Inventor · disambiguated record
Akinobu Kakimoto
Also filed as: KAKIMOTO AKINOBU
32 granted patents·15 pending applications·548 citations·filing 2001–2025
95Inventor score
Top patents by PatentIndex Score
47 records- 0197US8945339B2Film formation apparatusKAKIMOTO AKINOBU·Filed 2011·Granted Feb 3, 2015·488 cites·8 claims
- 0292US8802547B2Method and apparatus for forming amorphous silicon filmKAKIMOTO AKINOBU·Filed 2012·Granted Aug 12, 2014·13 cites·10 claims
- 0389US8946065B2Method of forming seed layer and method of forming silicon-containing thin filmTOKYO ELECTRON LTD·Filed 2012·Granted Feb 3, 2015·9 cites·21 claims
- 0484US11786946B2Cleaning method and film forming apparatusTOKYO ELECTRON LTD·Filed 2019·Granted Oct 17, 2023·4 cites·16 claims
- 0582US8895414B1Method and apparatus for forming amorphous silicon filmTOKYO ELECTRON LTD·Filed 2014·Granted Nov 25, 2014·4 cites·8 claims
- 0680US10460950B2Substrate processing system and substrate processing methodTOKYO ELECTRON LTD·Filed 2015·Granted Oct 29, 2019·2 cites·12 claims
- 0780US9758865B2Silicon film forming method, thin film forming method and cross-sectional shape control methodTOKYO ELECTRON LTD·Filed 2014·Granted Sep 12, 2017·4 cites·29 claims
- 0878US12482663B2Processing apparatusTOKYO ELECTRON LTD·Filed 2022·Granted Nov 25, 2025·0 cites·20 claims
- 0978US9263250B2Method and apparatus of forming silicon nitride filmTOKYO ELECTRON LTD·Filed 2014·Granted Feb 16, 2016·3 cites·16 claims
- 1074US9005459B2Film deposition method and film deposition apparatusKAKIMOTO AKINOBU·Filed 2012·Granted Apr 14, 2015·3 cites·4 claims
- 1170US9797067B2Selective epitaxial growth method and film forming apparatusTOKYO ELECTRON LTD·Filed 2014·Granted Oct 24, 2017·2 cites·11 claims
- 1269US9006021B2Amorphous silicon film formation method and amorphous silicon film formation apparatusHASEBE KAZUHIDE·Filed 2011·Granted Apr 14, 2015·2 cites·14 claims
- 1367US9777366B2Thin film forming methodTOKYO ELECTRON LTD·Filed 2015·Granted Oct 3, 2017·1 cites·1 claims
- 1465US9425073B2Depression filling method and processing apparatusTOKYO ELECTRON LTD·Filed 2014·Granted Aug 23, 2016·1 cites·6 claims
- 1565US9145604B2Thin film forming method and film forming apparatusTOKYO ELECTRON LTD·Filed 2012·Granted Sep 29, 2015·1 cites·22 claims
- 1664US8673086B2Method and device for cleaning a substrate and storage mediumTAMURA AKITAKE·Filed 2009·Granted Mar 18, 2014·2 cites·10 claims
- 1763US8361550B2Method for forming SrTiO3 film and storage mediumTOKYO ELECTRON LTD·Filed 2008·Granted Jan 29, 2013·1 cites·15 claims
- 1863US2020035496A1Plasma processing apparatus and plasma processing methodTOKYO ELECTRON LTD·Filed 2019·Application pending·0 cites
- 1963US2020035497A1Processing apparatusTOKYO ELECTRON LTD·Filed 2019·Application pending·0 cites
- 2060US2025369109A1Film forming method and film forming apparatusTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 2159US8679913B2Method for Sr—Ti—O-based film formationKAWANO YUMIKO·Filed 2008·Granted Mar 25, 2014·1 cites·4 claims
- 2256US8815714B2Method of forming a germanium thin filmTOKYO ELECTRON LTD·Filed 2013·Granted Aug 26, 2014·0 cites·10 claims
- 2354US9190271B2Thin film formation methodTOKYO ELECTRON LTD·Filed 2014·Granted Nov 17, 2015·0 cites·7 claims
- 2454US2014331928A1Method of forming a germanium thin filmTOKYO ELECTRON LTD·Filed 2014·Application pending·0 cites
- 2553US2009220692A1Method of substrate treatment, recording medium and substrate treating apparatusTOKYO ELECTRON LTD·Filed 2006·Application pending·0 cites
- 2652US6407010B1Single-substrate-heat-processing apparatus and method for semiconductor processTOKYO ELECTRON LTD·Filed 2001·Granted Jun 18, 2002·4 cites·15 claims
- 2751US7615251B2Processing device using shower head structure and processing methodTOKYO ELECTRON LTD·Filed 2003·Granted Nov 10, 2009·3 cites·13 claims
- 2851US2012118231A1Substrate processing method, storage medium, and substrate processing apparatusTAKAGI TOSHIO·Filed 2012·Application pending·0 cites
- 2950US8728957B2Thin film formation method and film formation apparatusHASEBE KAZUHIDE·Filed 2011·Granted May 20, 2014·0 cites·9 claims
- 3049US9353442B2Apparatus for forming silicon-containing thin filmTOKYO ELECTRON LTD·Filed 2014·Granted May 31, 2016·0 cites·21 claims
- 3148US9920422B2Method and apparatus of forming silicon nitride filmTOKYO ELECTRON LTD·Filed 2015·Granted Mar 20, 2018·0 cites·5 claims
- 3248US9123782B2Amorphous silicon film formation method and amorphous silicon film formation apparatusTOKYO ELECTRON LTD·Filed 2015·Granted Sep 1, 2015·0 cites·18 claims
- 3348US2011052810A1Film forming method and storage mediumTOKYO ELECTRON LTD·Filed 2009·Application pending·0 cites
- 3448US2011036288A1Sr-ti-o-based film forming method and storage mediumTOKYO ELECTRON LTD·Filed 2009·Application pending·0 cites
- 3545US9646879B2Depression filling method and processing apparatusTOKYO ELECTRON LTD·Filed 2014·Granted May 9, 2017·0 cites·4 claims
- 3645US7816282B2Method for forming SrTiO3 filmTOKYO ELECTRON LTD·Filed 2008·Granted Oct 19, 2010·0 cites·15 claims
- 3744US8586448B2Method and apparatus for forming silicon filmKAKIMOTO AKINOBU·Filed 2012·Granted Nov 19, 2013·0 cites·14 claims
- 3844US2016251755A1Method and apparatus for forming carbon filmTOKYO ELECTRON LTD·Filed 2016·Application pending·0 cites
- 3944US2009277389A1Processing apparatusTOKYO ELECTRON LTD·Filed 2007·Application pending·0 cites
- 4043US9318328B2Method and apparatus for forming silicon filmTOKYO ELECTRON LTD·Filed 2013·Granted Apr 19, 2016·0 cites·6 claims
- 4143US8518834B2Method and apparatus for forming oxide film on carbon filmKAKIMOTO AKINOBU·Filed 2011·Granted Aug 27, 2013·0 cites·6 claims
- 4243US2015275360A1Vacuum Processing ApparatusTOKYO ELECTRON LTD·Filed 2015·Application pending·0 cites
- 4341US2007228442A1Thin Film Capacitor, Method for Forming Same, and Computer Readable Recording MediumTOKYO ELECTRON LTD·Filed 2005·Application pending·0 cites
- 4440US9490122B2Method and apparatus of forming carbon-containing silicon filmTOKYO ELECTRON LTD·Filed 2015·Granted Nov 8, 2016·0 cites·6 claims
- 4538US2017342548A1Method of forming carbon film, apparatus of forming carbon film and storage mediumTOKYO ELECTRON LTD·Filed 2017·Application pending·0 cites
- 4635US2012034793A1Method for forming metal nitride filmNARUSHIMA KENSAKU·Filed 2011·Application pending·0 cites
- 4734US2011287629A1Silicon film formation method and silicon film formation apparatusKAKIMOTO AKINOBU·Filed 2011·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →