Inventor · disambiguated record
Alfred T. Jeffries, Iii
Also filed as: JEFFRIES III ALFRED T
25 granted patents·224 citations·filing 1984–1999
96Inventor score
Files withOCG MICROELECTRONIC MATERIALS16OLIN HUNT SPECIALTY PROD6ARCH SPEC CHEM INC1HUNT CHEM CORP PHILIP A1OLIN MICROELECTRONIC CHEM INC1
Top patents by PatentIndex Score
25 records- 0187US4837121AThermally stable light-sensitive compositions with o-quinone diazide and phenolic resinOLIN HUNT SPECIALTY PROD·Filed 1987·Granted Jun 6, 1989·36 cites·20 claims
- 0283US4957846ARadiation sensitive compound and mixtures with trinuclear novolak oligomer with o-naphthoquinone diazide sulfonyl groupOLIN HUNT SPECIALTY PROD·Filed 1988·Granted Sep 18, 1990·18 cites·16 claims
- 0374US5346799ANovolak resins and their use in radiation-sensitive compositions wherein the novolak resins are made by condensing 2,6-dimethylphenol, 2,3-dimethylphenol, a para-substituted phenol and an aldehydeOCG MICROELECTRONIC MATERIALS·Filed 1992·Granted Sep 13, 1994·22 cites·8 claims
- 0471US4992596ASelected trinuclear novolak oligomers and their use in photoactive compounds and radiation sensitive mixturesOLIN HUNT SPECIALTY PROD·Filed 1990·Granted Feb 12, 1991·17 cites·5 claims
- 0569US5196289ASelected block phenolic oligomers and their use in radiation-sensitive resist compositionsOCG MICROELECTRONIC MATERIALS·Filed 1991·Granted Mar 23, 1993·15 cites·13 claims
- 0665US5283374ASelected phenolic derivatives of 4-(4-hydroxyphenyl)-cyclohexanone and their use as sensitivity enhancers for radiation sensitive mixturesOCG MICROELECTRONIC MATERIALS·Filed 1993·Granted Feb 1, 1994·19 cites·9 claims
- 0765US4617252AAntireflective coatings for use in the manufacture of semi-conductor devices, methods and solutions for making such coatings, and the method for using such coatings to absorb light in ultraviolet photolithography processesHUNT CHEM CORP PHILIP A·Filed 1984·Granted Oct 14, 1986·28 cites·11 claims
- 0856US5346808APositive image formation utilizing o-quinonediazide composition including selected phenolic derivatives of 4-(4-hydroxyphenyl)-cyclohexanoneOCG MICROELECTRONIC MATERIALS·Filed 1993·Granted Sep 13, 1994·4 cites·7 claims
- 0953US4970287AThermally stable phenolic resin compositions with ortho, ortho methylene linkageOLIN HUNT SPECIALTY PROD·Filed 1989·Granted Nov 13, 1990·8 cites·13 claims
- 1050US5232819ASelected block phenolic oligomers and their use in phenolic resin compositions and in radiation-sensitive resist compositionsOCG MICROELECTRONIC MATERIALS·Filed 1992·Granted Aug 3, 1993·4 cites·3 claims
- 1148US5278021AO-naphthoquinone diazide sulfonyl esters of 4-(4-hydroxyphenyl)cyclohexanone phenolic derivatives with associated radiation sensitive mixtures and articlesOCG MICROELECTRONIC MATERIALS·Filed 1993·Granted Jan 11, 1994·7 cites·10 claims
- 1245US6140026APhotosensitive diazonaphthoquinone esters based on selected cyclic alkyl ether-containing phenolics and their use in radiation sensitive mixturesARCH SPEC CHEM INC·Filed 1999·Granted Oct 31, 2000·2 cites·10 claims
- 1344US6040107APhotosensitive diazonaphthoquinone esters based on selected cyclic alkyl ether-containing phenolics and their use in radiation sensitive mixturesOLIN MICROELECTRONIC CHEM INC·Filed 1998·Granted Mar 21, 2000·2 cites·7 claims
- 1444US5366843ACoated substrate utilizing composition including selected phenolic derivatives of 4-(4-hydroxyphenyl)-cyclohexanone as sensitivity enhancersOCG MICROELECTRONIC MATERIALS·Filed 1994·Granted Nov 22, 1994·7 cites·9 claims
- 1544US4992356AProcess of developing a radiation imaged product with trinuclear novolak oligomer having o-naphthoquinone diazide sulfonyl groupOLIN HUNT SPECIALTY PROD·Filed 1990·Granted Feb 12, 1991·7 cites·4 claims
- 1642US5302688ASelected block phenolic oligomers and their use in phenolic resin compositions and in radiation-sensitive resist compositionsOCG MICROELECTRONIC MATERIALS·Filed 1992·Granted Apr 12, 1994·5 cites·4 claims
- 1741US5234795AProcess of developing an image-wise exposed resist-coated substrateOCG MICROELECTRONIC MATERIALS·Filed 1992·Granted Aug 10, 1993·6 cites·3 claims
- 1839US5235022ASelected block copolymer novolak binder resinsOCG MICROELECTRONIC MATERIALS·Filed 1992·Granted Aug 10, 1993·5 cites·6 claims
- 1939US5024921AThermally stable light-sensitive compositions with o-quinone diazide and phenolic resin used in a method of forming a positive photoresist imageOCG MICROELECTRONIC MATERIALS·Filed 1990·Granted Jun 18, 1991·5 cites·3 claims
- 2033US5312720AProcess of developing a positive image utilizing o-naphthoquinone diazide radiation-sensitive esters of phenolic derivatives of 4-(4-hydroxyphenyl)cyclohexanoneOCG MICROELECTRONIC MATERIALS·Filed 1993·Granted May 17, 1994·2 cites·7 claims
- 2133US4797345ALight-sensitive 1,2-naphthoquinone-2-diazide-4-sulfonic acid monoesters of cycloalkyl substituted phenol and their use in light-sensitive mixturesOLIN HUNT SPECIALTY PROD·Filed 1987·Granted Jan 10, 1989·2 cites·18 claims
- 2231US5220073ASelected trihydroxybenzophenone compoundsOCG MICROELECTRONIC MATERIALS·Filed 1992·Granted Jun 15, 1993·1 cites·5 claims
- 2331US5196517ASelected trihydroxybenzophenone compounds and their use as photoactive compoundsOCG MICROELECTRONIC MATERIALS·Filed 1991·Granted Mar 23, 1993·0 cites·5 claims
- 2430US5219714ASelected trihydroxybenzophenone compounds and their use in photoactive compounds and radiation sensitive mixturesOCG MICROELECTRONIC MATERIALS·Filed 1992·Granted Jun 15, 1993·1 cites·4 claims
- 2530US5188921ASelected block copolymer novolak binder resins in radiation-sensitive resist compositionsOCG MICROELECTRONIC MATERIALS·Filed 1991·Granted Feb 23, 1993·1 cites·15 claims
Join the waitlist — get patent alerts
Get an alert when Alfred T. Jeffries, Iii files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →