Inventor · disambiguated record
Akira Kagoshima
Also filed as: KAGOSHIMA AKIRA
50 granted patents·22 pending applications·325 citations·filing 2001–2022
98Inventor score
Top patents by PatentIndex Score
72 records- 0192US9324588B2Data analysis method for plasma processing apparatus, plasma processing method and plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2015·Granted Apr 26, 2016·7 cites·6 claims
- 0292US7107115B2Method for controlling semiconductor processing apparatusHITACHI HIGH TECH CORP·Filed 2006·Granted Sep 12, 2006·17 cites·2 claims
- 0392US6616759B2Method of monitoring and/or controlling a semiconductor manufacturing apparatus and a system thereforHITACHI LTD·Filed 2001·Granted Sep 9, 2003·58 cites·9 claims
- 0489US9110461B2Semiconductor manufacturing equipmentMORISAWA TOSHIHIRO·Filed 2012·Granted Aug 18, 2015·13 cites·14 claims
- 0588US7601240B2Disturbance-free, recipe-controlled plasma processing system and methodHITACHI LTD·Filed 2006·Granted Oct 13, 2009·9 cites·2 claims
- 0686US9443704B2Data analysis method for plasma processing apparatus, plasma processing method and plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2016·Granted Sep 13, 2016·4 cites·3 claims
- 0784US10510519B2Plasma processing apparatus and data analysis apparatusHITACHI HIGH TECH CORP·Filed 2016·Granted Dec 17, 2019·3 cites·8 claims
- 0883US11410836B2Analysis method and semiconductor etching apparatusHITACHI HIGH TECH CORP·Filed 2019·Granted Aug 9, 2022·2 cites·6 claims
- 0983US8992721B2Plasma processing apparatusKAGOSHIMA AKIRA·Filed 2010·Granted Mar 31, 2015·7 cites·9 claims
- 1082US6733618B2Disturbance-free, recipe-controlled plasma processing system and methodHITACHI LTD·Filed 2001·Granted May 11, 2004·18 cites·9 claims
- 1180US9091595B2Analysis method, analysis device, and etching processing systemHITACHI HIGH TECH CORP·Filed 2013·Granted Jul 28, 2015·4 cites·6 claims
- 1279US8924001B2Etching apparatus, control simulator, and semiconductor device manufacturing methodMORISAWA TOSHIHIRO·Filed 2010·Granted Dec 30, 2014·5 cites·21 claims
- 1379US7343217B2System for monitoring and controlling a semiconductor manufacturing apparatus using prediction model equationHITACHI LTD·Filed 2006·Granted Mar 11, 2008·4 cites·5 claims
- 1478US7330346B2Etching apparatus, method for measuring self-bias voltage, and method for monitoring etching apparatusHITACHI HIGH TECH CORP·Filed 2006·Granted Feb 12, 2008·6 cites·12 claims
- 1578US6745096B2Maintenance method and system for plasma processing apparatus etching and apparatusHITACHI LTD·Filed 2001·Granted Jun 1, 2004·18 cites·11 claims
- 1677US8828184B2Plasma processing apparatus and plasma processing methodKAGOSHIMA AKIRA·Filed 2012·Granted Sep 9, 2014·4 cites·5 claims
- 1777US6706543B2Method of monitoring and/or controlling a semiconductor manufacturing apparatus and a thereforHITACHI LTD·Filed 2002·Granted Mar 16, 2004·13 cites·7 claims
- 1876US9464936B2Plasma processing apparatus and analyzing apparatusHITACHI HIGH TECH CORP·Filed 2013·Granted Oct 11, 2016·3 cites·9 claims
- 1976US6881352B2Disturbance-free, recipe-controlled plasma processing methodHITACHI LTD·Filed 2003·Granted Apr 19, 2005·12 cites·3 claims
- 2076US6771481B2Plasma processing apparatus for processing semiconductor wafer using plasmaHITACHI LTD·Filed 2001·Granted Aug 3, 2004·19 cites·21 claims
- 2175US10262842B2Analysis method and semiconductor etching apparatusHITACHI HIGH TECH CORP·Filed 2014·Granted Apr 16, 2019·2 cites·8 claims
- 2275US7058470B2Method of monitoring and/or controlling a semiconductor manufacturing apparatus and a system thereforHITACHI LTD·Filed 2004·Granted Jun 6, 2006·11 cites·9 claims
- 2375US7010374B2Method for controlling semiconductor processing apparatusHITACHI HIGH TECH CORP·Filed 2003·Granted Mar 7, 2006·15 cites·12 claims
- 2473US10872750B2Plasma processing apparatus and plasma processing systemHITACHI HIGH TECH CORP·Filed 2018·Granted Dec 22, 2020·1 cites·6 claims
- 2573US10734207B2Plasma processing apparatus and analysis method for analyzing plasma processing dataHITACHI HIGH TECH CORP·Filed 2017·Granted Aug 4, 2020·1 cites·9 claims
- 2673US6828165B2Semiconductor plasma processing apparatus with first and second processing state monitoring unitsHITACHI LTD·Filed 2003·Granted Dec 7, 2004·10 cites·3 claims
- 2771US11643727B2Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2018·Granted May 9, 2023·0 cites·9 claims
- 2871US2022328286A1Analysis method and semiconductor etching apparatusHITACHI HIGH TECH CORP·Filed 2022·Application pending·0 cites
- 2970US11404253B2Plasma processing apparatus and analysis method for analyzing plasma processing dataHITACHI HIGH TECH CORP·Filed 2020·Granted Aug 2, 2022·0 cites·6 claims
- 3070US11289313B2Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2018·Granted Mar 29, 2022·1 cites·8 claims
- 3169US10153217B2Plasma processing apparatus and plasma processing methodHITACHI HIGH TECH CORP·Filed 2017·Granted Dec 11, 2018·1 cites·7 claims
- 3269US8083960B2Etching endpoint determination methodUCHIDA HIROSHIGE·Filed 2008·Granted Dec 27, 2011·4 cites·3 claims
- 3368US8282849B2Etching process state judgment method and system thereforMORISAWA TOSHIHIRO·Filed 2009·Granted Oct 9, 2012·3 cites·9 claims
- 3466US9824866B2Plasma processing methodHITACHI HIGH TECH CORP·Filed 2014·Granted Nov 21, 2017·1 cites·7 claims
- 3566US7166480B2Particle control device and particle control method for vacuum processing apparatusHITACHI HIGH TECH CORP·Filed 2003·Granted Jan 23, 2007·10 cites·14 claims
- 3665US6776872B2Data processing apparatus for semiconductor processing apparatusHITACHI LTD·Filed 2002·Granted Aug 17, 2004·7 cites·8 claims
- 3764US12014909B2Plasma processing apparatus and plasma processing systemHITACHI HIGH TECH CORP·Filed 2020·Granted Jun 18, 2024·0 cites·1 claims
- 3864US6939435B1Plasma processing apparatus and processing methodHITACHI HIGH TECH CORP·Filed 2004·Granted Sep 6, 2005·7 cites·16 claims
- 3963US11538671B2Plasma processing apparatus and data analysis apparatusHITACHI HIGH TECH CORP·Filed 2019·Granted Dec 27, 2022·0 cites·5 claims
- 4063US6908529B2Plasma processing apparatus and methodHITACHI HIGH TECH CORP·Filed 2002·Granted Jun 21, 2005·8 cites·14 claims
- 4158US6830649B2Apparatus and method for producing semiconductorsHITACHI LTD·Filed 2002·Granted Dec 14, 2004·6 cites·25 claims
- 4257US10262840B2Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2014·Granted Apr 16, 2019·0 cites·5 claims
- 4357US2009120580A1Disturbance-Free, Recipe-Controlled Plasma Processing System And MethodKAGOSHIMA AKIRA·Filed 2009·Application pending·0 cites
- 4456US6916396B2Etching system and etching methodHITACHI HIGH TECH CORP·Filed 2002·Granted Jul 12, 2005·4 cites·12 claims
- 4555US12442770B2Plasma processing apparatus, plasma processing method and plasma processing analysis methodHITACHI HIGH TECH CORP·Filed 2019·Granted Oct 14, 2025·0 cites·7 claims
- 4654US8731706B2Vacuum processing apparatusKIMURA SHINGO·Filed 2009·Granted May 20, 2014·2 cites·8 claims
- 4754US2010258246A1Plasma Processing SystemIWAKOSHI TAKEHISA·Filed 2009·Application pending·0 cites
- 4853US7062347B2Maintenance method and system for plasma processing apparatusHITACHI LTD·Filed 2003·Granted Jun 13, 2006·3 cites·16 claims
- 4953US2007193687A1Disturbance-free, recipe-controlled plasma processing system and methodKAGOSHIMA AKIRA·Filed 2007·Application pending·0 cites
- 5052US2006199288A1Data processing apparatus for semiconductor processing apparatusTANAKA JUNICHI·Filed 2006·Application pending·0 cites
Showing the top 50 of 72 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →