Inventor · disambiguated record
Andras Kuthi
Also filed as: KUTHI ANDRAS
54 granted patents·10 pending applications·2,889 citations·filing 1991–2019
99Inventor score
Files withLAM RES CORP37UNIV SOUTHERN CALIFORNIA4KUTHI ANDRAS3SEXTON GREGORY S3TRANSIENT PLASMA SYSTEMS INC3
Top patents by PatentIndex Score
64 records- 0199US7901930B2High voltage nanosecond pulse generator using fast recovery diodes for cell electro-manipulationUNIV SOUTHERN CALIFORNIA·Filed 2010·Granted Mar 8, 2011·81 cites·7 claims
- 0299US7858898B2Bevel etcher with gap controlLAM RES CORP·Filed 2007·Granted Dec 28, 2010·349 cites·19 claims
- 0399US7767433B2High voltage nanosecond pulse generator using fast recovery diodes for cell electro-manipulationUNIV SOUTHERN CALIFORNIA·Filed 2006·Granted Aug 3, 2010·98 cites·14 claims
- 0499US7611640B1Minimizing arcing in a plasma processing chamberLAM RES CORP·Filed 2006·Granted Nov 3, 2009·365 cites·33 claims
- 0599US7086347B2Apparatus and methods for minimizing arcing in a plasma processing chamberLAM RES CORP·Filed 2002·Granted Aug 8, 2006·380 cites·31 claims
- 0699US6320320B1Method and apparatus for producing uniform process ratesLAM RES CORP·Filed 1999·Granted Nov 20, 2001·411 cites·40 claims
- 0798US6841943B2Plasma processor with electrode simultaneously responsive to plural frequenciesLAM RES CORP·Filed 2002·Granted Jan 11, 2005·115 cites·70 claims
- 0897US10301587B2Compact subnanosecond high voltage pulse generation system for cell electro-manipulationUNIV SOUTHERN CALIFORNIA·Filed 2016·Granted May 28, 2019·31 cites·23 claims
- 0997US7480571B2Apparatus and methods for improving the stability of RF power delivery to a plasma loadLAM RES CORP·Filed 2004·Granted Jan 20, 2009·84 cites·20 claims
- 1097US6876155B2Plasma processor apparatus and method, and antennaLAM RES CORP·Filed 2002·Granted Apr 5, 2005·68 cites·48 claims
- 1196US8120207B2Nanosecond pulse generator with a protector circuitSANDERS JASON·Filed 2010·Granted Feb 21, 2012·46 cites·27 claims
- 1296US8115343B2Nanosecond pulse generatorSANDERS JASON·Filed 2009·Granted Feb 14, 2012·82 cites·25 claims
- 1396US6341574B1Plasma processing systemsLAM RES CORP·Filed 1999·Granted Jan 29, 2002·135 cites·2 claims
- 1495US6242360B1Plasma processing system apparatus, and method for delivering RF power to a plasma processingLAM RES CORP·Filed 1999·Granted Jun 5, 2001·107 cites·21 claims
- 1594US10072629B2Repetitive ignition system for enhanced combustionTRANSIENT PLASMA SYSTEMS INC·Filed 2017·Granted Sep 11, 2018·7 cites·17 claims
- 1693US9617965B2Repetitive ignition system for enhanced combustionTRANSIENT PLASMA SYSTEMS INC·Filed 2014·Granted Apr 11, 2017·12 cites·11 claims
- 1793US6106663ASemiconductor process chamber electrodeLAM RES CORP·Filed 1998·Granted Aug 22, 2000·71 cites·19 claims
- 1892US9493765B2Compact subnanosecond high voltage pulse generation system for cell electro-manipulationKRISHNASWAMY PAVITRA·Filed 2008·Granted Nov 15, 2016·41 cites·12 claims
- 1992US7901929B2High voltage nanosecond pulse generator using fast recovery diodes for cell electro-manipulationUNIV SOUTHERN CALIFORNIA·Filed 2009·Granted Mar 8, 2011·16 cites·13 claims
- 2092US7811410B2Matching circuit for a complex radio frequency (RF) waveformLAM RES CORP·Filed 2008·Granted Oct 12, 2010·22 cites·29 claims
- 2192US7413673B2Method for adjusting voltage on a powered Faraday shieldLAM RES CORP·Filed 2005·Granted Aug 19, 2008·17 cites·13 claims
- 2290US6838832B1Apparatus and methods for improving the stability of RF power delivery to a plasma loadLAM RES CORP·Filed 2002·Granted Jan 4, 2005·34 cites·174 claims
- 2389US7938931B2Edge electrodes with variable powerLAM RES CORP·Filed 2007·Granted May 10, 2011·11 cites·12 claims
- 2489US7905982B2Antenna for plasma processor apparatusLAM RES CORP·Filed 2005·Granted Mar 15, 2011·8 cites·22 claims
- 2587US6592710B1Apparatus for controlling the voltage applied to an electrostatic shield used in a plasma generatorLAM RES CORP·Filed 2001·Granted Jul 15, 2003·22 cites·28 claims
- 2687US6562190B1System, apparatus, and method for processing wafer using single frequency RF power in plasma processing chamberLAM RES CORP·Filed 2000·Granted May 13, 2003·36 cites·16 claims
- 2784US10923322B2Articulated direct-mount inductor and associated systems and methodsLAM RES CORP·Filed 2017·Granted Feb 16, 2021·3 cites·16 claims
- 2884US6302966B1Temperature control system for plasma processing apparatusLAM RES CORP·Filed 1999·Granted Oct 16, 2001·42 cites·26 claims
- 2983US6974550B2Apparatus and method for controlling the voltage applied to an electrostatic shield used in a plasma generatorLAM RES CORP·Filed 2003·Granted Dec 13, 2005·15 cites·10 claims
- 3083US6518705B2Method and apparatus for producing uniform process ratesLAM RES CORP·Filed 2001·Granted Feb 11, 2003·16 cites·16 claims
- 3182US8277604B2Antenna for plasma processor and apparatusHOWALD ARTHUR M·Filed 2011·Granted Oct 2, 2012·4 cites·11 claims
- 3281US7691278B2Apparatus for the removal of a fluorinated polymer from a substrate and methods thereforLAM RES CORP·Filed 2005·Granted Apr 6, 2010·6 cites·20 claims
- 3380US9659757B2Measuring and controlling wafer potential in pulsed RF bias processingLAM RES CORP·Filed 2012·Granted May 23, 2017·4 cites·11 claims
- 3479US8926789B2Apparatus for the removal of a fluorinated polymer from a substrateYOON HYUNGSUK ALEXANDER·Filed 2010·Granted Jan 6, 2015·4 cites·19 claims
- 3578US9564308B2Methods for processing bevel edge etchingLAM RES CORP·Filed 2015·Granted Feb 7, 2017·2 cites·15 claims
- 3678US5288969AElectrodeless plasma torch apparatus and methods for the dissociation of hazardous wasteUNIV CALIFORNIA·Filed 1991·Granted Feb 22, 1994·69 cites·65 claims
- 3777US8137501B2Bevel clean deviceKIM YUNSANG·Filed 2007·Granted Mar 20, 2012·6 cites·16 claims
- 3876US6653791B1Method and apparatus for producing uniform process ratesLAM RES CORP·Filed 2001·Granted Nov 25, 2003·10 cites·2 claims
- 3974US9184043B2Edge electrodes with dielectric coversSEXTON GREGORY S·Filed 2007·Granted Nov 10, 2015·4 cites·11 claims
- 4073US9377002B2Electrodes for multi-point ignition using single or multiple transient plasma dischargesSINGLETON DANIEL R·Filed 2014·Granted Jun 28, 2016·6 cites·19 claims
- 4173US6842147B2Method and apparatus for producing uniform processing ratesLAM RES CORP·Filed 2002·Granted Jan 11, 2005·15 cites·25 claims
- 4269US8454794B2Antenna for plasma processor and apparatusHOWALD ARTHUR M·Filed 2012·Granted Jun 4, 2013·1 cites·13 claims
- 4369US6995067B2Megasonic cleaning efficiency using auto-tuning of an RF generator at constant maximum efficiencyLAM RES CORP·Filed 2003·Granted Feb 7, 2006·10 cites·10 claims
- 4466US8574397B2Bevel edge plasma chamber with top and bottom edge electrodesSEXTON GREGORY S·Filed 2012·Granted Nov 5, 2013·1 cites·20 claims
- 4565US8252140B2Plasma chamber for wafer bevel edge processingSEXTON GREGORY S·Filed 2011·Granted Aug 28, 2012·1 cites·13 claims
- 4665US7193173B2Reducing plasma ignition pressureLAM RES CORP·Filed 2004·Granted Mar 20, 2007·6 cites·39 claims
- 4764US7326581B2System, method and apparatus for automatic control of an RF generator for maximum efficiencyLAM RES CORP·Filed 2005·Granted Feb 5, 2008·1 cites·19 claims
- 4863US10898875B2Dielectric barrier discharge reactor for catalytic nonthermal plasma production of hydrogen from methaneCALIFORNIA INST OF TECHN·Filed 2019·Granted Jan 26, 2021·1 cites·17 claims
- 4963US8192576B2Methods of and apparatus for measuring and controlling wafer potential in pulsed RF bias processingKUTHI ANDRAS·Filed 2007·Granted Jun 5, 2012·2 cites·22 claims
- 5053US7632375B2Electrically enhancing the confinement of plasmaLAM RES CORP·Filed 2004·Granted Dec 15, 2009·11 cites·50 claims
Showing the top 50 of 64 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →