Inventor · disambiguated record
Albert R. Ellingboe
Also filed as: ELLINGBOE ALBERT · ELLINGBOE ALBERT R · ELLINGBOE ALBERT ROGERS
23 granted patents·3 pending applications·1,280 citations·filing 1989–2010
97Inventor score
Top patents by PatentIndex Score
26 records- 0199US6949204B1Deformation reduction at the main chamberLAM RES CORP·Filed 2004·Granted Sep 27, 2005·415 cites·6 claims
- 0298US6841943B2Plasma processor with electrode simultaneously responsive to plural frequenciesLAM RES CORP·Filed 2002·Granted Jan 11, 2005·115 cites·70 claims
- 0396US7886690B2Plasma sourceUNIV DUBLIN CITY·Filed 2006·Granted Feb 15, 2011·32 cites·23 claims
- 0495US7342361B2Plasma sourceUNIV DUBLIN CITY·Filed 2005·Granted Mar 11, 2008·30 cites·24 claims
- 0594US6823815B2Wafer area pressure control for plasma confinementLAM RES CORP·Filed 2002·Granted Nov 30, 2004·76 cites·17 claims
- 0694US5367139AMethods and apparatus for contamination control in plasma processingIBM·Filed 1989·Granted Nov 22, 1994·60 cites·32 claims
- 0792US7589470B2Method and apparatus for producing plasmaUNIV DUBLIN CITY·Filed 2006·Granted Sep 15, 2009·100 cites·20 claims
- 0890US8845855B2Electrode for plasma processes and method for manufacture and use thereofHUBACEK JEROME S·Filed 2007·Granted Sep 30, 2014·23 cites·8 claims
- 0990US6492774B1Wafer area pressure control for plasma confinementLAM RES CORP·Filed 2000·Granted Dec 10, 2002·45 cites·17 claims
- 1090US6363882B1Lower electrode design for higher uniformityLAM RES CORP·Filed 1999·Granted Apr 2, 2002·57 cites·28 claims
- 1186US5918140ADeposition of dopant impurities and pulsed energy drive-inUNIV CALIFORNIA·Filed 1997·Granted Jun 29, 1999·69 cites·15 claims
- 1285US5686796AIon implantation helicon plasma source with magnetic dipolesIBM·Filed 1995·Granted Nov 11, 1997·49 cites·15 claims
- 1382US6436739B1Thick adherent dielectric films on plastic substrates and method for depositing sameUNIV CALIFORNIA·Filed 2000·Granted Aug 20, 2002·22 cites·17 claims
- 1481US5387777AMethods and apparatus for contamination control in plasma processingIBM·Filed 1992·Granted Feb 7, 1995·42 cites·26 claims
- 1578USRE39988EDeposition of dopant impurities and pulsed energy drive-inUNIV CALIFORNIA·Filed 2001·Granted Jan 1, 2008·18 cites·33 claims
- 1678US6204607B1Plasma source with multiple magnetic flux sources each having a ferromagnetic coreAPPLIED KOMATSU TECHNOLOGY INC·Filed 1998·Granted Mar 20, 2001·67 cites·16 claims
- 1775US6490536B1Integrated load simulatorLAM RES CORP·Filed 2000·Granted Dec 3, 2002·12 cites·18 claims
- 1874US7524397B2Lower electrode design for higher uniformityLAM RES CORP·Filed 2002·Granted Apr 28, 2009·9 cites·20 claims
- 1965US7470627B2Wafer area pressure control for plasma confinementLAM RES CORP·Filed 2004·Granted Dec 30, 2008·7 cites·18 claims
- 2060US5824602AHelicon wave excitation to produce energetic electrons for manufacturing semiconductorsUS ENERGY·Filed 1996·Granted Oct 20, 1998·28 cites·30 claims
- 2153US6712929B1Deformation reduction at the main chamberLAM RES CORP·Filed 2000·Granted Mar 30, 2004·3 cites·16 claims
- 2249US8890412B2Plasma source electrodeELLINGBOE ALBERT ROGERS·Filed 2010·Granted Nov 18, 2014·1 cites·8 claims
- 2345US2006032736A1Deformation reduction at the main chamberLAM RES CORP·Filed 2005·Application pending·0 cites
- 2439US2002127853A1Electrode for plasma processes and method for manufacture and use thereofFiled 2000·Application pending·0 cites
- 2539US2003129106A1Semiconductor processing using an efficiently coupled gas sourceAPPLIED MATERIALS INC·Filed 2002·Application pending·0 cites
- 2635US8680770B2Power splitterELLINGBOE ALBERT ROGERS·Filed 2009·Granted Mar 25, 2014·0 cites·58 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →