Inventor · disambiguated record
Andrew W. Mccullough
Also filed as: MCCULLOUGH ANDREW W
23 granted patents·2 pending applications·595 citations·filing 1991–2006
97Inventor score
Top patents by PatentIndex Score
25 records- 0190US6628372B2Use of multiple reticles in lithographic printing toolsFiled 2001·Granted Sep 30, 2003·44 cites·5 claims
- 0290US6013401AMethod of controlling illumination field to reduce line width variationSVG LITHOGRAPHY SYSTEMS INC·Filed 1999·Granted Jan 11, 2000·78 cites·4 claims
- 0385US6259513B1Illumination system with spatially controllable partial coherenceSVG LITHOGRAPHY SYSTEMS INC·Filed 1997·Granted Jul 10, 2001·57 cites·10 claims
- 0485US6097474ADynamically adjustable high resolution adjustable slitSVG LITHOGRAPHY SYSTEMS INC·Filed 1999·Granted Aug 1, 2000·55 cites·8 claims
- 0585US5895737AMethod for adjusting an illumination field based on selected reticle featureSVG LITHOGRAPHY SYSTEMS INC·Filed 1998·Granted Apr 20, 1999·49 cites·11 claims
- 0678US6822728B2Illumination system with spatially controllable partial coherence compensation for line width variances in a photolithographic systemASML HOLDING NV·Filed 2003·Granted Nov 23, 2004·15 cites·31 claims
- 0777US6292255B1Dose correction for along scan linewidth variationSVG LITHOGRAPHY SYSTEMS INC·Filed 1999·Granted Sep 18, 2001·51 cites·15 claims
- 0877US5966202AAdjustable slitSVG LITHOGRAPHY SYSTEMS INC·Filed 1997·Granted Oct 12, 1999·33 cites·19 claims
- 0975US6628370B1Illumination system with spatially controllable partial coherence compensating for line width variances in a photolithographic systemFiled 2000·Granted Sep 30, 2003·14 cites·3 claims
- 1073US6800408B2Use of multiple reticles in lithographic printing toolsASML HOLDING NV·Filed 2003·Granted Oct 5, 2004·15 cites·7 claims
- 1172US5896188AReduction of pattern noise in scanning lithographic system illuminatorsSVG LITHOGRAPHY SYSTEMS INC·Filed 1997·Granted Apr 20, 1999·31 cites·18 claims
- 1271US5973764AVacuum assisted debris removal systemSVG LITHOGRAPHY SYSTEMS INC·Filed 1997·Granted Oct 26, 1999·32 cites·17 claims
- 1370US5767523AMultiple detector alignment system for photolithographySVG LITHOGRAPHY SYSTEMS INC·Filed 1997·Granted Jun 16, 1998·29 cites·24 claims
- 1467US6686101B2Non absorbing reticle and method of making sameASML HOLDING NV·Filed 2002·Granted Feb 3, 2004·7 cites·8 claims
- 1566US7105836B2Method and apparatus for cooling a reticle during lithographic exposureASML HOLDING NV·Filed 2002·Granted Sep 12, 2006·10 cites·8 claims
- 1666US6445439B1EUV reticle thermal managementSVG LITHOGRAPHY SYSTEMS INC·Filed 1999·Granted Sep 3, 2002·31 cites·28 claims
- 1765US6967713B2Use of multiple reticles in lithographic printing toolsASML HOLDING NV·Filed 2004·Granted Nov 22, 2005·7 cites·12 claims
- 1864US7092070B2Illumination system with spatially controllable partial coherence compensating for line width variancesASML HOLDING NV·Filed 2004·Granted Aug 15, 2006·6 cites·11 claims
- 1962US7403266B2Maskless lithography systems and methods utilizing spatial light modulator arraysASML HOLDING NV·Filed 2006·Granted Jul 22, 2008·1 cites·36 claims
- 2060US7029804B2Non absorbing reticle and method of making sameASML HOLDING NV·Filed 2004·Granted Apr 18, 2006·4 cites·6 claims
- 2159US5079131AMethod of forming positive images through organometallic treatment of negative acid hardening cross-linked photoresist formulationsSHIPLEY CO·Filed 1991·Granted Jan 7, 1992·15 cites·31 claims
- 2251US6444372B1Non absorbing reticle and method of making sameSVG LITHOGRAPHY SYSTEMS INC·Filed 1999·Granted Sep 3, 2002·11 cites·13 claims
- 2345US7014963B2Non absorbing reticle and method of making sameASML HOLDING NV·Filed 2003·Granted Mar 21, 2006·0 cites·6 claims
- 2441US2005046819A1Maskless lithography systems and methods utilizing spatial light modulator arraysASML HOLDING NV·Filed 2004·Application pending·0 cites
- 2536US2002085185A1Method and system of varying optical imaging performance in the presence of refractive index variationsSILICON VALLEY GROUP·Filed 2001·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →