine for measuring at least one measurement objectZEISS CARL INDUSTRIELLE MESSTECHNIK GMBH·Filed 2018·Granted Dec 3, 2019·0 cites·16 claims
- 3742US2009059189A1Pellicle for use in a microlithographic exposure apparatusZEISS CARL SMT AG·Filed 2006·Application pending·0 cites
- 3840US2008036982A1Method For Structuring A Substrate Using Multiple ExposureZEISS CARL SMT AG·Filed 2005·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →