Inventor · disambiguated record
Andrew Nguyen
Also filed as: NGUYEN ANDREW
28 granted patents·4 pending applications·616 citations·filing 1996–2024
96Inventor score
Top patents by PatentIndex Score
32 records- 0197US6308654B1Inductively coupled parallel-plate plasma reactor with a conical domeAPPLIED MATERIALS INC·Filed 1996·Granted Oct 30, 2001·206 cites·31 claims
- 0296US8633423B2Methods and apparatus for controlling substrate temperature in a process chamberLIN XING·Filed 2011·Granted Jan 21, 2014·131 cites·17 claims
- 0396US8118938B2Lower liner with integrated flow equalizer and improved conductanceCARDUCCI JAMES D·Filed 2011·Granted Feb 21, 2012·26 cites·10 claims
- 0496US6261408B1Method and apparatus for semiconductor processing chamber pressure controlAPPLIED MATERIALS INC·Filed 2000·Granted Jul 17, 2001·147 cites·21 claims
- 0595US7987814B2Lower liner with integrated flow equalizer and improved conductanceAPPLIED MATERIALS INC·Filed 2008·Granted Aug 2, 2011·26 cites·14 claims
- 0694US8282736B2Lower liner with integrated flow equalizer and improved conductanceCARDUCCI JAMES D·Filed 2012·Granted Oct 9, 2012·14 cites·10 claims
- 0792US10840062B2Radio frequency filter system for a processing chamberAPPLIED MATERIALS INC·Filed 2019·Granted Nov 17, 2020·9 cites·20 claims
- 0892US8075728B2Gas flow equalizer plate suitable for use in a substrate process chamberBALAKRISHNA AJIT·Filed 2008·Granted Dec 13, 2011·28 cites·9 claims
- 0989US11562909B2Directional selective junction clean with field polymer protectionsAPPLIED MATERIALS INC·Filed 2020·Granted Jan 24, 2023·2 cites·8 claims
- 1089US8440019B2Lower liner with integrated flow equalizer and improved conductanceCARDUCCI JAMES D·Filed 2012·Granted May 14, 2013·7 cites·15 claims
- 1186US10796935B2Electronic device manufacturing systems, methods, and apparatus for heating substrates and reducing contamination in loadlocksAPPLIED MATERIALS INC·Filed 2017·Granted Oct 6, 2020·5 cites·20 claims
- 1285US10381200B2Plasma chamber with tandem processing regionsAPPLIED MATERIALS INC·Filed 2017·Granted Aug 13, 2019·3 cites·20 claims
- 1384US10566205B2Abatement and strip process chamber in a load lock configurationAPPLIED MATERIALS INC·Filed 2013·Granted Feb 18, 2020·4 cites·20 claims
- 1478US10211033B2Inline DPS chamber hardware are design to enable axis symmetry for improved flow conductance and uniformityAPPLIED MATERIALS INC·Filed 2015·Granted Feb 19, 2019·2 cites·20 claims
- 1577US11447868B2Method for controlling a plasma processAPPLIED MATERIALS INC·Filed 2017·Granted Sep 20, 2022·2 cites·8 claims
- 1675US8398814B2Tunable gas flow equalizerBALAKRISHNA AJIT·Filed 2009·Granted Mar 19, 2013·2 cites·20 claims
- 1769US11069547B2In-situ temperature measurement for inside of process chamberAPPLIED MATERIALS INC·Filed 2018·Granted Jul 20, 2021·1 cites·17 claims
- 1868US12183605B2In-situ semiconductor processing chamber temperature apparatusAPPLIED MATERIALS INC·Filed 2021·Granted Dec 31, 2024·0 cites·17 claims
- 1967US12463052B2Directional selective junction clean with field polymer protectionsAPPLIED MATERIALS INC·Filed 2022·Granted Nov 4, 2025·0 cites·8 claims
- 2066US10943788B2Abatement and strip process chamber in a load lock configurationAPPLIED MATERIALS INC·Filed 2019·Granted Mar 9, 2021·0 cites·19 claims
- 2165US12431339B2Adjustable de-chucking voltageAPPLIED MATERIALS INC·Filed 2023·Granted Sep 30, 2025·0 cites·18 claims
- 2265US2020144067A1Abatement and strip process chamber in a load lock configurationAPPLIED MATERIALS INC·Filed 2019·Application pending·0 cites
- 2362US10727096B2Symmetric chamber body design architecture to address variable process volume with improved flow uniformity/gas conductanceAPPLIED MATERIALS INC·Filed 2019·Granted Jul 28, 2020·0 cites·20 claims
- 2462US9435025B2Gas apparatus, systems, and methods for chamber portsAPPLIED MATERIALS INC·Filed 2013·Granted Sep 6, 2016·1 cites·7 claims
- 2558US2025349521A1Batch processing chamber with wafer backside deposition preventionAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 2656US12142468B2Stress treatments for cover wafersAPPLIED MATERIALS INC·Filed 2021·Granted Nov 12, 2024·0 cites·19 claims
- 2753US12068153B2Situ clean for bevel and edge ringAPPLIED MATERIALS INC·Filed 2022·Granted Aug 20, 2024·0 cites·8 claims
- 2852US11551965B2Apparatus to reduce polymers depositionAPPLIED MATERIALS INC·Filed 2019·Granted Jan 10, 2023·0 cites·20 claims
- 2947US10381247B2Gas systems and methods for chamber portsAPPLIED MATERIALS INC·Filed 2016·Granted Aug 13, 2019·0 cites·11 claims
- 3041US8562742B2Apparatus for radial delivery of gas to a chamber and methods of use thereofLEE JARED AHMAD·Filed 2010·Granted Oct 22, 2013·0 cites·20 claims
- 3136US2002148565A1Mushroom stem wafer pedestal for improved conductance and uniformityAPPLIED MATERIALS INC·Filed 2001·Application pending·0 cites
- 3236US2014311581A1Pressure controller configuration for semiconductor processing applicationsAPPLIED MATERIALS INC·Filed 2013·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →