Inventor · disambiguated record
Alok Verma
Also filed as: VERMA ALOK · VERMA ALOK KUMAR
28 granted patents·7 pending applications·92 citations·filing 2004–2023
95Inventor score
Top patents by PatentIndex Score
35 records- 0198US11784098B2Method and apparatus to determine a patterning process parameterASML NETHERLANDS BV·Filed 2021·Granted Oct 10, 2023·3 cites·21 claims
- 0298US11145557B2Method and apparatus to determine a patterning process parameterASML NETHERLANDS BV·Filed 2020·Granted Oct 12, 2021·5 cites·23 claims
- 0396US10615084B2Method and apparatus to determine a patterning process parameter, associated with a change in a physical configuration, using measured pixel optical characteristic valuesASML NETHERLANDS BV·Filed 2017·Granted Apr 7, 2020·9 cites·34 claims
- 0496US10453758B2Method and apparatus to determine a patterning process parameter using an asymmetric optical characteristic distribution portionASML NETHERLANDS BV·Filed 2017·Granted Oct 22, 2019·9 cites·29 claims
- 0595US10546790B2Method and apparatus to determine a patterning process parameterASML NETHERLANDS BV·Filed 2017·Granted Jan 28, 2020·7 cites·36 claims
- 0693US9952517B2Method of determining dose, inspection apparatus, patterning device, substrate and device manufacturing methodASML NETHERLANDS BV·Filed 2015·Granted Apr 24, 2018·6 cites·19 claims
- 0792US7593352B2Discovering MPLS VPN services in a networkCISCO TECH INC·Filed 2006·Granted Sep 22, 2009·30 cites·45 claims
- 0890US10811323B2Method and apparatus to determine a patterning process parameterASML NETHERLANDS BV·Filed 2017·Granted Oct 20, 2020·4 cites·21 claims
- 0989US11101184B2Method and apparatus to determine a patterning process parameterASML NETHERLANDS BV·Filed 2019·Granted Aug 24, 2021·2 cites·18 claims
- 1088US12322660B2Method and apparatus to determine a patterning process parameterASML NETHERLANDS BV·Filed 2023·Granted Jun 3, 2025·0 cites·20 claims
- 1187US12142535B2Method and apparatus to determine a patterning process parameter using a unit cell having geometric symmetryASML NETHERLANDS BV·Filed 2017·Granted Nov 12, 2024·2 cites·22 claims
- 1287US10983445B2Method and apparatus for measuring a parameter of interest using image plane detection techniquesASML NETHERLANDS BV·Filed 2019·Granted Apr 20, 2021·3 cites·20 claims
- 1383US10481503B2Method and apparatus for measuring a parameter of a lithographic process, substrate and patterning devices for use in the methodASML NETHERLANDS BV·Filed 2016·Granted Nov 19, 2019·2 cites·16 claims
- 1482US10747122B2Method of measuring a parameter of a device manufacturing process, metrology apparatus, substrate, target, device manufacturing system, and device manufacturing methodASML NETHERLANDS BV·Filed 2017·Granted Aug 18, 2020·2 cites·20 claims
- 1580US11728224B2Method and apparatus to determine a patterning process parameterASML NETHERLANDS BV·Filed 2021·Granted Aug 15, 2023·0 cites·20 claims
- 1675US11710668B2Method and apparatus to determine a patterning process parameterASML NETHERLANDS BV·Filed 2020·Granted Jul 25, 2023·0 cites·20 claims
- 1774US11101185B2Method and apparatus to determine a patterning process parameterASML NETHERLANDS BV·Filed 2019·Granted Aug 24, 2021·0 cites·20 claims
- 1872US10677589B2Substrate, metrology apparatus and associated methods for a lithographic processASML NETHERLANDS BV·Filed 2018·Granted Jun 9, 2020·1 cites·20 claims
- 1969US9953121B2Accommodating engineering change orders in integrated circuit designIBM·Filed 2016·Granted Apr 24, 2018·1 cites·14 claims
- 2067US10854189B2Techniques for model training for voice featuresAMAZON TECH INC·Filed 2018·Granted Dec 1, 2020·2 cites·21 claims
- 2166US10937413B2Techniques for model training for voice featuresAMAZON TECH INC·Filed 2018·Granted Mar 2, 2021·1 cites·20 claims
- 2265US11092900B2Method and apparatus for measuring a parameter of a lithographic process, substrate and patterning devices for use in the methodASML NETHERLANDS BV·Filed 2019·Granted Aug 17, 2021·0 cites·20 claims
- 2364US10871367B2Substrate, metrology apparatus and associated methods for a lithographic processASML NETHERLANDS BV·Filed 2020·Granted Dec 22, 2020·0 cites·20 claims
- 2459US8391168B2Automatically discovering architectural roles of packet switching devicesJIANG SHUN·Filed 2007·Granted Mar 5, 2013·2 cites·22 claims
- 2556US9965576B2Accommodating engineering change orders in integrated circuit designIBM·Filed 2017·Granted May 8, 2018·0 cites·1 claims
- 2656US2018181687A1Accommodating engineering change orders in integrated circuit designIBM·Filed 2018·Application pending·0 cites
- 2756US2018181686A1Accommodating engineering change orders in integrated circuit designIBM·Filed 2018·Application pending·0 cites
- 2855US2025237702A1Alternator monitoring systems and methodsUNIV NANYANG TECH·Filed 2023·Application pending·0 cites
- 2954US2025224685A1Method for determining a measurement recipe and associated apparatusesASMLNETHERLANDS B V·Filed 2022·Application pending·0 cites
- 3053US2025208078A1Monitoring systems and monitoring methods for pneumatically actuated doorUNIV NANYANG TECH·Filed 2023·Application pending·0 cites
- 3149US11175592B2Methods and apparatus for inspection of a structure and associated apparatusesASML NETHERLANDS BV·Filed 2019·Granted Nov 16, 2021·0 cites·17 claims
- 3249US2024004309A1A method of monitoring a lithographic processASML NETHERLANDS BV·Filed 2021·Application pending·0 cites
- 3342US7207655B2Latency stirring in fluid ejection mechanismsEASTMAN KODAK CO·Filed 2004·Granted Apr 24, 2007·1 cites·54 claims
- 3438US2006275542A1Deposition of uniform layer of desired materialEASTMAN KODAK CO·Filed 2005·Application pending·0 cites
- 3537US10379446B2Lithography system, method and computer program product for hierarchical representation of two-dimensional or three-dimensional shapesASML NETHERLANDS BV·Filed 2016·Granted Aug 13, 2019·0 cites·27 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →