Inventor · disambiguated record
Akinori Kitamura
Also filed as: KITAMURA AKINORI
31 granted patents·5 pending applications·280 citations·filing 1979–2018
96Inventor score
Top patents by PatentIndex Score
36 records- 0194US9209034B2Plasma etching method and plasma etching apparatusTOKYO ELECTRON LTD·Filed 2013·Granted Dec 8, 2015·43 cites·8 claims
- 0294US9087798B2Etching methodTOKYO ELECTRON LTD·Filed 2014·Granted Jul 21, 2015·41 cites·3 claims
- 0392US8168739B2Polysiloxane, method for producing the same, and method for producing cured product of the sameKITAMURA AKINORI·Filed 2008·Granted May 1, 2012·15 cites·9 claims
- 0481US8821644B2Bevel/backside polymer removing method and device, substrate processing apparatus and storage mediumSAKURAGI ISAMU·Filed 2008·Granted Sep 2, 2014·12 cites·7 claims
- 0581US6380378B1Nucleotide compound, nucleotide block oligonucleotide, and method for producing themTOAGOSEI COMPANY LTD·Filed 1999·Granted Apr 30, 2002·97 cites·21 claims
- 0679US9136486B2Composition for organic semiconductor insulating films, and organic semiconductor insulating filmTOAGOSEI CO LTD·Filed 2012·Granted Sep 15, 2015·2 cites·12 claims
- 0778US7794616B2Etching gas, etching method and etching gas evaluation methodTOKYO ELECTRON LTD·Filed 2005·Granted Sep 14, 2010·5 cites·10 claims
- 0872US7842190B2Plasma etching methodTOKYO ELECTRON LTD·Filed 2007·Granted Nov 30, 2010·5 cites·18 claims
- 0968US7473377B2Plasma processing methodTOKYO ELECTRON LTD·Filed 2004·Granted Jan 6, 2009·14 cites·66 claims
- 1065US9502537B2Method of selectively removing a region formed of silicon oxide and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2014·Granted Nov 22, 2016·1 cites·23 claims
- 1162US9412607B2Plasma etching methodTOKYO ELECTRON LTD·Filed 2014·Granted Aug 9, 2016·1 cites·5 claims
- 1261US8329774B2Organosilicon compounds which have oxetanyl groups, and a method for the production and curable compositions of the sameOOIKE SAYAKA·Filed 2009·Granted Dec 11, 2012·1 cites·18 claims
- 1358US9570312B2Plasma etching methodTOKYO ELECTRON LTD·Filed 2013·Granted Feb 14, 2017·1 cites·4 claims
- 1457US10121674B2Method for etching silicon layer and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2017·Granted Nov 6, 2018·0 cites·6 claims
- 1557US8110613B2Process for producing silicon compound having oxetanyl groupOIKE SAYAKA·Filed 2009·Granted Feb 7, 2012·1 cites·11 claims
- 1656US9779954B2Method for etching silicon layer and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2014·Granted Oct 3, 2017·0 cites·7 claims
- 1755US8829142B2Curable composition and process for production of organosilicon compoundOOIKE SAYAKA·Filed 2009·Granted Sep 9, 2014·0 cites·4 claims
- 1854US2013149455A1Curable composition and process for production of organosilicon compoundTOAGOSEI CO LTD·Filed 2013·Application pending·0 cites
- 1951US7883631B2Plasma etching method, plasma etching apparatus, control program and computer-readable storage mediumTOKYO ELECTRON LTD·Filed 2007·Granted Feb 8, 2011·0 cites·11 claims
- 2051US6611785B1Flowmeter, flow detecting switch, control method of flowmeter, control method of flow detecting switch, and recording medium having recorded a control programSAGINOMIYA SEISAKUSHO INC·Filed 1999·Granted Aug 26, 2003·21 cites·17 claims
- 2148US10672622B2Etching method and etching apparatusTOKYO ELECTRON LTD·Filed 2018·Granted Jun 2, 2020·0 cites·12 claims
- 2247US7183219B1Method of plasma processingTOKYO ELECTRON AT LTD AND JAPA·Filed 1999·Granted Feb 27, 2007·16 cites·19 claims
- 2346US7838626B2Polycarbosilane and method for producing sameTOAGOSEI CO LTD·Filed 2006·Granted Nov 23, 2010·0 cites·6 claims
- 2446US7655572B2Semiconductor device manufacturing method, semiconductor device manufacturing apparatus, control program and computer storage mediumTOKYO ELECTRON LTD·Filed 2006·Granted Feb 2, 2010·0 cites·5 claims
- 2545US9289651B2Golf ball resin composition and golf ballDUNLOP SPORTS CO LTD·Filed 2013·Granted Mar 22, 2016·0 cites·16 claims
- 2645US7300881B2Plasma etching methodTOKYO ELECTRON LTD·Filed 2004·Granted Nov 27, 2007·1 cites·9 claims
- 2745US2009188892A1Method of checking substrate edge processing apparatusTOKYO ELECTRON LTD·Filed 2009·Application pending·0 cites
- 2844US2014323677A1Thermal-shock-resistant cured product and method for producing sameKITAMURA AKINORI·Filed 2012·Application pending·0 cites
- 2943US8952117B2Process for producing solvent-soluble reactive polysiloxanesKITAMURA AKINORI·Filed 2011·Granted Feb 10, 2015·0 cites·20 claims
- 3043US2007197040A1Plasma etching method, plasma etching apparatus, control program and computer-readable storage mediumTOKYO ELECTRON LTD·Filed 2007·Application pending·0 cites
- 3140US9181399B2Method for producing polysiloxaneTOAGOSEI CO LTD·Filed 2012·Granted Nov 10, 2015·0 cites·14 claims
- 3239US8940852B2Method for manufacturing reactive polysiloxane solutionFURUTA NAOMASA·Filed 2011·Granted Jan 27, 2015·0 cites·14 claims
- 3337US2005101140A1Method of plasma etchingTOKYO ELECTRON LTD·Filed 2004·Application pending·0 cites
- 3433US6986851B2Dry developing methodTOKYO ELECTRON LTD·Filed 2002·Granted Jan 17, 2006·0 cites·13 claims
- 3531US4222206AEarthquake resistant, even loaded man-made land structure and method of making sameKITAMURA AKINORI·Filed 1979·Granted Sep 16, 1980·3 cites·5 claims
- 3629US9711371B2Method of etching organic filmTOKYO ELECTRON LTD·Filed 2015·Granted Jul 18, 2017·0 cites·8 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →